A self-vibrating pH probe comprise a housing containing an electronic assembly to which is coupled a vibration source element so that at least a portion of vibrations caused by the vibration source element propagate to the electronic assembly, the vibration source element being controllable for at least on/off operation. The self-vibrating pH probe further comprising a pH probe member having a probe tip at a first end, the probe member extending from the housing and mechanically and electrically coupled by a second end to the electronic assembly so that at least a portion of vibrations propagating to the electronic assembly further propagate to the probe tip; and further including a processor coupled to the electronic assembly for coordinating operation of the vibration source element and operation of the pH probe member.

An ultrasonic cleaner includes: a cleaning tank; an ultrasonic transducer; a vibration head which extends from the ultrasonic transducer toward the cleaning tank and of which a tip portion includes a cylindrical hole having a longitudinal direction aligned to a vertical direction; and an air layer or a metallic member that is provided in an area formed by projecting at least the vibration head in the vertical direction under the cleaning tank, wherein the ultrasonic transducer is driven at a frequency at which the vibration head is vibrated resonantly in a vibration mode accompanied by a deformation in the longitudinal direction of the cylindrical hole and a direction perpendicular to the longitudinal direction, wherein an area formed by projecting at least the vibration head in the vertical direction in a bottom portion of the cleaning tank is formed of a material mainly including resin.

A method of cleaning residual resin from an additively manufactured object, includes: (a) enclosing an additively manufactured object in an inner chamber of a centrifugal separator, the additively manufactured object including a light polymerized resin with a surface coating of viscous, unpolymerized, residual resin; (b) flooding the chamber with a volatile organic solvent vapor without contacting liquid organic solvent to the object, the vapor present in an amount sufficient to reduce the viscosity of the residual resin; and (c) spinning the additively manufactured object in the chamber to centrifugally separate at least a first portion of the residual resin from the object.

A method of cleaning residual resin from an additively manufactured object, includes: (a) enclosing an additively manufactured object in an inner chamber of a centrifugal separator, the additively manufactured object including a light polymerized resin with a surface coating of viscous, unpolymerized, residual resin; (b) flooding the chamber with a volatile organic solvent vapor without contacting liquid organic solvent to the object, the vapor present in an amount sufficient to reduce the viscosity of the residual resin; and (c) spinning the additively manufactured object in the chamber to centrifugally separate at least a first portion of the residual resin from the object.

An exhaust system includes an exhaust line configured to receive an exhaust mixture. The exhaust system further includes an oscillating assembly connected to the exhaust line. The exhaust system further includes a feedback path extending from an external gas source to the oscillating assembly, wherein the feedback path is separate from the exhaust line.

An exhaust system includes an exhaust line configured to receive an exhaust mixture. The exhaust system further includes an oscillating assembly connected to the exhaust line. The exhaust system further includes a feedback path extending from an external gas source to the oscillating assembly, wherein the feedback path is separate from the exhaust line.

The invention relates to a cleaning apparatus for cleaning, in particular, electrical components by means of a gaseous cleaning medium, comprising a cleaning chamber with an inner space and a wall arrangement enclosing same, a receptacle for the component in the inner space and a flow device for the cleaning medium, which comprises a pressurization device and comprises or forms at least one inlet into the inner space and at least one outlet from the inner space, wherein a pressure difference between the at least one inlet and the at least one outlet is providable by means of the flow device, and wherein the flow device is formed such that the cleaning medium forms a vortex flow at least in sections in the inner space from the at least one inlet to the at least one outlet.

The invention relates to a cleaning apparatus for cleaning, in particular, electrical components by means of a gaseous cleaning medium, comprising a cleaning chamber with an inner space and a wall arrangement enclosing same, a receptacle for the component in the inner space and a flow device for the cleaning medium, which comprises a pressurization device and comprises or forms at least one inlet into the inner space and at least one outlet from the inner space, wherein a pressure difference between the at least one inlet and the at least one outlet is providable by means of the flow device, and wherein the flow device is formed such that the cleaning medium forms a vortex flow at least in sections in the inner space from the at least one inlet to the at least one outlet.

The invention relates to a treatment system for treating workpieces, in particular for cleaning and/or deburring, comprising at least one treatment device that has at least one treatment unit, which is configured to perform at least one treatment operation on the workpiece, as well as at least one receiving unit for accommodating the workpiece on or in the treatment device, a transport device that comprises at least one transport unit, with which the workpiece is transferable into a transfer position, from which the workpiece is transferable by means of the at least one receiving unit into a treatment position, as well as a control device for controlling the at least one treatment unit, the at least one receiving unit, and the at least one transport unit, wherein the at least one treatment device comprises two or more receiving units for accommodating a respective workpiece for transferring independently of one another into the treatment position, and wherein the control device controls the at least one treatment unit such that the workpieces are treated by said treatment unit in a time-offset manner according to a treatment operation of the same kind. The invention also relates to a method.

The invention relates to a cleaning apparatus for cleaning, in particular, electrical components with a gaseous cleaning medium, comprising a receiving device to which the component is fixed or fixable, a nozzle device with at least one nozzle element directed or directable at the component, and a holding device for said nozzle element, wherein at least one nozzle element is adapted to at least one contour of the component, in particular an outer contour or an envelope surface, as well as a pressurization device for acting upon the nozzle device with the cleaning medium, wherein at least one nozzle element of the nozzle device is exchangeably and, in particular, releasably fixable or fixed to the holding device, and wherein the cleaning apparatus comprises at least one drive device, which is in operative connection with the component and/or with the nozzle device, for achieving a relative movement of the component and the at least one nozzle element during the cleaning. The invention also relates to a method.