A device for removing dust from closures which are capable of circulating in a chute extending along a longitudinal axis (y-y′), includes a suction system arranged around the chute and are capable of sucking up the dissociated dust from the closures, and including at least one ionization bar extending longitudinally alongside the chute.

The present application provides a machine cleaning device. The machine cleaning device includes: a guide rail arranged next to a carrying platform of the machine main body, a support slidably mounted on the guide rail, a cleaning component mounted on the support, a driving device connected to the support in a transmission way, and a controller connected to the driving device; and when the cleaning component cleans the top surface of the machine main body, the controller controls the driving device to drive the support to move along the guide rail, so as to drive the cleaning component to clean the top surface of the machine main body in a direction away from the carrying platform. So that unexpected particles are reduced to fall on the carrying platform and contaminate the carrying platform during the cleaning process.

The present application provides a machine cleaning device. The machine cleaning device includes: a guide rail arranged next to a carrying platform of the machine main body, a support slidably mounted on the guide rail, a cleaning component mounted on the support, a driving device connected to the support in a transmission way, and a controller connected to the driving device; and when the cleaning component cleans the top surface of the machine main body, the controller controls the driving device to drive the support to move along the guide rail, so as to drive the cleaning component to clean the top surface of the machine main body in a direction away from the carrying platform. So that unexpected particles are reduced to fall on the carrying platform and contaminate the carrying platform during the cleaning process.

A semiconductor manufacturing equipment cleaning system has a multi-station cleaning and inspection system. Within semiconductor manufacturing equipment cleaning system, a tray cleaning station uses a first rotating brush passing over a first surface of a carrier and possibly semiconductor die, and a second rotating brush passing over a second surface of the carrier and semiconductor die opposite the first surface of the carrier and semiconductor die. Debris and contaminants dislodged from the first surface and second surface of the carrier by the first rotating brush and second rotating brush are removed under vacuum suction. A conveyor transports the carrier through the multi-station cleaning and inspection system. The first rotating brush and second rotating brush move in tandem across the first surface and second surface of the carrier. Air pressure is injected across the first rotating brush and second rotating brush to further remove debris and contaminants.

A semiconductor manufacturing equipment cleaning system has a multi-station cleaning and inspection system. Within semiconductor manufacturing equipment cleaning system, a tray cleaning station uses a first rotating brush passing over a first surface of a carrier and possibly semiconductor die, and a second rotating brush passing over a second surface of the carrier and semiconductor die opposite the first surface of the carrier and semiconductor die. Debris and contaminants dislodged from the first surface and second surface of the carrier by the first rotating brush and second rotating brush are removed under vacuum suction. A conveyor transports the carrier through the multi-station cleaning and inspection system. The first rotating brush and second rotating brush move in tandem across the first surface and second surface of the carrier. Air pressure is injected across the first rotating brush and second rotating brush to further remove debris and contaminants.

In some examples, a processing machine has at least one cleaning device for cleaning a substrate. The at least one cleaning device and the at least one substrate are able to be arranged in a first and a second cleaning state, and the substrate is arranged at a distance from the at least one cleaning device in the first cleaning state. The substrate is arranged in contact with the at least one cleaning device in the second cleaning state, and the at least one cleaning device and the substrate are arranged so as to be transferable at least from the first cleaning state into the second cleaning state. The at least one cleaning device is arranged to be adjusted from a first cleaning position in the first cleaning state into a second cleaning position in the second cleaning state.

An extractor includes a fluid recovery system including a suction nozzle, a recovery tank assembly, and a suction source having an inlet fluidly connected to the recovery tank assembly and the suction nozzle through an air conduit and adapted to draw liquid through the suction nozzle and deposit the liquid in the recovery tank assembly. The extractor includes a body provided with the air conduit for movement between a first position wherein suction is unreduced and a second position wherein suction is reduced. The extractor includes a fluid delivery system including a solution supply tank assembly, a fluid distributor, and a conduit for depositing fluid onto a surface. The extractor includes a hydraulic connector operably coupled to the body and adapted to move the body between the first and second positions.

An extractor includes a fluid recovery system including a suction nozzle, a recovery tank assembly, and a suction source having an inlet fluidly connected to the recovery tank assembly and the suction nozzle through an air conduit and adapted to draw liquid through the suction nozzle and deposit the liquid in the recovery tank assembly. The extractor includes a body provided with the air conduit for movement between a first position wherein suction is unreduced and a second position wherein suction is reduced. The extractor includes a fluid delivery system including a solution supply tank assembly, a fluid distributor, and a conduit for depositing fluid onto a surface. The extractor includes a hydraulic connector operably coupled to the body and adapted to move the body between the first and second positions.

A lens inspection module comprises: a lens insertion station, at least one lens inspection station, and a lens removal station as well as a closed-loop transportation rail, a cuvette transportation shuttle with a plurality of inspection cuvettes, and a self-driving cleaning shuttle for cleaning the rail. Cleaning shuttle comprises a driving unit a cleaning head, a suction unit, and a tube connecting cleaning head and suction unit. Cleaning head is spaced apart from suction unit and driving unit in the transportation direction and is pivotally arranged about a pivot axis. Cleaning head may comprise a distance sensor for detecting the distance between cleaning shuttle and transportation shuttle. Driving unit is configured to change the speed of the self-driving cleaning shuttle when the distance between the cleaning shuttle and the transportation shuttle is shorter than a predetermined threshold distance.

A lens inspection module comprises: a lens insertion station, at least one lens inspection station, and a lens removal station as well as a closed-loop transportation rail, a cuvette transportation shuttle with a plurality of inspection cuvettes, and a self-driving cleaning shuttle for cleaning the rail. Cleaning shuttle comprises a driving unit a cleaning head, a suction unit, and a tube connecting cleaning head and suction unit. Cleaning head is spaced apart from suction unit and driving unit in the transportation direction and is pivotally arranged about a pivot axis. Cleaning head may comprise a distance sensor for detecting the distance between cleaning shuttle and transportation shuttle. Driving unit is configured to change the speed of the self-driving cleaning shuttle when the distance between the cleaning shuttle and the transportation shuttle is shorter than a predetermined threshold distance.