The invention relates to method and to an arrangement for removing outgrowth in a suspension smelting furnace. The suspension smelting furnace comprising a reaction shaft having a reaction shaft structure. The reaction shaft comprises at least one opening for an outgrowth removal means. The movable piston is arranged such that the movable piston can move in the opening in the reaction shaft and into the reaction shaft to push possible outgrowth in the reaction shaft.

The present disclosure discloses a cleaning base station. The cleaning base station includes a base and a vibration device. The vibration device includes a driving mechanism and a cleaning element. The driving mechanism is fixed to the base. The cleaning element is connected to the driving mechanism. The cleaning element is configured to contact a part-to-be-cleaned of a cleaning robot. The driving mechanism drives the cleaning element to vibrate so as to clean the part-to-be-cleaned of the cleaning robot. The present disclosure also discloses a cleaning robot system using the cleaning base station described above. The present disclosure has the advantages of reducing a user's burden of manual cleaning and avoiding contamination of a floor surface by the part-to-be-cleaned of the cleaning robot.

The present disclosure discloses a cleaning base station. The cleaning base station includes a base and a vibration device. The vibration device includes a driving mechanism and a cleaning element. The driving mechanism is fixed to the base. The cleaning element is connected to the driving mechanism. The cleaning element is configured to contact a part-to-be-cleaned of a cleaning robot. The driving mechanism drives the cleaning element to vibrate so as to clean the part-to-be-cleaned of the cleaning robot. The present disclosure also discloses a cleaning robot system using the cleaning base station described above. The present disclosure has the advantages of reducing a user's burden of manual cleaning and avoiding contamination of a floor surface by the part-to-be-cleaned of the cleaning robot.

Methods and apparatus to treat workpieces are disclosed. A disclosed example equipment is to treat a workpiece with a process fluid, where the workpiece has a workpiece body with at least one cavity that extends from a first opening to a second opening. The example equipment includes a line system for providing the process fluid, where the line system has at least one line duct with an adapter for connecting the line system to the at least one cavity, a process chamber to receive the workpiece in treatment, where the process chamber includes an outlet to discharge a process fluid that has been induced into the cavity, and a suction installation to generate negative pressure, where the suction installation is connected to the process chamber by a suction duct to suction the process fluid from a fluid vessel through the at least one line duct and the at least one cavity into the process chamber.

High-performance substrate cleaning apparatus, substrate cleaning method, substrate processing apparatus, and substrate drying apparatus are provided. A substrate cleaning apparatus, including: a substrate holding and rotating mechanism that holds and rotates a substrate; a first cleaning mechanism that brings a cleaning tool into contact with the substrate to clean the substrate, cleans the substrate using two-fluid jet, or cleans the substrate using ozone water; and a second cleaning mechanism that cleans the substrate using an ultrasonic cleaning liquid is provided.

A vortex dryer for fibrous material utilizes a helical inlet to the base of a central vortex tube to separate fiber from debris by abruptly changing direction of the conveying air flow. The dryer combines the helical input with helical shaping of the air flow through the central vortex tube to induce greater drying for the fiber which is continued at the top of the vortex tube through a separate drying chamber.

A membrane cleaning apparatus for removing particles from a membrane, the apparatus including a membrane support and an electric field generating mechanism. The membrane support is for supporting the membrane. The electric field generating mechanism is for generating an electric field in the vicinity of the membrane when supported by the membrane support. The electric field generating mechanism may include: one or more collector electrodes; and a mechanism for applying a voltage across a membrane supported by the membrane support and the or each of the one or more collector electrodes.

A membrane cleaning apparatus for removing particles from a membrane, the apparatus including a membrane support and an electric field generating mechanism. The membrane support is for supporting the membrane. The electric field generating mechanism is for generating an electric field in the vicinity of the membrane when supported by the membrane support. The electric field generating mechanism may include: one or more collector electrodes; and a mechanism for applying a voltage across a membrane supported by the membrane support and the or each of the one or more collector electrodes.

A device and method for protecting an optical sensor of a vehicle are disclosed, wherein the sensor is protected from environmental pollutants which may adhere to an optical surface of the sensor if the sensor is exposed to them, and wherein the environmental pollutants are kept away from the sensor by an ultrasonic cleaning of the sensor surface using an ultrasonic field. The ultrasonic field of the ultrasonic cleaning is emitted by a protection device into the air to provide a protection zone around the optical surface of the sensor such that a contact of the optical surface with the environmental pollutants is avoided, wherein the environmental pollutants are moved and/or destroyed in the air away from the sensor if they enter the protection zone), and wherein the protection zone provides a contactless cleaning of the sensor.

An equipment cleaning apparatus for an extraplanetary environment includes a cleaner vessel positioned at an exterior of an extraplanetary habitat, and an exterior hatch located outside of the extraplanetary habitat and allowing access to an interior of the cleaner vessel. The cleaning apparatus is operable in one or more cleaning cycles to clean equipment located in the cleaner vessel. A method of cleaning equipment in an extraplanetary environment includes providing a cleaner vessel at an extraplanetary habitat, placing one or more articles of equipment into an interior of the cleaner vessel through an exterior hatch located outside of the extraplanetary habitat, closing the exterior hatch, and operating one or more cleaning cycles on the equipment in the cleaner vessel.