A containment tank assembly is described that includes a tank including an inner surface and a cleaning apparatus mounted to the tank. The cleaning apparatus includes an elongate arm and a rotary spray head assembly rotationally coupled to an end of the elongate arm. A rotating nozzle assembly is rotationally coupled to the rotary spray head. A magnetic field source is coupled to the rotary spray head so as to generate a spatially changing magnetic field in accordance with a rotation of the rotary spray head assembly in relation to the end of the elongate arm. A magnet field sensor is carried in a fixed relation to the elongate arm. The magnetic field sensor, in operation, generates a sensor signal that varies in accordance with the spatially changing magnetic field in accordance with the rotation of the rotary spray head assembly.

A dry etching method which includes a dry etching step in which an etching gas containing a halogen fluoride being a compound of bromine or iodine and fluorine is brought into contact with a member to be etched (12) including an etching target being a target of etching with the etching gas to etch the etching target without using plasma. The etching target contains copper. Additionally, the dry etching step is performed under temperature conditions of from 140° C. to 300° C. Also disclosed is a method for manufacturing a semiconductor element and a cleaning method using the dry etching method.

In one example there is disclosed, an apparatus (10) for vacuum cleaning a tank (11). The apparatus (10) includes a main body (12) coupled to a working arm (14) and a plurality of support legs (16) coupled to the main body (12). The main body (12) includes a main conduit (40) extending lengthwise therethrough and a common central actuator (32) fitted about by the main conduit (40). The working arm (14) includes a vacuum conduit (50) in fluid communication with the main conduit (40). The plurality of support legs (16) are operatively coupled to the common central actuator (32) so as to be simultaneously moveable at least between a collapsed condition so as to fit through an opening 18 of the tank 11, and an extended condition in which the plurality of support legs (16) are moved relatively outwardly so as to be telescopically extendable within the tank (11) to engage a side wall (20) of the tank to support the main body (12). Other examples of the apparatus, a system and related methods are also disclosed.

The present application discloses a preventive maintenance method for a chamber of a metal etching machine. An optimized burning cleaning recipe is added before the chamber is opened, and metal substances remaining on the surface of an electrostatic chuck are removed by adopting a cleaning/pumping down multi-step alternate method. Before the chamber is opened for preventive maintenance, the phenomenon of metal particles remaining on the surface of the electrostatic chuck can be significantly improved, thus solving the downtime problem caused by abnormal backside helium and ensuring the stability of mass production.

There is provided a technique that includes modifying a deposited film, which is formed on an inner surface of a reaction container, into a film including an oxide layer and a nitride layer by performing a cycle a predetermined number of times, the cycle including: (a) oxidizing the deposited film by supplying an oxygen-containing gas into the reaction container and plasma-exciting the oxygen-containing gas; and (b) nitriding the deposited film by supplying a nitrogen-containing gas into the reaction container and plasma-exciting the nitrogen-containing gas.

A system and method for cleaning, rinsing, and sanitizing a container is disclosed. The system has a sanitizing agent chamber for storing a sanitizing agent, the one or more solution chambers in fluid communication with the container, a pump in fluid commination with the sanitizing agent, wherein the pump is in communication with a gas, and at least one spray nozzle fluidly connected to the at least one solution chamber via a conduit positioned within the container, wherein the spray nozzle comprises a housing inside which the sanitizing agent is mixed at pressure with the gas to disperse the sanitizing agent and gas mixture into the container for sanitizing the container.

A retractable cleaning nozzle for spray cleaning an interior surface of a pipe or a tank includes a nozzle housing configured to be stationary mounted in a hole of the side wall of the pipe or tank and having a front side arranged to face towards the interior of the pipe or tank and a rear side arranged to face away from the interior of the pipe or tank, an inlet port configured for receiving a cleaning fluid, and a cylindrical interior bore with a central axis defining an axial direction, wherein the interior bore is open towards the front side of the nozzle housing. The cleaning nozzle includes a first plug movably arranged in the axial direction within the bore of the nozzle housing between a retracted position and a protruding position, wherein the first plug has a sleeve-shaped body with a front wall closing a front portion of the sleeve-shaped body, wherein the front wall of the sleeve-shaped body includes a first set of spray holes configured to eject cleaning fluid substantially in the axial direction, wherein the sleeve-shaped body of the first plug includes a second set of spray holes configured to eject cleaning fluid substantially in a radial direction perpendicular to the axial direction, wherein a front surface of the first plug is substantially flush with a front surface of the nozzle housing in the retracted position of the first plug, and wherein a front portion of the first plug, including the first and second set of spay holes, protrudes beyond the front surface of the nozzle housing in the protruding position of the first plug for enabling spray cleaning of the interior surface of the pipe or tank. The cleaning nozzle includes a second plug arranged within a space defined by the sleeve-shaped body of the first plug and configured for closing a flow path from the inlet port to the first set of holes of the first plug when the first plug is located in the retracted position.

This invention provides a method and a system for cleaning a container for storing wafers or masks. A contained with lid is washed directly after the container is loaded with lid opened in the cleaning system. Gas exchange rate in the washing station can be increased such that particles or AMC inside the container or attached to the lid can be carried out more easily. Then, contamination-free gas is purged to the container as well as lid in a high temperature environment. A vacuum station can be optionally adapted between the washing station and the contamination-free gas purging station to enhance the cleanliness of the container.

The present disclosure provides a method for cleaning a vacuum system used in the manufacture of OLED devices. The method includes performing pre-cleaning for cleaning at least a portion of the vacuum system, and performing plasma cleaning using a remote plasma source.

A bulk HPP container (10) includes a flexible body portion (12) having closed off ends (14), at least one of which is depicted as being recessed to enable the containers (10) to be positioned end-to-end in an efficient manner, for example, when placed into an HPP pressure vessel, such as a wire wound vessel. One or more openings are provided in the body portion of the container with n appropriate closure for pumpable product to enter and exit the container. In this regard, an inlet valve (16) or other type of closure may be located at the opening in one or both of the ends of the container. Also, one or more outlet valves (18) or other type of closure are located at an opening on the body portion (12) of the container for emptying the container, for example, after HPP. The body portion 12) is composed of sufficient flexural strength and sufficient flexural modulus to enable the container to reduce in volume by from 0 to at least 30% while being rigid enough for reuse over a desired number of HPP cycles.