Patent classifications
B08B2220/04
Method to Prevent Grounding from a Silicon Rod to a Plate in Polycrystalline Silicon Reactor
A method to prevent groundings of polycrystalline silicon rod holders to a reactor plate by the residual polymer in the following manner: first, providing a polycrystalline silicon reactor having a reactor plate with a plurality of silicon rod holders separated from the reactor plate with an insulation; next establishing an electrical circuit from a ground connection on the reactor plate connected to high potential test equipment to a high voltage probe; and finally completing the electrical circuit by contacting the high voltage probe to the holder. By this method any remaining polymer is physically removed as the polymer burns or is ejected by the energetic release caused by mild arcing from the holder to the reactor plate.
System and method for coating removal
A system for removing a coating from an underlying layer can include a wave-based weakening system configured to weaken the coating by decreasing a coupling force between the coating and the substrate, a coating removal mechanism configured to remove the weakened coating from the underlying layer, and a sensor configured to determine a property associated with the coating. A method for removing a coating from an underlying layer can include generating a weakened coating and removing the weakened coating.
THERMALLY REMOVABLE FILL MATERIALS FOR ANTI-STICTION APPLICATIONS
A method for preventing the collapse of patterned, high aspect ratio features formed in semiconductor substrates upon removal of wash solutions of the type used to clean etch residues from the spaces between the features. In the present method, the spaces are at least partially filled with a displacement solution, such as via spin coating, to substantially displace the wash solution. The displacement solution includes at least one solvent and at least one fill material which is a polyalkene carbonate (PAC) and/or a saccharide. The solvent is then volatized to deposit the fill material in substantially solid form within the spaces. The fill material may be removed by thermal degradation via heat treatment, wherein the need for removal of the fill material by plasma ashing is obviated in order to prevent or mitigate silicon loss.
Methods and systems for rubber removal from vulcanization molds
Methods, apparatuses and systems can be provided to remove vulcanized rubber contamination and other process related residues, such as sulfur-based residues from a vulcanization mold. A vulcanization mold can be placed in a reactor where solid vulcanized rubber contamination can be turned into its base substances on a particle level by reversing the vulcanization and breaking the sulfur-bonds of the contamination. The reactor can be filled with a process liquid that interacts with the devulcanized particles. Energy can be applied to the process liquid to set it into motion to transport devulcanized particles away from the mold surface and from mold cavities such as air venting systems, of which can include then a combination of devulcanization and then a nucleation process to remove the contaminants from the mold.
METHODS FOR TOLUENE RECOVERY FROM LINEAR ALPHA OLEFIN PRODUCTION
The present disclosure provides a method of flushing a reactor used in the production of linear alpha olefins, including flushing reactor equipment with toluene from a solvent source, wherein the reactor contains by-products from the production of the linear alpha olefins, wherein the by-products include a polymeric material. The flushed toluene containing polymeric material is directed into a separation train containing the linear alpha olefins, wherein the polymeric material is soluble in at least one of the linear alpha olefins. The linear alpha olefins can be separated from the toluene and the toluene is recycled to the solvent source.
SYSTEM AND METHOD FOR COATING REMOVAL
A system for removing a coating from an underlying layer can include a wave-based weakening system configured to weaken the coating by decreasing a coupling force between the coating and the substrate, a coating removal mechanism configured to remove the weakened coating from the underlying layer, and a sensor configured to determine a property associated with the coating. A method for removing a coating from an underlying layer can include generating a weakened coating and removing the weakened coating.
Method and Apparatus to Remove a Protective Layer
The present invention provides method and apparatus for removing a sealant from a surface. More specifically the present invention provides methods an apparatus for efficiently and consistently removing polysulfide sealant from a surface on an aluminum airplane wing without damaging the wing.
CYCLONE TEMPERATURE CONTROL FOR DECOATING SYSTEMS
A cyclone temperature control system for a cyclone of a decoating system includes a controller, a gas mover, and a control valve that is movable between a fully open position and a closed position. A method of controlling the temperature of the cyclone includes determining a cyclone temperature of the cyclone and comparing the cyclone temperature to a cyclone threshold temperature. The method also includes opening the temperature control valve and directing at least some heated gas from an afterburner of the decoating system to mix with exhaust gas from a kiln of the decoating system to increase the temperature of the exhaust gas if the cyclone temperature is less than the cyclone threshold temperature.
Substrate cleaning method and apparatus
A method for cleaning a substrate with pattern structures comprises the following steps: using gas-liquid atomization to clean a substrate surface (601); using TEBO megasonic to clean the substrate surface (602); and drying the substrate (603). The TEBO megasonic cleaning is used to remove small size particles on the substrate and the gas-liquid atomization cleaning is used to remove large size particles on the substrate. The method enables achieving an effect of cleaning the substrate without or with less device damage. A substrate cleaning apparatus is also provided.
Method for Cleaning Aluminum or Aluminum Alloy Surfaces
A method for cleaning a surface of an aluminum or aluminum alloy body of coatings, contaminants, dirt, or the like by immersing the surface in a basic aqueous electrolyte containing carbonate ions, connecting the body directly to the negative terminal of a DC current source and flowing DC current through the body. After a time, the flow of DC current is stopped and the surface is removed from the electrolyte. The surface is then rinsed off to remove the coating, dirt, contaminants, or the like from the surface. The cleaned surface may be recoated for reuse of the body