A direct contact densified fluid-based thermodynamic treatment system uses the fluid to effect heat transfer as the working fluid in a separate yet linked treatment system. During certain phases of operation of a densified fluid-based treatment process wherein it is necessary to distill the fluid to maintain the purity of the densified fluid heat is imparted to the densified fluid raising it above the boiling point for the associated pressure within a vessel. A densified fluid-based refrigeration/thermodynamic system removes heat during the condensing cycle of a working densified fluid treatment system and use the removed heat for distillation of the same working fluid in the distillation vessel. The process does not require an external heating or cooling system, and thus can be entirely supported by a single machine using the same densified fluid during its operational phase.

Embodiments of the invention generally relate to a method of cleaning a substrate and a substrate processing apparatus that is configured to perform the method of cleaning the substrate. More specifically, embodiments of the present invention relate to a method of cleaning a substrate in a manner that reduces or eliminates the negative effects of line stiction between semiconductor device features. Other embodiments of the present invention relate to a substrate processing apparatus that allows for cleaning of the substrate in a manner that reduces or eliminates line stiction between semiconductor device features formed on the substrate.

An integrated approach for cleaning an active surface of a petrochemical sensor. Sensors in the petrochemical industry are often deployed in locations where they are prone to fouling. By heating the active surface fouling substances may be removed from the active surface. Heating the surface above a supercritical point of a fluid being sensed may create a fluid that may serve to clean the active surface. Limiting the duration of the applied heating and/or pulsing the heating may mitigate adverse effects of use of high temperatures. A doped active surface, such as a doped diamond window may be designed to have conductive areas in the window that may be used for resistive heating of the window.

The present invention relates to a method in which an adhesive bond is brought into contact with a supercritical fluid, characterized in that the adhesive bond is based on one or more adhesives comprising crosslinked polymers, where the crosslinked polymers have at least one oxygen atom in the polymer chain and have been crosslinked via urethane bridges or —O—CH.sub.2—CH(OH)—CH.sub.2—O— bridges or molecular chains having corresponding bridges, and in that after bringing the adhesive bond into contact with the supercritical fluid, at least one of the parameters pressure, volume, amount of substance or temperature is changed such that the fluid transitions from the supercritical state into a different state, and also to the use of this method as at least a substep in a method for separating adhesive bonds of components.

A substrate dry cleaning apparatus, a substrate dry cleaning system, and a method of cleaning a substrate are disclosed. The substrate dry cleaning system includes a substrate support and a reactive species generator. The reactive species generator includes a first conduit defining a first flow channel that extends to an outlet of the first conduit, the outlet of the first conduit facing the substrate support, a first electrode, a second electrode facing the first electrode, the first flow channel disposed between the first electrode and the second electrode, a first inert wall disposed between the first electrode and the first flow channel, and a second inert wall disposed between the second electrode and the first flow channel.

A method for cleaning and decontaminating apparel includes placing the apparel into a pressurizable cleaning vessel. The cleaning vessel is filled with a solvent comprising a mixture selected from at least one of propylene glycol ether, water, organic acid and carbon dioxide. After the apparel has been in contact with the solvent for a first selected period of time, carbon dioxide gas under pressure is introduced into the cleaning vessel to carbonate the solvent. After appropriate agitation, at least a portion of the solvent is then removed from the cleaning vessel while under pressure. A rinsing solution, comprising liquid carbon dioxide and alcohol, is then introduced into the cleaning vessel under pressure. After a third selected period of time, the rinsing solution is removed from the cleaning vessel under pressure. Finally, the cleaning vessel is depressurized and the the apparel is removed from the cleaning vessel.

A method for producing a steel tube include the manufacturing of a steel tube having an inner tube wall, an outer tube wall (3), and a free tube cross-section enclosed by the inner tube wall. After the manufacturing, the steel tube includes at least one contaminant on the outer tube wall and entails, after the manufacturing of the steel tube, cleaning of the outer tube wall by applying liquid or solid CO.sub.2 onto the outer tube wall in order to remove a contaminant from the outer tube wall.

Disclosed is a substrate processing apparatus including a dry processing unit and a controller. The dry processing unit includes: a chamber that accommodates the substrate; a supercritical processing liquid supply unit that supplies a supercritical processing liquid to the substrate; a heating unit that heats an inside of the chamber; and a discharge unit that discharges a fluid in the chamber from the chamber. The controller controls the supercritical processing liquid supply unit, the heating unit, and the discharge unit such that the supercritical processing liquid is supplied to the substrate before or after the substrate is accommodated in the chamber, the inside of the chamber is heated to change the supercritical processing liquid into a supercritical fluid or a subcritical fluid, and the supercritical fluid or the subcritical fluid is discharged from the chamber.

A substrate processing apparatus includes a chamber providing a space in which a substrate is processed, a first substrate support within the chamber and configured to support the substrate when the substrate is loaded into chamber, a second substrate support within the chamber and configured to support the substrate in a height greater than the height in which the first substrate supports the substrate, a first supply port through which a supercritical fluid is supplied to a first space under the substrate of a chamber space, a second supply port through which the supercritical fluid is supplied to a second space above the substrate of the chamber space, and an exhaust port through which the supercritical fluid is exhausted from the chamber.

Included are methods and systems for recycling a gas emitted from non-aqueous cleaning. An example method includes contacting a contaminated equipment with a non-aqueous cleaning material; wherein the spent non-aqueous cleaning material emits the gas. The method further comprises capturing the emitted gas, filtering the emitted gas, and recycling the emitted gas into the non-aqueous cleaning material.