A mop cleaning device includes an outer bucket, a water pump, a big cavity and a small cavity, wherein the big cavity and the small cavity are used for storing liquid, and the water volume of the big cavity is greater than that of the small cavity; the big cavity communicates with the small cavity, a valve for controlling communication of the big cavity and the small cavity is arranged between the big cavity and the small cavity, the water pump communicates with the small cavity and pumps water from the small cavity, and the outer bucket is provided with a support abutting against a mop head of a mop; and when the mop is cleaned, the valve is controlled to close a water passage between the big cavity and the small cavity, and the water pump pumps water from the small cavity to the mop to fulfill cleaning.

A mop cleaning device includes an outer bucket, a water pump, a big cavity and a small cavity, wherein the big cavity and the small cavity are used for storing liquid, and the water volume of the big cavity is greater than that of the small cavity; the big cavity communicates with the small cavity, a valve for controlling communication of the big cavity and the small cavity is arranged between the big cavity and the small cavity, the water pump communicates with the small cavity and pumps water from the small cavity, and the outer bucket is provided with a support abutting against a mop head of a mop; and when the mop is cleaned, the valve is controlled to close a water passage between the big cavity and the small cavity, and the water pump pumps water from the small cavity to the mop to fulfill cleaning.

A substrate processing apparatus includes a process module including a substrate support unit, an inverting unit and a processing unit, and a transfer module, wherein the inverting unit inverts a substrate so that a second surface faces upward, and provides the inverted substrate to the substrate support unit, wherein the processing unit performs a first processing on the second surface of the substrate seated on the substrate support unit, wherein the inverting unit inverts the first processed substrate so that the first surface faces upward, wherein the transfer module takes the substrate with a first surface facing upward out of the process module, and introduces again the substrate with a first surface facing upward into the process module to seat it on the substrate support unit, wherein the processing unit performs a second processing on the first surface of the substrate seated on the substrate support unit.

Devices and methods for cleaning an array of solar panels in side-by-side relation employ one or more elongated flexible elements, preferably implemented as translucent strips (14a, 14b, 14c, 14d), anchored at their ends relative to the array of solar panels (12). Each strip spans two or more solar panels, and is wind-displaceable so as to contribute to cleaning of at least two of the solar panels (12).

Devices and methods for cleaning an array of solar panels in side-by-side relation employ one or more elongated flexible elements, preferably implemented as translucent strips (14a, 14b, 14c, 14d), anchored at their ends relative to the array of solar panels (12). Each strip spans two or more solar panels, and is wind-displaceable so as to contribute to cleaning of at least two of the solar panels (12).

A method for removing foreign substances from a camera system is provided. The camera system includes a camera device with a transparent cover having a piezoelectric component. First, a type of the foreign substances is identified based on temperature, an image captured by the camera system, and a voltage change of the piezoelectric component. A sequence of frequencies is applied to the piezoelectric component and a resonant frequency is acquired. Thereafter, the foreign substances are removed from the camera system. A vibration frequency and a vibration time period for the piezoelectric component are determined according to the identified type of the foreign substances. The vibration frequency is based on the resonant frequency. The piezoelectric component is driven with the vibration frequency and the vibration time period, such that at least a portion of the foreign substances are removed from the transparent cover through vibration of the piezoelectric component.

A method for removing foreign substances from a camera system is provided. The camera system includes a camera device with a transparent cover having a piezoelectric component. First, a type of the foreign substances is identified based on temperature, an image captured by the camera system, and a voltage change of the piezoelectric component. A sequence of frequencies is applied to the piezoelectric component and a resonant frequency is acquired. Thereafter, the foreign substances are removed from the camera system. A vibration frequency and a vibration time period for the piezoelectric component are determined according to the identified type of the foreign substances. The vibration frequency is based on the resonant frequency. The piezoelectric component is driven with the vibration frequency and the vibration time period, such that at least a portion of the foreign substances are removed from the transparent cover through vibration of the piezoelectric component.

Electroacoustic device (5) comprising: an ultrasonic wave transducer (15) comprising a piezoelectric substrate (10) and first (30) and second (35) electrodes in contact with the piezoelectric substrate, and a carrier (10), the transducer being attached to the carrier and acoustically coupled to the carrier, and the first and second electrodes being sandwiched, at least partly, between the piezoelectric substrate and the carrier, the device being configured to generate an ultrasonic surface wave (W) propagating through the carrier at a distance from the transducer when an electric current passes through the first and second electrodes.

Electroacoustic device (5) comprising: an ultrasonic wave transducer (15) comprising a piezoelectric substrate (10) and first (30) and second (35) electrodes in contact with the piezoelectric substrate, and a carrier (10), the transducer being attached to the carrier and acoustically coupled to the carrier, and the first and second electrodes being sandwiched, at least partly, between the piezoelectric substrate and the carrier, the device being configured to generate an ultrasonic surface wave (W) propagating through the carrier at a distance from the transducer when an electric current passes through the first and second electrodes.

Device for cleaning a support member covered with a liquid Electroacoustic device (10) comprising:—a support member (50),—at least two wave transducers (15a-h) which are acoustically coupled to the support member and each configured to generate an ultrasonic surface wave (Wa-h) which propagates in the support member, the propagation directions (P) of the ultrasonic surface waves generated by the transducers being different;—a control unit (40), the device comprising an analysis unit (35) which is configured to estimate the orientation of the external force (OFe) which is applied to a liquid when the liquid is in contact with the support member and/or the device being configured to receive the estimate of the orientation of the external force, the control unit being configured to control at least one of the transducers, from the estimate of the orientation of the external force, so that the acoustic force which is applied to the liquid and produced by the interaction between the ultrasonic surface wave(s) and the liquid is orientated in a predetermined direction.