Patent classifications
B08B2220/04
RELEASE SOLVENT COMPOSITION, RELEASE METHOD, AND CLEANING SOLVENT COMPOSITION
A release solvent composition for releasing a thermosetting resin coating film coated on a thermoplastic resin molded article, and the release solvent composition containing 1,1,2,2,3,3,4-heptafluorocyclopentane and aromatic alcohols and having no flash point.
METHOD FOR FLUSHING REACTOR
The disclosure provides a flushing process for removing polymer fouling from a reactor including a gas distributor proximal to the bottom thereof and an internal condenser proximal to the top thereof, the method including, for a first flushing time period, injecting a flushing solvent into the reactor and withdrawing the flushing solvent from a reactor outlet proximal to the internal condenser to induce an upward movement of flushing solvent, the withdrawn flushing solvent containing a first polymer content. After the first flushing time period is complete, for a second flushing time period, the process includes injecting a flushing solvent into the reactor and withdrawing the flushing solvent from a reactor outlet proximal to the gas distributor to induce a downward movement of flushing solvent, the withdrawn flushing solvent containing a second polymer content.
CLEANING OF NANOSTRUCTURES
The present invention relates to a method for removing a polymeric material from a surface of a nanostructure. The method includes applying, by a scanning probe microscope, an electrical field between a probe tip of the scanning probe microscope and the nanostructure, and simultaneously scanning over the surface of the nanostructure. Thereby, bonds connecting the polymeric material to the surface of the nanostructure are broken. A further step includes cleaning the surface of the nanostructure. A scanning probe microscope for performing such a method and a computer program product for controlling the scanning probe microscope are also disclosed.
Decomposing/cleaning composition, method for cleaning adhesive polymer, and method for producing device wafer
Provided is a decomposing/cleaning composition for an adhesive polymer having a high etching rate and suppressed infiltration into a contact interface between a substrate such as a device wafer and an adhesive layer such as a fixing tape. The decomposing/cleaning composition of one embodiment is a decomposing/cleaning composition for an adhesive polymer containing a quaternary alkylammonium fluoride or a quaternary alkylammonium fluoride hydrate and an aprotic solvent, wherein the aprotic solvent contains (A) an N-substituted amide compound having no active hydrogens on the nitrogen atoms and (B) at least one organic sulfur oxide selected from the group consisting of sulfoxide compounds and sulfone compounds.
Cleaning of nanostructures
The present invention relates to a method for removing a polymeric material from a surface of a nanostructure. The method includes applying, by a scanning probe microscope, an electrical field between a probe tip of the scanning probe microscope and the nanostructure, and simultaneously scanning over the surface of the nanostructure. Thereby, bonds connecting the polymeric material to the surface of the nanostructure are broken. A further step includes cleaning the surface of the nanostructure. A scanning probe microscope for performing such a method and a computer program product for controlling the scanning probe microscope are also disclosed.
Roller-type applicator cleaning apparatus
A roller-type applicator cleaning apparatus includes a lid, a housing, a water inlet valve, a base, a plurality of radial openings, and a central axis. The base includes a platform and an applicator holder. The lid, the housing, and the base are concentrically positioned along the central axis. The applicator holder is adjacently connected onto the platform and function as a storage space for the roller-type applicator. The plurality of radial openings laterally traverses through the applicator holder so that a flow of water can discharge into the applicator holder as the flow of water is entered into the housing through the water inlet. The lid and the base are oppositely positioned of each other about the housing and threadedly attached to the housing. The applicator holder is encircled by the housing so that the flow of water can fully engaged with the inserted applicator that needs to be cleaned.
Multi-stage wash system for vat polymerization-based 3D printed parts
The invention is generally a system for drying, recycling, and washing off residual resin from three-dimensionally (3D) printed objects. Exemplary systems may include a wash reservoir, a fan module, and one or more air exchange vents. The wash reservoir contains a wash solvent and a propeller fully or partially submerged into the wash solvent. The propeller splashes the wash solvent upwards to disperse on the 3D printed object, thereby largely washing away the resin residue present in the 3D printer object. The fan module is connected to the wash reservoir to create a positive or negative air pressure inside the wash reservoir, thereby redirecting the airflow to the wash reservoir. The air exchange vents are provided between a splash guard and a platform/lid of the wash reservoir to act as an air intake when the fan module blows air out of the wash reservoir and as an exhaust vice versa.
Method and composition for removing a landfill residue
The present invention relates to a method of removing a landfill residue that includes (a) forming a treatment composition that includes, (i) an acid functional material comprising at least one of carboxylic acid functional materials, phosphoric acid functional materials, phosphonic acid functional materials, or salts thereof, (ii) water, (iii) optionally an oxidizer including a reactive oxygen, and (iv) optionally a surfactant. The method further includes (b) contacting together said treatment composition and said landfill residue, thereby forming a modified treatment composition including the landfill residue, and (c) removing the modified treatment composition. The landfill residue is selected from a landfill gas extraction residue and a landfill leachate collection residue, and the landfill residue includes an organic substance and optionally a scale-forming salt. The present invention also relates to a treatment composition including the acid functional material, and the oxidizer.
END STRIPPER FOR FLEXIBLE SCREEN FRAME MATERIAL
An end stripper that strips a polymer coating from flexible screen frame material, the end stripper including a table having a tabletop and ground engaging legs, an induction coil coupled to an induction power supply, a clamping assembly located proximate the tabletop and sized to receive a first end portion of flexible screen frame material therein. The induction coil positioned and shiftable to receive the first end portion of the flexible screen frame material therein and operable to heat the first end portion by induction thus softening a polymer coating of the flexible screen frame material. A first stripping jaw strips the polymer coating from the first end portion.
Multi-stage wash system for vat polymerization-based 3D printed parts
The invention is generally a system for drying, recycling, and washing off residual resin from 3D-printed objects. Exemplary systems may include a system for drying off residual resin from 3D-printed objects. The system may include a wash reservoir including a chamber for housing the 3D printed object and containing a wash solvent or liquid solvent adapted to at least partially remove residual residue present in the 3D printer object. Air exchange vents provided between a splash guard or a lid of the wash reservoir may be adapted to act as an air intake or an air exhaust. An airflow module in fluid communication with the air vents and the chamber may be adapted to create a positive or negative air pressure inside the wash reservoir for redirecting airflow to the chamber housing the 3D printed object, and blowing air out or into the chamber to dry the 3D-printed object.