B22D7/005

High-strength 6XXX aluminum alloys and methods of making the same

Disclosed are high-strength aluminum alloys and methods of making and processing such alloys. More particularly, disclosed is a 6XXX series aluminum alloy exhibiting improved mechanical strength, formability, corrosion resistance, and anodized qualities. An exemplary method includes homogenizing, hot rolling, solutionizing, and quenching. In some cases, the processing steps can further include annealing and/or cold rolling.

Method of manufacturing sputtering target and sputtering target

The manufacturing cost of a sputtering target is reduced and the impurity concentration of the manufactured sputtering target is also reduced. A method of manufacturing a sputtering target includes: surface-treating at least one of a used sputtering target and a scrap material; melting at least one of the used sputtering target and the scrap material after the surface treatment to form an ingot; and manufacturing a sputtering target by subjecting the ingot to forging, rolling, heat treating, and machining.

Enclosure having a sealing device for a casting installation

An enclosure having a sealing device, for a casting installation, having a first body and a second body that is removably joined to the first body along a bearing axis, the first and second bodies together delimiting an internal chamber. The sealing device comprises: at least one compression member, at least one seal having a lateral contact face extending substantially parallel to the bearing axis; the compression member and the seal being arranged with respect to one another such that the compression member is in contact with the lateral contact face of the seal and exerts a compression force thereon that is oriented orthogonally to the bearing axis.

Sputtering target comprising Al—Te—Cu—Zr alloy, and method for producing same

An AlTeCuZr alloy sputtering target, comprising 20 at % to 40 at % of Te, 5 at % to 20 at % of Cu, 5 at % to 15 at % of Zr and the remainder of Al, wherein a Te phase, a Cu phase and a CuTe phase are not present in a structure of the target. An object of the present invention is to provide an AlTeCuZr alloy sputtering target capable of effectively reducing particle generation, nodule formation and the like upon sputtering and further capable of reducing oxygen contained in the target.

Fabrication of metallic parts by additive manufacturing

In various embodiments, wire composed at least partially of arc-melted refractory metal material is utilized to fabricate three-dimensional parts by additive manufacturing.

Aluminum alloy for producing semi-finished products or components for motor vehicles, method for producing an aluminium alloy strip from said aluminium alloy, and aluminium alloy strip and uses therefore

An aluminium alloy for producing semi-finished products or components for motor vehicles is provided, wherein the alloying components of the aluminium alloy have the following contents in percent by weight: Fe0.80%, Si0.50%, 0.90%Mn1.50%, Mg0.25%, Cu0.125%, Cr0.05%, Ti0.05%, V0.05%, Zr0.05%, the remainder being aluminium, unavoidable impurity elements, individually <0.05%, in total <0.15%, and the combined content of Mg and Cu satisfies the following relation in percent by weight: 0.15%Mg+Cu0.25%, wherein the Mg content of the aluminium alloy is greater than the Cu content of the aluminium alloy. A method for producing an aluminium alloy strip from such an aluminium alloy and an aluminium alloy strip produced by this method are also provided, as well as uses thereof.

Equipment for continuous or semi-continuous casting of metal with improved metal filling arrangement

An apparatus for continuous or semi-continuous low pressure casting of metal, in particular directly-cooled (DC) casting of extended objects such as a rods, bars or billets of aluminium. The apparatus includes a frame construction with at least one chill or mould having a mould cavity that is provided with an upwardly open inlet and an outlet with cooling means. The inlet of the mould is connected to a distribution chamber receiving liquid metal from a metal store such as a holding furnace via a metal supply channel or launder. A flexible launder section is provided between the launder and the metal distribution chamber whereby the frame construction with the moulds and distribution chamber can be raised and lowered to enable complete filling of metal to the moulds. Subsequently it is possible to control the metal level in each respective mould cavity in relation to the metal level in the launder and thereby controlling the low pressure casting.

Ingot Casting
20190366425 · 2019-12-05 ·

This specification discloses an open mould conveyer casting apparatus for forming a metal ingot including: a conveyer for conveying one or more ingot moulds from at least a first location where an ingot mould receives a molten metal having an exposed surface, to a second location where the molten metal has partially or completely solidified into a metal ingot; one or more magnetic field applicators configured to apply a varying magnetic field to the molten metal in the ingot mould between the first location and the second location, the magnetic field being of a magnetic field strength to induce stirring within the molten metal. This specification also discloses an open mould conveyer casting method for forming a metal ingot including: filling an ingot mould with a molten metal, the molten metal in the mould having an exposed surface; solidifying the molten metal to form the metal ingot; and applying a varying magnetic field to the molten metal of a magnetic field strength and frequency to induce stirring within the molten metal during the step of solidifying the molten metal.

Copper alloy sputtering target and method for manufacturing same

Provided is a copper alloy sputtering target, wherein, based on charged particle activation analysis, the copper alloy sputtering target has an oxygen content of 0.6 wtppm or less, or an oxygen content of 2 wtppm or less and a carbon content of 0.6 wtppm or less. Additionally provided is a method for manufacturing a copper alloy sputtering target, wherein a copper raw material is melted in a vacuum or an inert gas atmosphere, a reducing gas is thereafter introduced into the melting atmosphere, an alloy element is subsequently added to a molten metal for alloying, and an obtained ingot is processed into a target shape. The present invention aims to provide a copper alloy sputtering target that generates few particles during sputtering, and a method for manufacturing such a sputtering target.

Titanium based ceramic reinforced alloy

A titanium based, ceramic reinforced body formed from an alloy having from about 3 wt. % to about 10 wt. % of zirconium, about 10 wt. % to about 25 wt. % of niobium, from about 0.5 wt. % to about 2 wt. % of silicon, and from about 63 wt. % to about 86.5 wt. % of titanium. The alloy has a hexagonal crystal lattice phase of from about 20 vol % to about 70 vol %, and a cubic body centered crystal lattice phase of from about 30 vol. % to about 80 vol. %. The body has an ultimate tensile strength of about 950 MPa or more, and a Young's modulus of about 150 GPa or less. A molten substantially uniform admixture of a zirconium, niobium, silicon, and titanium alloy is formed, cast into a shape, and cooled into body. The body may then be formed into a desired shape, for example, a medical implant and optionally annealed.