A cleaning card for cleaning a media transport device includes a substantially planar surface. At least one of the raised surface elements includes at least one scraping element. Optionally, at least one of the raised surface elements also include surface slits that cause asymmetrical deformation of the raised surface.

A cleaning card for cleaning a media transport device includes a substantially planar surface. At least one of the raised surface elements includes at least one scraping element. Optionally, at least one of the raised surface elements also include surface slits that cause asymmetrical deformation of the raised surface.

A method of cleaning and sterilizing a drink filling apparatus that includes drink supply piping that feeds a drink sterilized in a heating sterilization part into a filling machine includes performing a cleaning in place (CIP), in which a cleaner is circulated in the drink supply piping to remove a drink residue or the like on an interior of the drink supply piping, raising a temperature of the cleaner to a temperature required for a sterilizing in place (SIP), which is performed in succession to the CIP to sterilize the interior of the drink supply piping, from an early stage or middle stage of the CIP, then performing the SIP for the interior of the drink supply piping, and washing the cleaner away with aseptic water heated and sterilized in the heating sterilization part.

A method of cleaning and sterilizing a drink filling apparatus that includes drink supply piping that feeds a drink sterilized in a heating sterilization part into a filling machine includes performing a cleaning in place (CIP), in which a cleaner is circulated in the drink supply piping to remove a drink residue or the like on an interior of the drink supply piping, raising a temperature of the cleaner to a temperature required for a sterilizing in place (SIP), which is performed in succession to the CIP to sterilize the interior of the drink supply piping, from an early stage or middle stage of the CIP, then performing the SIP for the interior of the drink supply piping, and washing the cleaner away with aseptic water heated and sterilized in the heating sterilization part.

A deposition system is provided capable of cleaning itself by removing a target material deposited on a surface of a collimator. The deposition system in accordance with the present disclosure includes a substrate process chamber. The deposition includes a substrate pedestal in the substrate process chamber, the substrate pedestal configured to support a substrate, a target enclosing the substrate process chamber, and a collimator having a plurality of hollow structures disposed between the target and the substrate, a vibration generating unit, and cleaning gas outlet.

A deposition system is provided capable of cleaning itself by removing a target material deposited on a surface of a collimator. The deposition system in accordance with the present disclosure includes a substrate process chamber. The deposition includes a substrate pedestal in the substrate process chamber, the substrate pedestal configured to support a substrate, a target enclosing the substrate process chamber, and a collimator having a plurality of hollow structures disposed between the target and the substrate, a vibration generating unit, and cleaning gas outlet.

A cleaning machine and a cleaning method for a photomask pellicle are provided. The cleaning machine at least includes: an air knife and a cleaning device. The air knife is configured to blow away contamination particles on the surface of the photomask pellicle. The cleaning device is configured to spray cleaning liquid to the surface of the photomask pellicle, to weather the contamination particles failed to be blown away by the air knife through the volatilization of the cleaning liquid. The air knife is also configured to blow away the weathered contamination particles.

A cleaning machine and a cleaning method for a photomask pellicle are provided. The cleaning machine at least includes: an air knife and a cleaning device. The air knife is configured to blow away contamination particles on the surface of the photomask pellicle. The cleaning device is configured to spray cleaning liquid to the surface of the photomask pellicle, to weather the contamination particles failed to be blown away by the air knife through the volatilization of the cleaning liquid. The air knife is also configured to blow away the weathered contamination particles.

The present disclosure relates to an apparatus and a method for wafer cleaning. The apparatus can include a wafer holder configured to hold a wafer; a cleaning nozzle configured to dispense a cleaning fluid onto a first surface (e.g., front surface) of the wafer; and a cleaning brush configured to clean a second surface (e.g., back surface) of the wafer. Using the cleaning fluid, the cleaning brush can clean the second surface of the wafer with a scrubbing motion and ultrasonic vibration.

The present disclosure relates to an apparatus and a method for wafer cleaning. The apparatus can include a wafer holder configured to hold a wafer; a cleaning nozzle configured to dispense a cleaning fluid onto a first surface (e.g., front surface) of the wafer; and a cleaning brush configured to clean a second surface (e.g., back surface) of the wafer. Using the cleaning fluid, the cleaning brush can clean the second surface of the wafer with a scrubbing motion and ultrasonic vibration.