A system and method for cleaning, rinsing, and sanitizing a container is disclosed. The system has a sanitizing agent chamber for storing a sanitizing agent, the one or more solution chambers in fluid communication with the container, a pump in fluid commination with the sanitizing agent, wherein the pump is in communication with a gas, and at least one spray nozzle fluidly connected to the at least one solution chamber via a conduit positioned within the container, wherein the spray nozzle comprises a housing inside which the sanitizing agent is mixed at pressure with the gas to disperse the sanitizing agent and gas mixture into the container for sanitizing the container.

An apparatus for processing a substrate includes a housing having a processing space in which the substrate is processed, a support unit that supports the substrate in the processing space, a nozzle that dispenses a chemical onto the substrate placed on the support unit, a chemical supply unit that supplies the chemical to the nozzle, and a controller that controls the chemical supply unit.

Contained fluid application systems may be used to wash and disinfect large vehicles and equipment in extreme temperatures and remote locations. One system has a base having a platform, a washing station positioned on the base, an enclosure having an internal chamber, a conduit system connecting a fluid container to spray members, and a heating device that provides heat to the internal chamber and a duct system in the base. The system may recapture fluid and prevent freezing of fluid on the surface of the base while being able to apply washing and disinfecting fluid around the entire perimeter of a large vehicle or equipment in the washing station. The system is a unit that can be deployed rapidly and transported easily due to the unitary base and minimal amount of post-deployment assembly needed.

A cleaning system for processing a substrate after polishing includes a sulfuric peroxide mix (SPM) module, at least two cleaning elements, and a plurality of robots. The SPM module includes a sulfuric peroxide mix (SPM) cleaner having a first container to hold a sulfuric peroxide mix liquid and five to twenty first supports to hold five to twenty substrates in the liquid in the first container, and a rinsing station having a second container to hold a rinsing liquid and five to twenty second supports to hold five to twenty substrates in the liquid in the second container. Each of the at least two cleaning elements are configured to process a single substrate at a time. Examples of a cleaning element include a megasonic cleaner, a rotating brush cleaner, a buff pad cleaner, a jet spray cleaner, a chemical spin cleaner, a spin drier, and a marangoni drier.

An apparatus and method for removing support material from a part formed by three-dimensional (3D) printing. The support removal machine contains a tank for submersion of a 3D printed part into a liquid mass. The liquid mass circulates in the tank in a controlled manner such that submerged parts remain centrally suspended in the tank, regardless of the material, density and geometry comprising the part. The part circulates and rotates in conjunction with the rotational flow of the liquid mass for uniform exposure to means of support removal. During rotation, the part may be subjected to multiple means of agitation that include heat, chemical and ultrasonic, in order to optimize energy use and maximize efficiency of the removal of support material.

Caustic-free detergent compositions are provided. Detergent compositions including an aminocarboxylate, water conditioning agent, non-caustic source of alkalinity and water beneficially do not require the use of additional surfactants and/or polymers to provide suitable detergency and prevent scale build-up on treated surfaces and enhance protein removal from the treated surfaces. Beneficially the detergent compositions have a concentrate pH less than about 11.5. The detergent compositions are used with a sanitizer to employ the low alkaline detergent compositions are particularly suitable for use as low temperature ware wash detergents that beneficially reduce scale build-up. Methods of employing the low alkaline detergent compositions are also provided.

Provided is a method of treating a substrate, the method comprising: heating a treatment liquid with a heater unit installed in a circulation line while circulating the treatment liquid in a housing of a tank through the circulation line coupled to the housing to adjust a temperature of the treatment liquid; evaporating water in the treatment liquid in the housing by heating the treatment liquid to a temperature higher than a temperature of water contained in the treatment liquid by the heater unit to adjust a concentration of a chemical liquid contained in the treatment liquid; and supplying the treatment liquid of which the temperature and the concentration are controlled to a substrate to treat the substrate, in which the evaporation of water from the treatment liquid stored in the housing is accelerated by supplying gas to the treatment liquid flowing through the circulation line.

Many conveying units for media capable of flow are used for products that are harmful to the environment and at least attack the conveying units themselves over time or deposit in them and clog them. Cleaning of the conveying units is therefore recommended, but such cleaning represents an effort that is preferably not made, because of the effort involved. Against this background, an apparatus for cleaning of conveying units, which apparatus can run both in simple manner and practically without supervision, uses a cleaning circuit in which the conveying unit to be cleaned is short-circuited with a cleaning agent tank and thereby constant circulation of cleaning agent through the conveying unit to be cleaned is pumped and the unit is thereby cleaned.

Provided is a liquid supply unit for supplying a treatment liquid to a nozzle that discharges the treatment liquid to a substrate, the liquid supply unit including: a tank for storing the treatment liquid; a main circulation line for supplying the treatment liquid from an internal space of the tank to the nozzle or for recovering the treatment liquid to the internal space of the tank; a supply line connected to the main circulation line to supply the treatment liquid to the nozzle; and a heater module installed in the main circulation line and heating the treatment liquid flowing through the main circulation line to a predetermined temperature, in which the heater module includes: a pipe in which the treatment liquid flows and which is made of a quartz material; and a heating element provided on a surface of the pipe.

The substrate processing apparatus includes common piping which guides a processing liquid to a branching portion, supply piping which guides the processing liquid from the branching portion to a chemical liquid nozzle, return piping which guides the processing liquid from the branching portion, and a discharge valve which changes a flow rate of the processing liquid supplied from the common piping to the branching portion. The discharge valve makes a valve element stationary at a plurality of positions including a discharge execution position at which the processing liquid is supplied from the common piping to the branching portion at a flow rate larger than a maximum value of a suction flow rate and a discharge stop position at which the processing liquid is supplied from the common piping to the branching portion at a flow rate smaller than the maximum value of the suction flow rate.