The invention relates to a cleaning apparatus for cleaning, in particular, electrical components with a gaseous cleaning medium, comprising a receiving device to which the component is fixed or fixable, a nozzle device with at least one nozzle element directed or directable at the component, and a holding device for said nozzle element, wherein at least one nozzle element is adapted to at least one contour of the component, in particular an outer contour or an envelope surface, as well as a pressurization device for acting upon the nozzle device with the cleaning medium, wherein at least one nozzle element of the nozzle device is exchangeably and, in particular, releasably fixable or fixed to the holding device, and wherein the cleaning apparatus comprises at least one drive device, which is in operative connection with the component and/or with the nozzle device, for achieving a relative movement of the component and the at least one nozzle element during the cleaning. The invention also relates to a method.

The invention relates to a cleaning apparatus for cleaning, in particular, electrical components with a gaseous cleaning medium, comprising a receiving device to which the component is fixed or fixable, a nozzle device with at least one nozzle element directed or directable at the component, and a holding device for said nozzle element, wherein at least one nozzle element is adapted to at least one contour of the component, in particular an outer contour or an envelope surface, as well as a pressurization device for acting upon the nozzle device with the cleaning medium, wherein at least one nozzle element of the nozzle device is exchangeably and, in particular, releasably fixable or fixed to the holding device, and wherein the cleaning apparatus comprises at least one drive device, which is in operative connection with the component and/or with the nozzle device, for achieving a relative movement of the component and the at least one nozzle element during the cleaning. The invention also relates to a method.

A carbide blade cleaning device includes a water pressure cleaning device, an ultrasonic cleaning device and an air drying device. The water pressure cleaning device includes a cleaning chamber for accommodating a cutter head and a water jet mechanism with an output end facing the cutter head. The ultrasonic cleaning device includes a cleaning box and a cutter head fixing box with an opening in a side surface for accommodating the cutter head, and a first telescopic mechanism drives the cutter head fixing box to adjust a relative position to the cleaning box. The air drying device includes a cutter head fixing table and an air drying mechanism with an output end facing the cutter head fixing table.

A carbide blade cleaning device includes a water pressure cleaning device, an ultrasonic cleaning device and an air drying device. The water pressure cleaning device includes a cleaning chamber for accommodating a cutter head and a water jet mechanism with an output end facing the cutter head. The ultrasonic cleaning device includes a cleaning box and a cutter head fixing box with an opening in a side surface for accommodating the cutter head, and a first telescopic mechanism drives the cutter head fixing box to adjust a relative position to the cleaning box. The air drying device includes a cutter head fixing table and an air drying mechanism with an output end facing the cutter head fixing table.

A charged particle beam system is disclosed, comprising: a charged particle beam generator for generating a beam of charged particles; a charged particle optical column arranged in a vacuum chamber, wherein the charged particle optical column is arranged for projecting the beam of charged particles onto a target, and wherein the charged particle optical column comprises a charged particle optical element for influencing the beam of charged particles; a source for providing a cleaning agent; a conduit connected to the source and arranged for introducing the cleaning agent towards the charged particle optical element;

wherein the charged particle optical element comprises: a charged particle transmitting aperture for transmitting and/or influencing the beam of charged particles, and at least one vent hole for providing a flow path between a first side and a second side of the charged particle optical element,

wherein the vent hole has a cross section which is larger than a cross section of the charged particle transmitting aperture.

Further, a method for preventing or removing contamination in the charged particle transmitting apertures is disclosed, comprising the step of introducing the cleaning agent while the beam generator is active.

A charged particle beam system is disclosed, comprising: a charged particle beam generator for generating a beam of charged particles; a charged particle optical column arranged in a vacuum chamber, wherein the charged particle optical column is arranged for projecting the beam of charged particles onto a target, and wherein the charged particle optical column comprises a charged particle optical element for influencing the beam of charged particles; a source for providing a cleaning agent; a conduit connected to the source and arranged for introducing the cleaning agent towards the charged particle optical element;

wherein the charged particle optical element comprises: a charged particle transmitting aperture for transmitting and/or influencing the beam of charged particles, and at least one vent hole for providing a flow path between a first side and a second side of the charged particle optical element,

wherein the vent hole has a cross section which is larger than a cross section of the charged particle transmitting aperture.

Further, a method for preventing or removing contamination in the charged particle transmitting apertures is disclosed, comprising the step of introducing the cleaning agent while the beam generator is active.

A substrate processing apparatus according to an embodiment includes: a liquid supplier configured to supply a processing liquid to a surface of a substrate; a temperature detector configured to detect a surface temperature of the substrate supplied with the processing liquid by the liquid supplier; a temperature monitor configured to determine whether or not the surface temperature detected by the temperature detector has reached a predetermined temperature; and a controller configured to cause the liquid supplier to stop supplying the processing liquid when the temperature monitor determines that the surface temperature has reached the predetermined temperature.

A brush comprising a first motor to control a rotation of a brush head, a second motor to control a vibration of the brush head. In one embodiment, the brush further comprises a controller to control of a ratio between the rotation and the vibration.

A brush comprising a first motor to control a rotation of a brush head, a second motor to control a vibration of the brush head. In one embodiment, the brush further comprises a controller to control of a ratio between the rotation and the vibration.

A system for on-wing engine washing and water reclamation is provided. The system has at least one spray device for introducing a cleaning liquid containing at least water into the engine while the engine is being operated, and an effluent trough for collecting the cleaning liquid from an exit end or underneath side of the engine. In a preferred embodiment, a source of the cleaning liquid and the effluent trough are located on a mobile unit. Further, a treatment system for treating the collected cleaning liquid is also located on a mobile unit.