The invention relates to a centrifuge for cleaning a reaction vessel unit and to a method for cleaning such a centrifuge. The centrifuge has a rotor and a rotor chamber, in which the rotor is arranged and mounted, the rotor features a receiving area for receiving the reaction vessel unit. The rotor chamber is limited by a housing, the housing having an outlet to drain the liquid discharged from the reaction vessels and being provided with an inlet for filling the rotor chamber with a cleaning solution in such a way, when the rotor rotates, the rotor 2 is at least partially immersed in the cleaning solution and distributes it in rotor chamber and/or the inlet is designed in such a way that the cleaning solution is distributed in rotor chamber when it is supplied by the rotating rotor.

The disclosed techniques include a space filling device to be used with a wet bench in chemical replacement procedures. The space filling device has an overall density that is higher than the chemicals used to purge the wet bench. As such, when embedded into the wet bench, or more specifically, the chemical tank of the wet bench, the space filling device will occupy a portion of the interior volume space. As a result, less purging chemicals are used to fill and bath the wet bench.

The disclosed techniques include a space filling device to be used with a wet bench in chemical replacement procedures. The space filling device has an overall density that is higher than the chemicals used to purge the wet bench. As such, when embedded into the wet bench, or more specifically, the chemical tank of the wet bench, the space filling device will occupy a portion of the interior volume space. As a result, less purging chemicals are used to fill and bath the wet bench.

A Clean-In-Place (CIP) control surveillance system has all streams forward and return monitored and accounted for, where values for each step may be stored in a data base. The CIP system used to clean one or more objects includes a primary tank for primary cleaning media, optionally a secondary tank for secondary cleaning media, a supply of freshwater, one or more forward lines, one or more return lines returning liquid, and valves directing the flow through tanks and pipes of the CIP Process Plant. The system further includes a sensors and transmitters measuring concentration in the forward line and return line and transmitting a value for the concentration to a controller, a sensor and transmitter measuring volume or mass flow in the forward line and return line, and a controller or computer configured to compare in and out values for a period.

A Clean-In-Place (CIP) control surveillance system has all streams forward and return monitored and accounted for, where values for each step may be stored in a data base. The CIP system used to clean one or more objects includes a primary tank for primary cleaning media, optionally a secondary tank for secondary cleaning media, a supply of freshwater, one or more forward lines, one or more return lines returning liquid, and valves directing the flow through tanks and pipes of the CIP Process Plant. The system further includes a sensors and transmitters measuring concentration in the forward line and return line and transmitting a value for the concentration to a controller, a sensor and transmitter measuring volume or mass flow in the forward line and return line, and a controller or computer configured to compare in and out values for a period.

A reagent bottle cleaning device is provided, comprising a base, a cleaning assembly, and a cleaning block. The cleaning assembly comprises a pushing cylinder and a mounting plate. A plurality of mounting grooves are disposed on the mounting plate. Each mounting groove is provided with a cleaning motor. The cleaning motor is provided with a cleaning screw rod. The cleaning block is provided with cleaning grooves corresponding to the cleaning screw rods. Injecting pumps are disposed between the cleaning block and the cleaning assembly. The injecting pumps are connected to the base by lifting cylinders. Full-automatic quick cleaning of reagent bottles can be realized under the effect of a main control chip.

The disclosure is directed to an apparatus, system and method for cleaning interior surfaces of storage containers such as tank trailers and other surfaces using a low volume of high pressure fluid. The apparatus of this disclosure includes one or more high pressure fluid conduits that can be extended and retracted within a storage container.

A method of cleaning a converter, the method including the steps of: providing a heating unit for heating a cleaning fluid; providing a ring main for continuous circulation of heated cleaning fluid around the ring main; connecting the heating unit to the ring main; connecting the ring main to the converter to enable delivery of heated cleaning fluid to the converter; and providing a controllable cleaning fluid valve for delivery of a heated cleaning fluid, and providing a controllable rinsing fluid valve for delivery of a rinsing fluid; providing a controller for controlled delivery of a sequence of the rinsing fluid and the heated cleaning fluid to the converter upon recognition of a rinsing fluid delivery condition and a heated cleaning fluid delivery condition, respectively.

A processing apparatus includes: a processing container; a temperature sensor that detects a temperature therein; a gas supply unit that supplies a cleaning gas into the processing container; a pressure regulation unit that regulates a pressure in the processing container; and a control unit that controls the gas supply unit and the pressure regulation unit to perform a cleaning processing of removing a deposited film in the processing container. The control unit stores a vapor pressure curve in which the temperature in the processing container is associated with a vapor pressure of water in the processing container. In the cleaning processing, the control unit sets a target pressure below the vapor pressure curve based on the temperature detected by the temperature sensor and the vapor pressure curve, and controls the pressure regulation unit such that the pressure in the processing container becomes the target pressure.

A processing apparatus includes: a processing container; a temperature sensor that detects a temperature therein; a gas supply unit that supplies a cleaning gas into the processing container; a pressure regulation unit that regulates a pressure in the processing container; and a control unit that controls the gas supply unit and the pressure regulation unit to perform a cleaning processing of removing a deposited film in the processing container. The control unit stores a vapor pressure curve in which the temperature in the processing container is associated with a vapor pressure of water in the processing container. In the cleaning processing, the control unit sets a target pressure below the vapor pressure curve based on the temperature detected by the temperature sensor and the vapor pressure curve, and controls the pressure regulation unit such that the pressure in the processing container becomes the target pressure.