Patent classifications
B08B17/02
Method for Protecting an Optical Sensor of a Vehicle from Environmental Pollutants
A device and method for protecting an optical sensor of a vehicle are disclosed, wherein the sensor is protected from environmental pollutants which may adhere to an optical surface of the sensor if the sensor is exposed to them, and wherein the environmental pollutants are kept away from the sensor by an ultrasonic cleaning of the sensor surface using an ultrasonic field. The ultrasonic field of the ultrasonic cleaning is emitted by a protection device into the air to provide a protection zone around the optical surface of the sensor such that a contact of the optical surface with the environmental pollutants is avoided, wherein the environmental pollutants are moved and/or destroyed in the air away from the sensor if they enter the protection zone), and wherein the protection zone provides a contactless cleaning of the sensor.
Mitigating impact of ion buildup on pH sensor performance
A self-vibrating pH probe comprise a housing containing an electronic assembly to which is coupled a vibration source element so that at least a portion of vibrations caused by the vibration source element propagate to the electronic assembly, the vibration source element being controllable for at least on/off operation. The self-vibrating pH probe further comprising a pH probe member having a probe tip at a first end, the probe member extending from the housing and mechanically and electrically coupled by a second end to the electronic assembly so that at least a portion of vibrations propagating to the electronic assembly further propagate to the probe tip; and further including a processor coupled to the electronic assembly for coordinating operation of the vibration source element and operation of the pH probe member.
Substrate processing apparatus and substrate processing method
The substrate processing apparatus includes common piping which guides a processing liquid to a branching portion, supply piping which guides the processing liquid from the branching portion to a chemical liquid nozzle, return piping which guides the processing liquid from the branching portion, and a discharge valve which changes a flow rate of the processing liquid supplied from the common piping to the branching portion. The discharge valve makes a valve element stationary at a plurality of positions including a discharge execution position at which the processing liquid is supplied from the common piping to the branching portion at a flow rate larger than a maximum value of a suction flow rate and a discharge stop position at which the processing liquid is supplied from the common piping to the branching portion at a flow rate smaller than the maximum value of the suction flow rate.
SYSTEMS WITH ANTI-FOULING CONTROL AND METHODS FOR CONTROLLING FOULING WITHIN A CHANNEL OF A PLUG FLOW CRYSTALLIZER
The invention generally relates to systems with anti-fouling control and methods for controlling fouling within a channel of a plug flow crystallizer. In certain aspects, the invention provides a system that includes a plug flow crystallizer having a channel, one or more heating/cooling elements, each operably associated with a different segment of the channel, and a controller. The controller is operably coupled to the one or more heating/cooling elements and configured to implement a temperature profile within the channel of the plug flow crystallizer that grows crystals in a plug of fluid that flows through a first segment of the channel and dissolves encrust in a second segment of the channel while having minimal impact on crystal growth in the plug of fluid in the second segment of the channel. In certain embodiments, these segments may be cyclically alternated, in that the segment in which crystal grows in one cycle becomes the segment in which crystal dissolves in the next cycle and vice versa, to realize a fully continuous crystallization process.
METHOD AND SYSTEM FOR THE REMOVAL AND/OR AVOIDANCE OF CONTAMINATION IN CHARGED PARTICLE BEAM SYSTEMS
A charged particle beam system is disclosed, comprising: a charged particle beam generator for generating a beam of charged particles; a charged particle optical column arranged in a vacuum chamber, wherein the charged particle optical column is arranged for projecting the beam of charged particles onto a target, and wherein the charged particle optical column comprises a charged particle optical element for influencing the beam of charged particles; a source for providing a cleaning agent; a conduit connected to the source and arranged for introducing the cleaning agent towards the charged particle optical element;
wherein the charged particle optical element comprises: a charged particle transmitting aperture for transmitting and/or influencing the beam of charged particles, and at least one vent hole for providing a flow path between a first side and a second side of the charged particle optical element,
wherein the vent hole has a cross section which is larger than a cross section of the charged particle transmitting aperture.
Further, a method for preventing or removing contamination in the charged particle transmitting apertures is disclosed, comprising the step of introducing the cleaning agent while the beam generator is active.
METHOD AND SYSTEM FOR THE REMOVAL AND/OR AVOIDANCE OF CONTAMINATION IN CHARGED PARTICLE BEAM SYSTEMS
A charged particle beam system is disclosed, comprising: a charged particle beam generator for generating a beam of charged particles; a charged particle optical column arranged in a vacuum chamber, wherein the charged particle optical column is arranged for projecting the beam of charged particles onto a target, and wherein the charged particle optical column comprises a charged particle optical element for influencing the beam of charged particles; a source for providing a cleaning agent; a conduit connected to the source and arranged for introducing the cleaning agent towards the charged particle optical element;
wherein the charged particle optical element comprises: a charged particle transmitting aperture for transmitting and/or influencing the beam of charged particles, and at least one vent hole for providing a flow path between a first side and a second side of the charged particle optical element,
wherein the vent hole has a cross section which is larger than a cross section of the charged particle transmitting aperture.
Further, a method for preventing or removing contamination in the charged particle transmitting apertures is disclosed, comprising the step of introducing the cleaning agent while the beam generator is active.
DEVICE FOR PROTECTION OF AN OPTICAL SENSOR
The invention relates to a device for protection of an optical sensor, comprising—at least one nozzle (9) for projection of air in front of the optical sensor (3), the projection nozzle being arranged on a side of the optical sensor and linked to an air discharge pump (13) via a discharge conduit (15) such that the air projected by the air projection nozzle is flush with the optical sensor,—and at least one suction conduit (17) arranged on the opposite side of the optical sensor to the projection nozzle. The suction conduit is linked to the discharge conduit of the pump, downstream of the pump, such that the suction in the suction conduit is achieved by a Venturi effect.
DEVICE FOR PROTECTION OF AN OPTICAL SENSOR
The invention relates to a device for protection of an optical sensor, comprising—at least one nozzle (9) for projection of air in front of the optical sensor (3), the projection nozzle being arranged on a side of the optical sensor and linked to an air discharge pump (13) via a discharge conduit (15) such that the air projected by the air projection nozzle is flush with the optical sensor,—and at least one suction conduit (17) arranged on the opposite side of the optical sensor to the projection nozzle. The suction conduit is linked to the discharge conduit of the pump, downstream of the pump, such that the suction in the suction conduit is achieved by a Venturi effect.
DEVICE AND METHOD FOR VIBRATION OF AN IMPLANTABLE DEVICE
Devices for imparting vibration to implanted devices to reduce accumulation of biofilm thereon including a vibration tip, the vibration tip being sized and shaped to couple to a vibrator and receive a vibration therefrom, wherein the vibration tip is sized and shaped to conduct the vibration from the vibrator to an implanted device are disclosed. Methods of inhibiting biofilm formation including abutting a vibration source against an implanted device, and activating the vibration source to impart vibration to the implanted device thereby inhibiting a formation of biofilm on the implanted device are also disclosed.
DEVICE AND METHOD FOR VIBRATION OF AN IMPLANTABLE DEVICE
Devices for imparting vibration to implanted devices to reduce accumulation of biofilm thereon including a vibration tip, the vibration tip being sized and shaped to couple to a vibrator and receive a vibration therefrom, wherein the vibration tip is sized and shaped to conduct the vibration from the vibrator to an implanted device are disclosed. Methods of inhibiting biofilm formation including abutting a vibration source against an implanted device, and activating the vibration source to impart vibration to the implanted device thereby inhibiting a formation of biofilm on the implanted device are also disclosed.