Proposed are a process fluid treatment apparatus capable of decomposing ozone in a process fluid more effectively, and a wafer cleaning apparatus and semiconductor manufacturing equipment including the same. The process fluid treatment apparatus treats the process fluid used for cleaning a wafer in the semiconductor manufacturing equipment, and includes a housing having an inner space configured to contain the process fluid, a spray nozzle configured to spray the process fluid containing ozone into the inner space in the form of mist, and a nozzle heater configured to heat the process fluid passing through the spray nozzle.

A method and associated apparatus for cleaning a secure instrument including a substrate, visual data and a security feature, including exposing the secure instrument to ozone sufficient to clean the substrate and not compromise the security feature and the visual data, where to clean the substrate includes to remove one or more substances from the substrate into the ozone or to chemically alter the one or more substances in or on the substrate such that exposing the secure instrument to a supercritical fluid removes the one or more substances.

A cleaning apparatus for cleaning a substrate wherein the substrate is contacted with ozonated water and irradiating the substrate and the ozonated water with UV electromagnetic radiation from a UV lamp within a cleaning chamber; wherein greater than or equal to about 50% of the UV electromagnetic radiation has a wavelength of greater than or equal to about 280 nm. Methods of cleaning a substrate are also presented.

A substrate treatment method is used for removing a resist from a front surface of a substrate. A substrate treatment apparatus includes a substrate holding unit which holds the substrate, and a sulfuric acid ozone/water mixture supplying unit which supplies a sulfuric acid ozone/water mixture to the front surface of the substrate held by the substrate holding unit, the sulfuric acid ozone/water mixture being a mixture which is prepared by a method including mixing water with sulfuric acid ozone prepared by dissolving ozone gas in sulfuric acid.

Embodiments of the present disclosure relate generally to systems and methods for combing ozone and water to deliver ozonated water in a rinse stream. The ozone rain pan finds particular use for rinsing food products traveling along a conveyor line with ozonated water.

A substrate processing method is provided, which includes: a substrate holding step of causing a substrate holding unit to hold a substrate; an ozone-containing hydrofluoric acid solution supplying step of supplying an ozone-containing hydrofluoric acid solution containing ozone dissolved therein a hydrofluoric acid solution to one major surface of the substrate held by the substrate holding unit; a brush-cleaning step of cleaning the one major surface of the substrate by bringing a cleaning brush into contact with the one major surface of the substrate after the ozone-containing hydrofluoric acid solution supplying step; and an ozone water supplying step of supplying ozone water to the one major surface of the substrate before start of the brush-cleaning step after the ozone-containing hydrofluoric acid solution supplying step or in the brush-cleaning step.

Embodiments of the present disclosure relate generally to systems and methods for combing ozone and water to deliver ozonated water in a rinse stream. The ozone rain pan finds particular use for rinsing food products traveling along a conveyor line with ozonated water.

An apparatus for applying a liquid medium irradiated with UV radiation onto a substrate is disclosed, the apparatus comprising: a housing having an elongated chamber, at least one inlet opening, which opens into the chamber, and at least one slit shaped outlet opening opposite the inlet opening, which extends over the length of the chamber, a tube element, which extends in a longitudinal direction through the chamber, the tube element being at least partially transparent to UV radiation, wherein the tube element is arranged in the chamber such that a flow space is formed between the tube element and the wall of the chamber, the flow space being symmetric with respect to a longitudinal centre plane of the chamber, the longitudinal centre plane dissecting the outlet opening in its middle, and such that the tube element extends into the slit shaped outlet opening in the housing and thereby forms two longitudinally extending outlet slits between the tube element and the housing, and at least one UV-radiation source in the tube dement, which is arranged to emit UV-radiation in the direction of the flow space and through the outlet opening out of the housing. The apparatus is distinguished by means for causing UV radiation to be emitted primarily in a first wavelength range through a first section of the tube member into the flow space and for causing UV radiation to be emitted primarily in a second wavelength range through a second section of the tube member through the outlet opening of the housing and optionally into an end region of the flow space adjacent to the outlet slits. The first and second wavelength ranges differ, and wherein for at least one of the sections, a maximum of 20%, preferably a maximum of 5%, of the radiation power emitted through the respective section comes from the other wavelength range.

The present invention relates to a laundry-care appliance (100) having a washing tub (107) and a deodorizing module (109) for dispensing deodorizing substance into the washing tub (107), wherein the deodorizing module (109) is connected to the washing tub (107) and comprises a radial fan (115) for ventilating the washing tub (107), wherein the radial fan (115) is drivable in a first direction of rotation (121) and in a second direction of rotation (123). The deodorizing module (109) is configured to dispense deodorizing substance into the washing tub (107) in a first period of time, wherein the radial fan (115) is drivable in the first direction of rotation (121) in the first period of time in order to distribute the deodorizing substance in the washing tub (107). The radial fen (115) is drivable in the second direction of rotation (123) in a second period of time following the first period of time, in order to remove the deodorizing substance from the washing tub (107) in the second period of time.

Plant for washing and sanitising the udders of dairy animals of the type consisting of a control panel (1), for the management and the control of the entire plant, a tank (2) for water collection and delivery, a motor body (3) for plant management and a brush body (4) for animal treatment, characterised in that ozone generator (5), structure for ozone enrichment of the water delivered by said tank (2) and structure for drying the udders with ozone once the washing has been completed and furthermore provided.