Patent classifications
B08B2220/04
Apparatus for functionally regenerating a brush for washing a flexographic plate
The invention relates to a cleaning apparatus (10) for functionally regenerating a brush (20) which can be used for washing a flexographic plate; in particular, the apparatus is configured to regenerate a brush (20) comprising a cylindrical core (5) about which a channel (4) supporting filaments (3) is fixed according to a spiral shape. The apparatus comprises a frame defining a rotation axis (100) for the brush and a motorized assembly, which can be operatively connected to an end of said cylindrical core (5) of the brush (20) to rotate it about the rotation axis (100). The apparatus (10) further comprises a cleaning unit (30) comprising a carriage (31), movable along a rectilinear guide (32) and a tool (33) provided with an end (33A) adapted to penetrate into the spaces defined between the turns of the spiral to detach the polymer and monomer residues hardened in said spaces as a result of the use of said brush for said washing.
Method for the treatment of cake resulting from additive manufacturing processes
A machine and a method for treating cakes from additive manufacturing processes, wherein the cake contains residual powders and sintered pieces is disclosed. The machine includes a cylindrical vibrating body which is placed in a position above a vibratory finishing or tumbling or vibro-blasting machine and is separated from the vibratory finishing or tumbling or vibro-blasting machine by a remotely operable door and the cylindrical vibrating body obtains its vibration from the machine below. The machine includes means for destructuring the cake in order to obtain the separation of the non-sintered powder from the sintered pieces present in the cake and means for recovering the powder resulting from the destructuring of the cake.
MULTI-STAGE WASH SYSTEM FOR VAT POLYMERIZATION-BASED 3D PRINTED PARTS
The invention is generally a system for drying, recycling, and washing off residual resin from three-dimensionally (3D) printed objects. Exemplary systems may include a wash reservoir, a fan module, and one or more air exchange vents. The wash reservoir contains a wash solvent and a propeller fully or partially submerged into the wash solvent. The propeller splashes the wash solvent upwards to disperse on the 3D printed object, thereby largely washing away the resin residue present in the 3D printer object. The fan module is connected to the wash reservoir to create a positive or negative air pressure inside the wash reservoir, thereby redirecting the airflow to the wash reservoir. The air exchange vents are provided between a splash guard and a platform/lid of the wash reservoir to act as an air intake when the fan module blows air out of the wash reservoir and as an exhaust vice versa.
PURGING COMPOUND FOR RESIN PROCESSING MACHINE
A purging compound for removing a processing residue comprising a resin (C) to be purged, from a resin processing machine, comprising: a thermoplastic resin (A) and a non-ionic additive (B) of the following Formula (I) having a melting or softening point of lower than 150° C.:
Rn—X (I)
(where R is a hydrophobic organic group, n is an integer of 1 or more, and X is a polar group), wherein a MFR (280° C. and a load of 2.16 kg) is 30 g/10 min or less, the difference of the solubility parameter between the resin (A) and the resin (C) is +1.6 to −1.6 (cal/cm.sup.3).sup.1/2, the difference of the solubility parameter between the additive (B) and the resin (C) is +1.6 to −1.6 (cal/cm.sup.3).sup.1/2, and the difference of the solubility parameter between the additive (B) and the hydrophobic organic group R is 0.7 (cal/cm.sup.3).sup.1/2 or more.
Multi-stage wash system for vat polymerization-based 3D printed parts
The invention is generally a system for washing off residual resin from objects which are three-dimensionally (3D) printed through a vat polymerization (VP) process. Exemplary systems may include a solvent receptacle, a wash reservoir in fluid communication with the solvent receptacle, and a controller configured to pump a solvent from the solvent receptacle to the wash reservoir for washing off residual resin from a 3D-printed object. Exemplary methods may include pumping a first solution of a plurality of solvent solutions from the solvent receptacle to the wash reservoir, dispersing the first solution onto the 3D-printed object, pumping the first solution from the wash reservoir to the solvent receptacle, pumping a second solution of the plurality of solvent solutions from the solvent receptacle to the wash reservoir, and dispersing the second solution onto the 3D-printed object.
Multi-stage wash system for vat polymerization-based 3D printed parts
The invention is generally a system for washing off residual resin from objects which are three-dimensionally (3D) printed through a vat polymerization (VP) process. Exemplary systems may include a solvent receptacle, a wash reservoir in fluid communication with the solvent receptacle, and a controller configured to pump a solvent from the solvent receptacle to the wash reservoir for washing off residual resin from a 3D-printed object. Exemplary methods may include pumping a first solution of a plurality of solvent solutions from the solvent receptacle to the wash reservoir, dispersing the first solution onto the 3D-printed object, pumping the first solution from the wash reservoir to the solvent receptacle, pumping a second solution of the plurality of solvent solutions from the solvent receptacle to the wash reservoir, and dispersing the second solution onto the 3D-printed object.
SPIN CLEANING METHOD AND APPARATUS FOR ADDITIVE MANUFACTURING
A method of separating excess resin from at least one object includes: (a) stereolithographically producing at least one object, each object having at least one retention feature (32) formed thereon, each object carrying excess resin on a surface thereof; then (b) mounting each object on at least one transfer frame (21), each transfer frame having at least one retention member (22) that mates with the retention feature; (c) connecting each transfer frame to a rotor with the at least one object carried thereon; (d) centrifugally separating excess resin from each object by spinning the rotor with each transfer frame connected thereto while the at least one object remains connected to each transfer frame by the retention feature; then (e) removing each transfer frame from the rotor, with excess resin separated from each at least one object thereon.
Compositions, Methods And Systems For Removal Of Starch
The present invention is directed to compositions, methods and systems for the removal of starch. The methods include: providing cleaning solution and rinsing fluid along supply line(s); connecting the supply line(s) to one or more cleaning applicators positioned to apply the cleaning solution or the rinsing fluid to one or more surfaces of a starch applicator system; and providing a controller which is able to control application of the cleaning solution and the rinsing fluid through the one or more cleaning applicators. The systems include the components described in relation to the methods. The compositions include about 5 to 15% w/w alpha amylase to break down the starch into water-soluble units; and non-ionic surfactant(s) and/or solvent(s) to react at the interface of the starch and surface it is attached to as well as liquefy the resins.
Scanning probe microscope for cleaning nanostructures
The present invention relates to a scanning probe microscope. The scanning probe microscope can be configured to remove a polymeric material from a surface of a nanostructure. The scanning probe microscope includes a metal coated probe tip and a voltage source. The voltage source can be configured to apply a bias voltage between the probe tip and a sample. The bias voltage can be between 0.5 V and 2 V. The scanning probe microscope further includes a sample positioner configured to position the sample in relation to the probe tip and a system controller configured to control the scanning probe microscope.
Compositions containing alpha-amylase, methods and systems for removal of starch
The present invention is directed to compositions, methods and systems for the removal of starch. The methods include: providing cleaning solution and rinsing fluid along supply line(s); connecting the supply line(s) to one or more cleaning applicators positioned to apply the cleaning solution or the rinsing fluid to one or more surfaces of a starch applicator system; and providing a controller which is able to control application of the cleaning solution and the rinsing fluid through the one or more cleaning applicators. The systems include the components described in relation to the methods. The compositions include about 5 to 15% w/w alpha amylase to break down the starch into water-soluble units; and non-ionic surfactant(s) and/or solvent(s) to react at the interface of the starch and surface it is attached to as well as liquefy the resins.