The present disclosure describes a wafer cleaning process in which a drained cleaning solution, which is used to remove metal contaminants from the wafer, is sampled and analyzed to determine the concentration of metal ions in the solution. The wafer cleaning process includes dispensing, in a wafer cleaning station, a chemical solution on one or more wafers; collecting the dispensed chemical solution; determining a concentration of contaminants in the chemical solution; in response to the concentration of the contaminants being greater than a baseline value, adjusting one or more parameters in the cleaning process; and in response to the concentration of the contaminants being equal to or less than the baseline value, transferring the one or more wafers out of the wafer cleaning station.

A robotic arm can clean an end-of-arm tool using a cleaning station. The end-of-arm tool can be positioned at an introduction position with a portion of the end-of-arm tool in contact with a cleaning agent contained within the cleaning station. The end-of-arm tool can be positioned at a scrubbing position with the end-of-arm tool in contact with a cleaning surface. And the end-of-arm tool can be positioned at a drying position for drying of the end-of-arm tool.

In an embodiment, a method includes: receiving a wafer from a first dilution tank; immersing the wafer in a deionization tank, wherein the deionization tank comprises a tank solution that comprises a deionizing solution; determining a metal ion concentration within the tank solution; performing remediation within the deionization tank in response to determining that the metal ion concentration is greater than a threshold value; and moving the wafer to a second dilution tank.

A chemical mechanical polishing system includes a platen to support a polishing pad, a carrier head, a motor to generate relative motion between the platen and the carrier head, a steam generator including a vessel having a water inlet and one or more steam outlets and a heating element configured to apply heat to a portion of lower chamber to generate steam, a nozzle oriented to deliver steam from the steam generator onto the polishing pad, a tank to hold a cleaning fluid, a first valve in a first fluid line between the vessel and the nozzle to controllably connect and disconnect the vessel and the nozzle, a second valve in a second fluid line between the vessel and the tank to controllably connect and disconnect the vessel and the tank such that steam from the vessel heats fluid in the tank.

Disclosed is an automatic die cleaning device with reusable cleaning fluid. The automatic die cleaning device includes a robot, a cleaning fluid cyclic-spraying system and a die overturning mechanism. The automatic die cleaning device can spray the cleaning fluid to a die to clean oil stains off the surface of the wheel die, thus realizing the function of automatically cleaning the oil stains off the surface of the die; and the automatic die cleaning device also has the function of reusing the cleaning fluid, thereby saving the cleaning fluid and reducing the influence on the environment. The cleaned die surface is smooth, and the effect is ideal. The automatic die cleaning device reduces the labor intensity, meets the requirement of high-efficiency production, and improves the production efficiency.

Provided is a carwash machine. The carwash machine includes: a steam generator and a spray gun connected to the steam generator. The steam generator has a gas outlet used for discharging gas. The spray gun includes a spray gun outer shell and an operating handle. The operating handle is provided on the spray gun outer shell. The steam generator includes: a boiler body, the boiler body having a combustion chamber, and the combustion chamber being in communication with the gas outlet; an inner cover, the inner cover being sleeved on an outer side of the boiler body, and a gap between the inner cover and the boiler body forming a gas discharge channel used for connecting the combustion chamber and the gas outlet; and an outer cover, the outer cover being sleeved on an outer side of the inner cover. The spray gun also includes: a locking switch.

The present invention discloses a molten salt ultrasonic cleaning machine. the molten salt ultrasonic cleaning machine includes a tank body, a molten salt heating system, an ultrasonic application system and a stirring system, wherein the tank body is configured to accommodate molten salt and a to-be-cleaned workpiece; the tank body includes a bottom wall, and a side wall arranged circumferentially in a surrounding way; the molten salt heating system is configured to heat the molten salt in the tank body; the ultrasonic application system is configured to apply ultrasonic impact to the to-be-cleaned workpiece in the tank body; and the stirring system includes a stirring rod which is rotatably arranged in the tank body. When the molten salt ultrasonic cleaning machine provided by the present invention cleans a workpiece, the stirring rod rotates to improve the flowability of the molten salt. In combination with the ultrasonic impact, rapid removal of pollutants in the complex space of the workpiece and pollutants on the bottom layer of the surface is accelerated, so that the cleaning efficiency is improved. Moreover, the improvement of the molten salt flowability can promote complete reaction between the unreacted paint and residues which float on the surface of the liquid level, and the molten salt, so that the quantity of generated waste gas is reduced.

A nozzle for generating fine bubbles, the nozzle including: a hollow housing; and a plurality of plates provided in the housing and partitioning the housing into a plurality of spaces, wherein an upper face or a side face of the housing is provided with an inflow port into which a gas-dissolved liquid flows and which communicates with an uppermost space of the spaces partitioned by the plate, each of the plates is provided with a plurality of through-holes, and a lower face of the housing is provided with a slit communicating with a lowermost space of the spaces partitioned by the plate.

The substrate treating apparatus includes a liquid supply unit for supplying a treating liquid to a substrate supported by a support unit, the liquid supply unit includes a nozzle member for discharging the treating liquid; and a driving member for moving the nozzle member to a standby position and a process position, the nozzle member includes a body having a buffer space and a discharge port configured to discharge the treating liquid; and a rotation member for changing the body between a first state and a second state by a rotation, the first state is a state at which a treating liquid filled in the buffer space is maintained so the treating liquid does not flow to the discharge port, and the second state is a state at which the treating liquid filled in the buffer space is discharged to an outside of the body through the discharge port.

The present disclosure provides an electric steam control method, a system thereof, and a steam cleaner. The method includes: obtaining current water temperature data of a hot water tank and a current power supply mode; determining whether a temperature corresponding to the current water temperature data is within a preset temperature range; and if the temperature is within the preset temperature range, entering a heat preservation mode, else detecting whether AC power is currently available; if the AC power is available, performing power supply using the AC power, else generating a water temperature alarm signal; and in the heat preservation mode, detecting whether a working state is currently in place; if the working state is in place, detecting whether the AC power is currently available and generating a steam ejection signal, and performing power supply by using the AC or DC power, else maintaining the heat preservation mode.