A method of cleaning a collector of an extreme ultraviolet light source system includes introducing the collector separated from the extreme ultraviolet light source system into a chamber; capturing an optical image of a reflective surface of the collector; measuring a contamination level of the reflective surface by comparing the optical image with a prestored standard image; performing a first cleaning operation if the contamination level exceeds a preset first reference value, the first cleaning operation including cleaning the reflective surface by spraying dry ice particles onto the reflective surface; and performing a second cleaning operation if the contamination level is less than or equal to the preset first reference value. The second cleaning operation includes cleaning the reflective surface by radiating atmospheric plasma onto the reflective surface and measuring a microcontamination level and a damage level of the reflective surface.

A method of cleaning a collector of an extreme ultraviolet light source system includes introducing the collector separated from the extreme ultraviolet light source system into a chamber; capturing an optical image of a reflective surface of the collector; measuring a contamination level of the reflective surface by comparing the optical image with a prestored standard image; performing a first cleaning operation if the contamination level exceeds a preset first reference value, the first cleaning operation including cleaning the reflective surface by spraying dry ice particles onto the reflective surface; and performing a second cleaning operation if the contamination level is less than or equal to the preset first reference value. The second cleaning operation includes cleaning the reflective surface by radiating atmospheric plasma onto the reflective surface and measuring a microcontamination level and a damage level of the reflective surface.

A decontamination system with a water inlet to receive water from a water source, and a disinfectant inlet to receive disinfectant from a disinfectant source. A dispenser mixes the disinfectant with the water, according to a desired concentration, to produce a disinfectant solution. A supply valve releases a desired amount of the disinfectant solution. A reservoir with a substantially open top receives the desired amount of disinfectant solution. A mat within the reservoir is adapted to be stood upon by a user and remain substantially in place within the reservoir while the user scrubs the soles of shoes worn by the user against the mat. An overflow valve on a sidewall of the reservoir allows disinfectant solution within the reservoir to flow out of the reservoir when the disinfectant solution attains a desired depth within the reservoir.

Provided are a cleaning composition for removing an organic material remaining on an organic layer and a method of forming a semiconductor device using the composition. The cleaning composition includes 0.01-5 wt %. hydroxide based on a total weight of the cleaning composition and deionized water.

Provided are a cleaning composition for removing an organic material remaining on an organic layer and a method of forming a semiconductor device using the composition. The cleaning composition includes 0.01-5 wt %. hydroxide based on a total weight of the cleaning composition and deionized water.

Methods and apparatus to reduce biological carryover using induction heating are disclosed herein. An example method includes washing an aspiration and dispense device. The example method includes generating an alternating electromagnetic field and introducing the aspiration and dispense device into the alternating electromagnetic field. The example method includes inductively heating the aspiration and dispense device with the alternating electromagnetic field. In the example method, the washing is to occur in concert with the heating.

Methods and apparatus to reduce biological carryover using induction heating are disclosed herein. An example method includes washing an aspiration and dispense device. The example method includes generating an alternating electromagnetic field and introducing the aspiration and dispense device into the alternating electromagnetic field. The example method includes inductively heating the aspiration and dispense device with the alternating electromagnetic field. In the example method, the washing is to occur in concert with the heating.

The present invention relates to a process for cleaning a solid support of a fermentation reactor for the production of alcohols by fermentation using a sugary fluid, the solid support comprising a polyurethane foam inoculated with a biomass produced by a solvent-producing strain belonging to the genus Clostridium, the process comprising placing the solid support in contact with a fluid originating from the fermentation must enriched in alcohol and/or acetone and/or an aqueous solution at basic pH.

The present invention relates to a process for cleaning a solid support of a fermentation reactor for the production of alcohols by fermentation using a sugary fluid, the solid support comprising a polyurethane foam inoculated with a biomass produced by a solvent-producing strain belonging to the genus Clostridium, the process comprising placing the solid support in contact with a fluid originating from the fermentation must enriched in alcohol and/or acetone and/or an aqueous solution at basic pH.

An outer peripheral end of the substrate is held with a plurality of chuck pins provided at a spin plate abutting against a plurality of portions of the outer peripheral end of the substrate, and the spin plate is rotated about a rotation axis. A cleaning head is moved by a head moving mechanism while being pressed against a back surface of the substrate held by the plurality of chuck pins by the head moving mechanism, and foreign matter on the back surface of the substrate is removed by polishing with the cleaning head. A reaction force against a load applied to the back surface of the substrate by the cleaning head is generated in the substrate by auxiliary pins. Alternatively, the back surface of the substrate, which has been cleaned or is being cleaned by the cleaning head, is further cleaned by a cleaning brush.