The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a treating bath for liquid treating a plurality of substrates and having an accommodation space for accommodating a treating liquid; and a posture changing member for changing a posture of a substrate which is immersed in the treating liquid from a vertical posture to a horizontal posture.

A cleaning device for cleaning a single-curved glass includes: a box body, a transmission mechanism, a cleaning mechanism and a drying mechanism. The box body includes two openings. Each of the two openings is disposed on one side of the box body. The single-curved glass enters the box body through one opening and exits the box body through the other opening. The transmission mechanism includes a first drive group and two second drive groups. The first drive group is slidably disposed on the box body. The second drive groups are disposed on two sides of the first drive group on the box body. The second drive groups are to deliver the single-curved glass in the box body. The cleaning mechanism is slidably disposed on the box body to clean the single-curved glass. The drying mechanism is slidably disposed on the box body to dry the single-curved glass.

A cleaning device for cleaning a single-curved glass includes: a box body, a transmission mechanism, a cleaning mechanism and a drying mechanism. The box body includes two openings. Each of the two openings is disposed on one side of the box body. The single-curved glass enters the box body through one opening and exits the box body through the other opening. The transmission mechanism includes a first drive group and two second drive groups. The first drive group is slidably disposed on the box body. The second drive groups are disposed on two sides of the first drive group on the box body. The second drive groups are to deliver the single-curved glass in the box body. The cleaning mechanism is slidably disposed on the box body to clean the single-curved glass. The drying mechanism is slidably disposed on the box body to dry the single-curved glass.

A method for supporting a pin-type prosthetic liner includes placing the liner in an inverted state on a standoff extending from the base of a liner stand. The standoff extends to an upper end that supports the liner on the liner stand. The upper end is an open end that receives the pin of the inverted liner being supported on the liner stand.

A method for supporting a pin-type prosthetic liner includes placing the liner in an inverted state on a standoff extending from the base of a liner stand. The standoff extends to an upper end that supports the liner on the liner stand. The upper end is an open end that receives the pin of the inverted liner being supported on the liner stand.

A washing machine for washing vehicle floor mats that are made of rubber includes a housing with an interior washing chamber having an arrangement of rotating water nozzles that direct a pressurized spray of water onto the top side of the rubber floor mat that is held in opposing relation to the water nozzles. An electric motor operates a water pump to direct pressurized waterflow to the water nozzles. At the end of a washing cycle, the electric motor and pump are disabled and an air blower is activated to direct a flow of air onto the rubber floor mat during a drying cycle. A drain on the floor of the washing chamber directs the dirty water out of the housing of the machine which may be directed to a collection reservoir or the surrounding environment.

Embodiments of the present disclosure relate to the field of semiconductor manufacturing, and provide a carrier device. The carrier device includes a carrier 11 and a carrying plate 12 rotatably provided on the carrier 11, where in a non-working state, the carrying plate 12 is in an inclined position; in a working state, the carrying plate 12 is in a horizontal position. The present disclosure makes it hard for impurities such as dust to accumulate on the carrier, so as to prevent a photomask from being contaminated and improve the product yield.

An apparatus for protecting a sensor includes: a housing accommodating the sensor to allow a sensing plane of the sensor to be exposed, and mounted on an installation object, a protective film disposed to face a sensing plane of the sensor, and a moving unit installed in the housing and moving the protective film while the protective film is maintained with respect to the sensing plane of the sensor.

An apparatus for protecting a sensor includes: a housing accommodating the sensor to allow a sensing plane of the sensor to be exposed, and mounted on an installation object, a protective film disposed to face a sensing plane of the sensor, and a moving unit installed in the housing and moving the protective film while the protective film is maintained with respect to the sensing plane of the sensor.

The present invention has as an object the provision of a light irradiation device capable of performing optical cleaning with high stability regardless of the transport speed of a workpiece. The light irradiation device of the present invention emits ultraviolet light to one surface of a band-shaped workpiece transported along a transport path, and includes a lamp house having an opening along a passing plane on a side of the one surface of the workpiece in the transport path, an ultraviolet lamp provided in the lamp house so as to extend in a width direction of the workpiece, gas supplier configured to supply a treatment-space gas into the lamp house, and an exhaust space forming member having an opening along a passing plane on a side of the other surface of the workpiece in the transport path. The treatment-space gas is produced by mixing a gas containing oxygen and/or water with an inert gas serving as a principal component, and a shielding body for forming a gas circulation resistance bottleneck between the shielding body and each edge part of the workpiece is provided in the opening of the lamp house.