An end effector for a vacuum system is disclosed. In various embodiments, the end effector includes a central duct having a first end configured for connection to a vacuum source and a second end defining a central duct inlet; a base member proximate the second end of the central duct; and a plurality of passages extending from an outer surface of the base member to an inner surface of the central duct, the plurality of passages characterized by a passage axis having an axial vector component.

An end effector for a vacuum system is disclosed. In various embodiments, the end effector includes a central duct having a first end configured for connection to a vacuum source and a second end defining a central duct inlet; a base member proximate the second end of the central duct; and a plurality of passages extending from an outer surface of the base member to an inner surface of the central duct, the plurality of passages characterized by a passage axis having an axial vector component.

A smoke and dust treatment apparatus for welding, said apparatus comprising a polishing and dust extraction module and a smoke and dust purification module. The polishing and dust extraction module comprises a double-layer dust extraction cover (3), a protective cover (2), an industrial brush (4), a first air guide portion, a second air guide portion (24) and a drive motor (22), the drive motor (22) driving the industrial brush (4) to rotate at high speed to perform polishing. During welding and polishing, a mechanical arm (6) drives the double-layer dust extraction cover (3), and a suction hole (20) of the double-layer dust extraction cover (3) and a suction guide hole (19) on the industrial brush (4) simultaneously take in toxic gas and debris such as iron filings.

A smoke and dust treatment apparatus for welding, said apparatus comprising a polishing and dust extraction module and a smoke and dust purification module. The polishing and dust extraction module comprises a double-layer dust extraction cover (3), a protective cover (2), an industrial brush (4), a first air guide portion, a second air guide portion (24) and a drive motor (22), the drive motor (22) driving the industrial brush (4) to rotate at high speed to perform polishing. During welding and polishing, a mechanical arm (6) drives the double-layer dust extraction cover (3), and a suction hole (20) of the double-layer dust extraction cover (3) and a suction guide hole (19) on the industrial brush (4) simultaneously take in toxic gas and debris such as iron filings.

Embodiments of the present disclosure provide a semiconductor machine cleaning system and a semiconductor machine cleaning method. The semiconductor machine cleaning system includes: an acquisition module, configured to determine whether a semiconductor machine has contamination particles thereon, and to acquire position information of the contamination particles; and a cleaning module, configured to clean the contamination particles based on the position information before the semiconductor machine executes a next manufacturing process; where the contamination particles are cleaned by means of pressure extraction.

Embodiments of the present disclosure provide a semiconductor machine cleaning system and a semiconductor machine cleaning method. The semiconductor machine cleaning system includes: an acquisition module, configured to determine whether a semiconductor machine has contamination particles thereon, and to acquire position information of the contamination particles; and a cleaning module, configured to clean the contamination particles based on the position information before the semiconductor machine executes a next manufacturing process; where the contamination particles are cleaned by means of pressure extraction.

Methods and apparatuses associated with surface cleaning are described. Examples can include detecting at a processing resource of a robot and via a temperature sensor of the robot, a temperature of a surface on which the robot is located. Examples can include the processing resource shutting down the robot in response to the temperature being at or above a particular threshold temperature, and the processing resource instructing the robot to clean the surface following a particular cleaning path using a vacuum, a scrubber, or both in response to the temperature being below a particular threshold temperature.

In one example in accordance with the present disclosure, an additive manufacturing platform is described. The additive manufacturing platform includes a vibrating bed on which a volume of build material is to be disposed. The bed is to vibrate to remove excess build material and operates in at least two extraction modes during a build material extraction period. The additive manufacturing platform also includes a non-vibrating frame to support the vibrating bed.

The invention relates to a decake apparatus. The decake apparatus has a chamber with a base to support a build cake. The build cake includes a build object and non-solidified build material. The apparatus includes a distributor from which to force a fluidisation medium into a lower portion of a build cake supported on the base to fluidise non-solidified build material around the build object so that the build object sinks through the fluidised non-solidified build material towards the base. The also includes a material outlet through which non-solidified build material can be removed from the chamber.

An industrial robotic vacuum system for cleaning agricultural facility ventilation ductwork. The industrial robotic vacuum system generally includes a robotic vacuum head.