Disclosed are a substrate processing apparatus and a substrate processing method that allow a chemical liquid to penetrate deeply into a gap between patterns of a substrate. The substrate processing apparatus includes a chamber having a processing space defined therein in which a substrate is processed; a chuck installed in the processing space and configured to support the substrate thereon; a chemical liquid supply formed on top of the chuck and configured to supply a chemical liquid droplet toward an upper surface of the substrate supported on the chuck; and a pressurizer formed on top of the chuck and configured to pressurize the chemical liquid droplet supplied on the upper surface of the substrate so that the pressed chemical liquid droplet fills a gap between patterns formed on the substrate.

Systems and methods for cleaning a heat recovery steam generator system including tubes and fins associated therewith using deep cleaning alignment equipment are described. The deep cleaning alignment equipment primarily includes at least one wedge and at least one wand. The wedge may be an elongate wedge configured to maximize the surface area that contacts the tubes and fins, which in turn minimizes the amount of stress about any specific point of the tubes or the fins. Additionally, the wedge may be made of a soft, composite material, such as a high strength carbon fiber nylon. The composite material is softer than the material that makes the tubes and fins. As a result, when the wedge contacts the tubes and fins, the tubes and fins will not sustain damage. Instead, any damage that may occur would be to the wedge.

A drone cleaning apparatus includes a drone; and a pressure washer or power washer comprising a wand with nozzle, hose, and motor unit. The wand is fastened to an underside of the drone, with the hose attached to and connecting the wand and the motor unit. When the motor unit is turned on, a liquid jet emanates from the nozzle of the wand and may be directed onto a building for cleaning of the building. A method of making the drone cleaning apparatus, comprises: providing a drone and a pressure washer or power washer comprising a wand with nozzle, hose, and motor unit; attaching the wand to a bottom of the drone; and connecting the hose to the wand and to the motor unit.

A substrate is held by an upper holding device, and a lower-surface center region of the substrate is cleaned with use of a lower-surface brush. The substrate is lowered from an upper holding device and transferred to a suction holder of a lower holding device. The substrate held by the suction holder is cleaned with use of a processing liquid. A cup is provided to be liftable and lowerable between an upper cup position and a lower cup position. The cup is in the lower cup position when waiting. A period for the substrate lowering operation and a period for the cup lifting operation at least partially overlap with each other.

The present invention relates to a treatment liquid discharge assembly and a treatment liquid discharge method, and the treatment liquid discharge assembly includes a drain manifold connected to at least one discharge line of the substrate treatment apparatus and configured to define a predetermined accommodation space to temporarily accommodate a treatment liquid, and a drain pipe connected to a bottom surface of the accommodation space, in which the drain pipe defines a level difference with a predetermined height in the accommodation space of the drain manifold, and the drain pipe protrudes by the predetermined height from a bottom surface of the accommodation space toward an upper side of the accommodation space to define a buffer space in which the treatment liquid.

Proposed are a substrate treatment apparatus and a substrate treatment method, and a technology capable of reducing a nozzle driving deviation between facilities by feedback a repetitive operation of a nozzle driving cylinder of the substrate treatment apparatus and by correcting an air input flow rate of the nozzle driving cylinder according to an error in the operation of the nozzle driving cylinder is provided.

Cleaning assemblies, particularly for conveyor systems, are provided. For example, a cleaning assembly comprises a split fluid jet head that includes an inlet end for receipt of a flow of a fluid, an outlet end for an egress of the fluid, and a plurality of veins extending from the inlet end to the outlet end. The plurality of veins split the flow of the fluid into a plurality of flows of the fluid. The cleaning assembly also comprises a manifold that includes a body and a plurality of fluid passages defined through the body. Each fluid passage has an inlet port and an outlet port. The outlet ports are defined at various locations along the body. The manifold is configured to receive the split fluid jet head such that each vein of the plurality of veins is aligned with an inlet port of the plurality of inlet ports.

A flowback tank cleaning system and method is described. A flowback tank includes a self-cleaning system. A flowback tank cleaning method may include moving solid debris collected at a bottom of a collection section of a flowback tank towards a lift auger using a cleaning auger or a conveyer belt extending along a length of the collection section, the bottom of the collection section including an angled trough, funneling solid debris towards the cleaning auger or conveyor belt by placing the cleaning auger or conveyor belt at a base of the angled trough, spraying fluid downward through a series of fluid outlets, removing the sand so moved by the cleaning auger or conveyer belt from the flowback tank using the lift auger, and removing the fluid from the flowback tank using a drain manifold below the cleaning auger or conveyer belt.

A self-cleaning pool or spa filter system having a filter body housing a set of filter cartridges, each filter cartridge rotatably connected to a filter holder, a spray manifold having an inlet for receiving water from a pump and a plurality of sprayers, a shaft connected to the filter holder and a motor, which can rotate the shaft and thus the filter holder, causing the set of filter cartridges to rotate about the shaft, exposing lengthwise each filter cartridge to the sprayers; a sun gear attached to the first shaft; and a set of planet gears, each planet gear being concentrically associated with one filter cartridge and engaged by the sun gear, causing transfer of a rotational movement of the sun gear to each planet gear and to each filter cartridge, causing each filter cartridge to rotate, exposing the entire circumference of each filter cartridge to the plurality of sprayers.

A wafer cleaning apparatus including a rotating plate configured to support a wafer thereon, and a cleaning unit above the rotating plate and configured to spray cleaning water, wherein the cleaning unit includes a body, a nozzle in the body, at least one supply pipe connected to the nozzle and configured to supply a cleaning substance, and a discharge member at a lower end portion of the nozzle and configured to discharge the cleaning water, which includes the cleaning substance, wherein the discharge member has a spraying port configured spray the cleaning water therethrough, and wherein the spraying port has an X shape may be provided.