A target for use in a physical vapor deposition process includes a matrix composed of a composite material selected from the group consisting of aluminum-based material, titanium-based material and chromium-based material and all combinations thereof. The matrix is doped with doping elements and the doping elements are embedded as constituents of ceramic compounds or aluminum alloys in the matrix. The doping elements are selected from the group of the lanthanides: La, Ce, Nb, Sm and Eu. A process for producing such a target and a use of such a target in a physical vapor deposition process are also provided.

A method includes mounting a hollow cylinder on a turntable, positioning an additive-manufacturing deposition tool at a surface of the hollow cylinder, and rotating the hollow cylinder on the turntable while depositing material on the hollow cylinder with the deposition tool. Further, a method includes making an opening in a wall of the hollow cylinder, forming a part to fit in the opening, and welding the part to the hollow cylinder such that the part fills the opening. The hollow cylinder has an inner radius and an outer radius, and the part is formed with an inner radius of curvature and an outer radius of curvature substantially similar to the inner radius and outer radius, respectively, of the hollow cylinder when the part is positioned in the opening.

A heterogeneous composite consisting of near-nano ceramic clusters dispersed within a ductile matrix. The composite is formed through the high temperature compaction of a starting powder consisting of a core of ceramic nanoparticles held together with metallic binder. This core is clad with a ductile metal such that when the final powder is consolidated, the ductile metal forms a tough, near-zero contiguity matrix. The material is consolidated using any means that will maintain its heterogeneous structure.

A heterogeneous composite consisting of near-nano ceramic clusters dispersed within a ductile matrix. The composite is formed through the high temperature compaction of a starting powder consisting of a core of ceramic nanoparticles held together with metallic binder. This core is clad with a ductile metal such that when the final powder is consolidated, the ductile metal forms a tough, near-zero contiguity matrix. The material is consolidated using any means that will maintain its heterogeneous structure.

A complex concentrated alloy (CCA) and/or high entropy alloy (HEA) additive manufacturing nozzle can include a nozzle body defining at least four powder channels. Each powder channel can be configured to be connected to a powder supply of a plurality of powder supplies to receive a powder from the powder supply for ejecting the powder toward a build area to form an additively manufactured article having a CCA and/or an HEA.

A complex concentrated alloy (CCA) and/or high entropy alloy (HEA) additive manufacturing nozzle can include a nozzle body defining at least four powder channels. Each powder channel can be configured to be connected to a powder supply of a plurality of powder supplies to receive a powder from the powder supply for ejecting the powder toward a build area to form an additively manufactured article having a CCA and/or an HEA.

The present disclosure provides a method for manufacturing a multi-main-phase structure magnet having excellent coercive force and a multi-main-phase structure magnet manufactured therefrom.

The present disclosure provides a method for manufacturing a multi-main-phase structure magnet having excellent coercive force and a multi-main-phase structure magnet manufactured therefrom.

A process for producing a W—Ni sputtering target includes providing the sputtering target with 45 to 75 wt % W and a remainder of Ni and common impurities. The sputtering target contains a Ni(W) phase, a W phase and no or less than 10% by area on average of intermetallic phases measured at a target material cross section.

A process for producing a W—Ni sputtering target includes providing the sputtering target with 45 to 75 wt % W and a remainder of Ni and common impurities. The sputtering target contains a Ni(W) phase, a W phase and no or less than 10% by area on average of intermetallic phases measured at a target material cross section.