The present disclosure relates to an optical fiber processing apparatus. The optical fiber processing apparatus comprising: a fixing module for fixing an optical fiber; and a stripping module for stripping layers outside an uncoated bare fiber of the optical fiber, The stripping module may comprise a stripping member which comprises two bodies arranged in parallel. Each body is provided with two or more kinds of blades suitable for stripping different sizes of layers outside the uncoated bare fiber, and each body is configured to be rotatable about its longitudinal axis to select different blades among the two or more kinds of blades, thereby enabling the stripping member to strip two or more sizes of layers outside the uncoated bare fiber.

A cover plate bearing device, a cover plate cleaning device, and a cover plate cleaning method. The cover plate bearing device includes a main body and a gas channel provided on the main body; the main body includes two side walls separated in a first direction, a bottom wall connected with the side walls, and a receiving cavity enclosed and formed by the side walls and the bottom wall; the shape of the receiving cavity matches that of the curved cover plate; at least one gas outlet of the gas channel are provided on the side wall; and the gas channel being adapted for blowing gas with a preset angle towards a side of the side wall facing away from the bottom wall, to prevent a moving fluid from eroding the functional coating of the curved cover plate.

A cover plate bearing device, a cover plate cleaning device, and a cover plate cleaning method. The cover plate bearing device includes a main body and a gas channel provided on the main body; the main body includes two side walls separated in a first direction, a bottom wall connected with the side walls, and a receiving cavity enclosed and formed by the side walls and the bottom wall; the shape of the receiving cavity matches that of the curved cover plate; at least one gas outlet of the gas channel are provided on the side wall; and the gas channel being adapted for blowing gas with a preset angle towards a side of the side wall facing away from the bottom wall, to prevent a moving fluid from eroding the functional coating of the curved cover plate.

An apparatus including a housing; a plurality of prongs connected to the housing so that the prongs are movable with respect to the housing; and a device for holding a food; and wherein the plurality of prongs are configured to be moved from a position outside of the food to a position where the plurality of prongs are inserted into the food; and wherein the plurality of prongs are configured to insert a substance into the food. The substance may be a seasoning. The apparatus may include a device for cleaning the plurality of prongs through a vacuum process and/or a blower process; wherein the device has an input configured to connect to one of the plurality of prongs. The apparatus may include a cook food platform; a sandwich platform; a hot beverage platform; and a cold beverage platform.

An apparatus including a housing; a plurality of prongs connected to the housing so that the prongs are movable with respect to the housing; and a device for holding a food; and wherein the plurality of prongs are configured to be moved from a position outside of the food to a position where the plurality of prongs are inserted into the food; and wherein the plurality of prongs are configured to insert a substance into the food. The substance may be a seasoning. The apparatus may include a device for cleaning the plurality of prongs through a vacuum process and/or a blower process; wherein the device has an input configured to connect to one of the plurality of prongs. The apparatus may include a cook food platform; a sandwich platform; a hot beverage platform; and a cold beverage platform.

The present disclosure provides a method and system for controlling a deposition device, relating to the field of semiconductor technology. The method for controlling a deposition device is applied to the deposition device, the deposition device includes a reaction chamber and an electrostatic chuck arranged in the reaction chamber, the electrostatic chuck carries a wafer, and the controlling method includes: obtaining a pressure value between the wafer and the electrostatic chuck; and when the pressure value exceeds a preset range, the deposition device sending out an alarm signal, and executing a cleaning operation according to a use state of the electrostatic chuck.

The present invention relates to a recycling process for a laminate and a solution used in such a process. The present invention finds particular application in the removal of an adhered overlay from an underlying substrate material such as plastic. The process includes subjecting the laminate to an impact frictional striking force, thereby substantially separating the substrate layer from the one or more surface layers of the overlay and then washing the substrate layer with a washing solution to remove the remaining surface layers of the overlay and glue from the substrate layer. The washing solution may be an aqueous solution including a surfactant, a solvent and a base.

The present invention relates to a recycling process for a laminate and a solution used in such a process. The present invention finds particular application in the removal of an adhered overlay from an underlying substrate material such as plastic. The process includes subjecting the laminate to an impact frictional striking force, thereby substantially separating the substrate layer from the one or more surface layers of the overlay and then washing the substrate layer with a washing solution to remove the remaining surface layers of the overlay and glue from the substrate layer. The washing solution may be an aqueous solution including a surfactant, a solvent and a base.

A valve which comprises a body (1), a closing member (2) movable in a space (11) between walls (9, 10) of the body transversely in relation to a flow passageway (3) provided through the body between at least two positions, a first position in which the flow passageway (3) is closed, and a second position in which the flow passageway is open, and an actuator (4) for moving the closing member (2) linearly between said at least two positions, which body (1) further comprises an edge part (12, 34). The valve comprises a cleaning arrangement in which an aperture (35, 36) for conducting a medium is arranged in the valve body (1), in a part of the body (1) located on the side of the closing member (2) actuator (4), and is configured to spray a cleaning medium into a part of the space located between walls (9, 10, 12, 34) of the space (11) and the closing member (2). The invention also relates to a method.

A valve which comprises a body (1), a closing member (2) movable in a space (11) between walls (9, 10) of the body transversely in relation to a flow passageway (3) provided through the body between at least two positions, a first position in which the flow passageway (3) is closed, and a second position in which the flow passageway is open, and an actuator (4) for moving the closing member (2) linearly between said at least two positions, which body (1) further comprises an edge part (12, 34). The valve comprises a cleaning arrangement in which an aperture (35, 36) for conducting a medium is arranged in the valve body (1), in a part of the body (1) located on the side of the closing member (2) actuator (4), and is configured to spray a cleaning medium into a part of the space located between walls (9, 10, 12, 34) of the space (11) and the closing member (2). The invention also relates to a method.