A handheld snow removing system includes an intake scoop with a rotating intake auger, a discharge chute configured to direct a flow of material to a point outside of the handheld snow removing system, a fan chamber disposed between the intake scoop and the discharge chute, and an energy-conversion device configured to drive elements of the fan chamber and the rotating intake auger. The fan chamber includes a fan configured to create a suction force within the fan chamber to create the flow of material from the intake scoop, through the fan chamber, and out through the discharge chute.

Assemblies and method to extract a material from a source of the material may include a vacuum generation and sound attenuation assembly to enhance extraction the material from the source of the material. The vacuum generation and sound attenuation assembly may include a vacuum source including a plurality of vacuum generators. Each of the plurality of vacuum generators may be positioned to cause a vacuum flow between the source of the material and the vacuum generation and sound attenuation assembly. The vacuum generation and sound attenuation assembly may further include a sound attenuation chamber connected to the vacuum source. The sound attenuation chamber may include an attenuation housing at least partially defining a chamber interior volume being positioned to receive at least a portion of the vacuum flow from the vacuum source and attenuate sound generated by the vacuum source.

A mass spectrometer provided with an ionization chamber (10) in which ionization is performed on a sample by laser ionization, includes an opening part (12) that is provided on a side wall of the ionization chamber (10), and includes a door (13); a ventilation port (14) provided in a wall of the ionization chamber (10), which is opposite to the opening port (12); and a gas supplier (64), (67) for supplying high-pressure cleaning gas to the ionization chamber (10) through the ventilation port (14). In this configuration, the high-pressure cleaning gas flows into the ionization chamber (10) from the gas supplier (64), (67) while the door (13) is opened, thereby blowing up particles including fragments of bacterial cells, which are piled up on a floor of the ionization chamber (10), and/or sweeping particles floating near the floor, so as to discharge the particles to the outside.

A mass spectrometer provided with an ionization chamber (10) in which ionization is performed on a sample by laser ionization, includes an opening part (12) that is provided on a side wall of the ionization chamber (10), and includes a door (13); a ventilation port (14) provided in a wall of the ionization chamber (10), which is opposite to the opening port (12); and a gas supplier (64), (67) for supplying high-pressure cleaning gas to the ionization chamber (10) through the ventilation port (14). In this configuration, the high-pressure cleaning gas flows into the ionization chamber (10) from the gas supplier (64), (67) while the door (13) is opened, thereby blowing up particles including fragments of bacterial cells, which are piled up on a floor of the ionization chamber (10), and/or sweeping particles floating near the floor, so as to discharge the particles to the outside.

A semiconductor manufacturing equipment has a support platform and a substrate disposed over the support platform. A first electrical component is disposed over a first surface of the substrate. A second electrical component is disposed over a second surface of the substrate opposite the first surface of the substrate. A suction hood is disposed over the substrate. A gas is introduced over the substrate to circulate residue while drawing the residue vertically into the suction hood. The gas can be introduced with a gas nozzle or air knife. The gas can be introduced from a gas conduit disposed at least partially around the substrate. The gas conduit can extend completely around the substrate. The gas nozzles are sequentially placed around the gas conduit. The gas can be a stable or inert gas. The residue is displaced away from the second electrical component.

A semiconductor manufacturing equipment has a support platform and a substrate disposed over the support platform. A first electrical component is disposed over a first surface of the substrate. A second electrical component is disposed over a second surface of the substrate opposite the first surface of the substrate. A suction hood is disposed over the substrate. A gas is introduced over the substrate to circulate residue while drawing the residue vertically into the suction hood. The gas can be introduced with a gas nozzle or air knife. The gas can be introduced from a gas conduit disposed at least partially around the substrate. The gas conduit can extend completely around the substrate. The gas nozzles are sequentially placed around the gas conduit. The gas can be a stable or inert gas. The residue is displaced away from the second electrical component.

A cleaning tool for cleaning a glass surface of an accelerator column is disclosed. The cleaning tool includes a shaft including a first end and a second end; a foam body located at the first end of the shaft; and a mounting bracket coupled to the first end of the shaft, the mounting bracket receiving the foam body. An outer circumference of the foam body includes a textured cleaning surface for contacting the glass surface of the accelerator column.

A device for maintaining cleanliness in a vacuum environment during semiconductor manufacture in a device storing and transferring wafers into etching and other manufacturing processes includes a transferring chamber storing wafers, a vacuum system to extract particles from the transferring chamber, and a thermoelectric device for temperature control. The vacuum system includes an extracting pipe, the thermoelectric device includes a cooling apparatus to cool the transferring chamber, and a monitoring device to detect particle concentrations in the transferring chamber. The cooling apparatus includes Peltier elements arranged on the extracting pipe to cool and thus cause the descent of fumes and particles towards a low-set extraction area.

A device for maintaining cleanliness in a vacuum environment during semiconductor manufacture in a device storing and transferring wafers into etching and other manufacturing processes includes a transferring chamber storing wafers, a vacuum system to extract particles from the transferring chamber, and a thermoelectric device for temperature control. The vacuum system includes an extracting pipe, the thermoelectric device includes a cooling apparatus to cool the transferring chamber, and a monitoring device to detect particle concentrations in the transferring chamber. The cooling apparatus includes Peltier elements arranged on the extracting pipe to cool and thus cause the descent of fumes and particles towards a low-set extraction area.

A high-power slurry vacuum cart is well suited to collect and contain any slurry or wet residue produced through concrete and other surface processing operations. A multi-horsepower propane engine and propane tank are mounted on a mobile frame, along with a suction pump powered by the propane engine. A slurry containment vessel mounted on the frame has an input in communication with a squeegee and an output coupled to the suction pump. The squeegee may be adapted for floor contact to collect slurry for transfer to the slurry containment tank. The suction pump is directly coupled to the propane engine through a universal joint, thereby obviating the use of belts, chains or pulleys. The output of the pump may optionally be used as an air blower for surface drying, or the like, as well as use as an air blower to assist in emptying the slurry containment tank.