Patent classifications
B08B7/0014
LASER APPARATUS AND METHOD OF USE FOR DENTAL SURGERY
A laser and a minimally invasive dental surgical procedure using the laser to stimulate periodontal tissue formation.
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
A substrate processing apparatus comprises: a first solidifier and a second solidifier. The first solidifier solidifies a liquid to be solidified adhering to a front surface of a substrate by supplying a liquid refrigerant to a back surface of the substrate at a first position. The second solidifier solidifies the liquid to be solidified by at least one of a first cooling mechanism and a second cooling mechanism. The first cooling mechanism cools the liquid to be solidified by supplying a gas refrigerant toward the substrate at a second position more distant from a center of rotation of the substrate in a radial direction than the first position. The second cooling mechanism cools the liquid to be solidified by bringing a processing surface into contact with the liquid to be solidified at the second position.
VEHICLE-WASHING INSTALLATION, METHOD FOR CLEANING VEHICLES, AND CLEANING AGENT
A vehicle-washing installation, a method for cleaning a vehicle, and a cleaning agent in the form of a system includes at least two components for use in such a method and vehicle-washing installation. The method is suitable for a vehicle-washing installation in which drying of the formed film is not required. A high-pressure water jet mechanically removes the film and eliminates the soiling of the vehicle surface. The system includes a component A, having at least one film-forming polymer in a substantially aqueous solution, and a component B, having at least one hardener in a substantially aqueous solution. The component A is applied to the vehicle at least once and then a solid or gel-like film is produced by applying component B at least once, which film is removed by pressurized post-cleaning fluid and/or washing brushes. The vehicle-washing installation includes an application device for applying the first and second components.
PARTICLE REMOVAL METHOD, PARTICLE REMOVAL APPARATUS, AND METHOD FOR MANUFACTURING ARTICLE
A curable composition on a substrate is cured in a state where a member is in contact with the curable composition. Thereafter, the member having adhered to the curable composition is separated from the substrate, whereby the curable composition and a particle are removed from the substrate.
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
A substrate processing apparatus includes one or more peeling gas nozzles that tears a polymer film by a pressure of a peeling gas such that a peeled portion peeled from an upper surface of a substrate and an adhering portion adhering to the upper surface are included in the polymer film by discharging the peeling gas at a first rate toward the upper surface, and then changes the adhering portion to the peeled portion with the peeling gas that has entered between the peeled portion and the substrate while discharging the peeling gas at a second rate slower than the first rate toward the upper surface, and a nozzle actuator that changes a distance from a hit position of the peeling gas with respect to the upper surface to a center of the substrate by moving the one or more peeling gas nozzles horizontally.
Flux assisted laser removal of thermal barrier coating
A method of removing a ceramic thermal barrier coating system (18). Laser energy (20) is applied to the thermal barrier coating system in the presence of a flux material (22) in order to form a melt (26). Upon removal of the energy, the melt solidifies to from a layer of slag (28) which is more loosely adhered to the underlying metallic substrate (12) than the original thermal barrier coating system. The slag is then broken and released from the substrate with a mechanical process such as grit blasting (30). Sufficient energy may be applied to melt an entire depth of the coating system along with a thin layer (34) of the substrate, thereby forming a refreshed surface (36) on the substrate upon resolidification.
METHODS FOR REMOVING TRAMP ELEMENTS FROM ALLOY SUBSTRATES
Methods are disclosed for cleaning a near surface region of an alloy substrate (10) in the presence of a flux material (12). A flux material is melted on the surface of the alloy substrate to a temperature sufficient to permit a reaction of the flux material with at least one tramp element present within the alloy substrate. The alloy substrate may remain solid, but diffusion of the tramp element is facilitated by an elevated temperature of the substrate. Fluxes disclosed may include a metal oxalate and/or other compounds capable of forming tramp element containing compounds by reaction with the alloy substrate to be cleaned, wherein the compounds formed have a H.sub.f lower than 100 kcal/g-mol at 25 C.
SYSTEMS AND ASSOCIATED PROCESSES FOR CLEANING SURFACES
The disclosure provides systems and processes for cleaning a site to remove residue from a surface, of one or more surfaces, on the site. The processes can be performed without the addition of water to the site. A process can include: (A) identifying that the residue is liquid hydrocarbon and/or a hydrocarbon; (B) providing clay-based particulates (CBP) for treatment of the surface; (C) providing biosolvent solution (BSS) for treatment of the surface; (D) applying both (a) the CBP to the surface and (b) the BSS to the surface, in a sequential progression of steps, and such applying including: (a) actively identifying if the surface is wet with hydrocarbon; (b) applying a first sequential progression of steps, of the sequential progression of steps, if the surface is identified as being wet with hydrocarbon, the first sequential progression of steps including application of the CBP without the BSS; and (c) applying a second sequential progression of steps, of the sequential progression of steps, if the surface is identified as being not wet with hydrocarbon, and the second sequential progression of steps including application of the CBP and the BSS.
Substrate processing method and substrate processing device
A substrate processing method that includes a processing liquid supplying step which supplies a processing liquid to a surface of a substrate, a processing film forming step in which the processing liquid on the surface of the substrate is solidified or cured to form a processing film that holds removal objects present on the surface of the substrate, and a removing step in which a removing liquid is supplied to the surface of the substrate to thereby remove the processing film from the surface of the substrate in a state that the removal objects are held by the processing film. The processing liquid contains a dissolution component which dissolves at least one of a front layer of the substrate and the removal objects as a dissolution object. The processing liquid supplying step includes a dissolution step which partially dissolves the dissolution object by the dissolution component in the processing liquid supplied to the surface of the substrate.
METHOD FOR CLEANING SUBSTRATE AND CLEANING DEVICE
According to one embodiment, a method including supplying a liquid onto a substrate, solidifying the liquid on the substrate to form a solidified body, and melting the solidified body of the liquid on the substrate is provided. When solidifying the liquid, an internal pressure of the liquid on the substrate is varied.