A substrate processing apparatus includes a support unit, a supply unit, an annular member, a rotation unit, a cover member, and an annular flow regulation member disposed above the cover member. The annular member includes an inclined surface inclined downward toward a center of the annular member in a radial direction. The flow regulation member includes a base portion and a protrusion which faces a circumferential portion of the substrate supported on the support unit and protrudes from the base portion toward the circumferential portion of the substrate. The protrusion overlaps the support unit when viewed in a vertical direction. A lower surface of the protrusion is positioned above an upper surface of the substrate supported on the support unit and positioned below an upper surface of the annular member. An inner circumferential surface of the protrusion is inclined radially outward from an upper side to a lower side.

A self-cleaning surface system, comprising one or more rotatable bodies (19); a support structure (3) supporting the one or more rotatable bodies, wherein the one or more rotatable bodies are configured to rotate with respect to the support structure about a corresponding rotation axis, said one or more rotatable bodies having a corresponding cleanable surface (1) which is parallel to the corresponding rotation axis and being configured to rotate together with the corresponding rotatable body, from facing a first direction to facing a second direction and vice versa, the first direction being opposite to the second direction; a rotation mechanism; a cleaning mechanism comprising a cleaning fluid ejection mechanism; and an activation mechanism, wherein the cleaning fluid ejection mechanism when activated is arranged to eject a cleaning fluid towards said one or more cleanable surfaces when the latter face the second direction.

An articulated boom assembly comprises a base and a primary boom arm extending from the base. There is a power system for actuating the primary boom arm between an extended position and a retracted position. There is an attachment operatively connected to the primary boom arm which supports a nozzle. The attachment may include an actuating mechanism for reciprocating the nozzle along the length of the attachment.

Disclosed is a wheel cleaning device, comprising a frame, a waste water recovery tank, lifting guide posts, a feeding support plate, a lifting cylinder, a lifting platform, a support plate, an adjusting cylinder, a left slide plate, bolt hole cleaning spray pipes, clamping cylinders, a left clamping slide plate, a central cleaning spray pipe, clamping wheels, left spray pipes, left upper spray pipes, right upper spray pipes, right spray pipes, shafts, a right clamping slide plate, servo motors, clamping guide rails, clamping system support plates, a support, a right slide plate, a gear rack structure and a guide rail. The device can clean aluminum scraps remaining in bolt holes, flange drainage channels and weight reduction pits, meets the requirements of automatic production lines, and has the characteristics of compact structure, flexibility, practicability, stability, high efficiency and the like.

Cleaning assemblies, particularly for conveyor systems, are provided. For example, a cleaning assembly comprises a split fluid jet head that includes an inlet end for receipt of a flow of a fluid, an outlet end for an egress of the fluid, and a plurality of veins extending from the inlet end to the outlet end. The plurality of veins split the flow of the fluid into a plurality of flows of the fluid. The cleaning assembly also comprises a manifold that includes a body and a plurality of fluid passages defined through the body. Each fluid passage has an inlet port and an outlet port. The outlet ports are defined at various locations along the body. The manifold is configured to receive the split fluid jet head such that each vein of the plurality of veins is aligned with an inlet port of the plurality of inlet ports.

A polishing device has a substrate stage which holds a substrate Wf, a processing head which processes a surface of the substrate Wf, an indentation detecting system which detects a position of an indentation in the substrate Wf, a movement mechanism which moves the processing head in a radial direction of the substrate stage, and a rotation mechanism which rotates the substrate stage, and the indentation detecting system has a fluid injection nozzle configured to inject a fluid to a circumferential edge portion of the substrate Wf when the substrate Wf is held on the substrate stage, a fluid measuring device which measures a physical quantity which is pressure or a flow rate of the fluid, and a position detector which detects the position of the indentation formed in the circumferential edge portion of the substrate Wf based on a change in physical quantity.

A mobile washing system and methods for washing photovoltaic panels. The mobile washing system includes a vehicle, a fluid tank coupled to the vehicle, and a washing apparatus mounted to a side of the vehicle. The washing apparatus includes two generally longitudinal spray pipes that are configured to be rotated and vertically adjusted with respect to the vehicle to position the spray pipes generally parallel to a top surface of the photovoltaic panels.

A wand apparatus for controlling a pressure washing system and an associated method for controlling a pressure washing system is provided. The wand apparatus may include a first wand portion and a second wand portion. The wand apparatus may further include a chemical control assembly that includes a housing and a chemical control element. The housing defines an outlet aperture, an inlet aperture, and a chemical control aperture. The chemical control aperture is configured to operably engage the chemical control element. The outlet aperture is configured to operably engage the first wand portion, and the inlet aperture is configured to operably engage the second wand portion. Further, operable engagement of the chemical control element may provide for switching the wand apparatus between a chemical spray configuration and a wash spray configuration.

A substrate treatment apparatus, comprising: a coating device configured to coat a substrate, which is conveyed at a first speed in a feeding direction, with a material; a drying device configured to receive the substrate, which is coated by means of the coating device, at the first speed and dry the material; an exposure device configured to receive the substrate, which is dried by means of the drying device, at the first speed and continuously convey a mask at the first speed in the feeding direction, the mask being used for regional shading during exposure of the material by means of the exposure device; and an etching device configured to receive the substrate, which is exposed by means of the exposure device, at the first speed and etch the material and a portion of the substrate in an unexposed region of the substrate.

A charging system for an electric vehicle is disclosed and may include a charging unit configured to electrically charge a traction battery of the electric vehicle and a cleaning system configured to clean an external surface of the electric vehicle. The cleaning system may comprise a cleaning unit, an arm coupled to the cleaning unit and movable relative to the cleaning unit, and a cleaning nozzle coupled to a free end of the arm. A method for operating a charging system for an electric vehicle is also disclosed.