B23K1/20

TECHNIQUES AND ASSEMBLIES FOR JOINING COMPONENTS

The disclosure describes example techniques and assemblies for joining a first component and a second component. The techniques may include positioning the first and second component adjacent to each other to define a joint region between adjacent portions of the first component and the second component, the joint region being coated with an adhesion resistant coating. The techniques may also include positioning a braze material in the joint region, heating the braze material to form an at least softened material, and cooling the at least softened material to form a mechanical interlock including the braze material in the joint region joining the first and second components. The braze material does not metallurgically bond to the joint surface.

TECHNIQUES AND ASSEMBLIES FOR JOINING COMPONENTS

The disclosure describes example techniques and assemblies for joining a first component and a second component. The techniques may include positioning the first and second component adjacent to each other to define a joint region between adjacent portions of the first component and the second component, the joint region being coated with an adhesion resistant coating. The techniques may also include positioning a braze material in the joint region, heating the braze material to form an at least softened material, and cooling the at least softened material to form a mechanical interlock including the braze material in the joint region joining the first and second components. The braze material does not metallurgically bond to the joint surface.

Joining device and joining method

A joining device and method for laser-based joining of two components includes a first laser radiation source, a first radiation guide connected to the first radiation source to couple first laser radiation into the first radiation guide, a second laser radiation source, at least one second radiation guide connected to the second radiation source to couple second laser radiation into the second radiation guide, and a focusing device coupled to the laser radiations and focusing them at a distance from each other into a joining zone of the components. To reduce installation effort, the focusing device focuses the first and second laser radiations through a common beam path and a coupling device is connected on its input side to the first and second radiation guides and on its output side to the focusing device. The coupling device couples the first and second laser radiations into the common beam path.

Joining device and joining method

A joining device and method for laser-based joining of two components includes a first laser radiation source, a first radiation guide connected to the first radiation source to couple first laser radiation into the first radiation guide, a second laser radiation source, at least one second radiation guide connected to the second radiation source to couple second laser radiation into the second radiation guide, and a focusing device coupled to the laser radiations and focusing them at a distance from each other into a joining zone of the components. To reduce installation effort, the focusing device focuses the first and second laser radiations through a common beam path and a coupling device is connected on its input side to the first and second radiation guides and on its output side to the focusing device. The coupling device couples the first and second laser radiations into the common beam path.

Methods of bonding of semiconductor elements to substrates, and related bonding systems

A bonding system for bonding a semiconductor element to a substrate is provided. The bonding system includes a substrate oxide reduction chamber configured to receive a substrate. The substrate includes a plurality of first electrically conductive structures. The substrate oxide reduction chamber is configured to receive a reducing gas to contact each of the plurality of first electrically conductive structures. The bonding system also includes a substrate oxide prevention chamber for receiving the substrate after the reducing gas contacts the plurality of first electrically conductive structures. The substrate oxide prevention chamber has an inert environment when receiving the substrate. The bonding system also includes a reducing gas delivery system for providing a reducing gas environment during bonding of a semiconductor element to the substrate.

PROTECTIVE HEAT SHIELDS FOR THERMALLY SENSITIVE COMPONENTS AND METHODS FOR PROTECTING THERMALLY SENSITIVE COMPONENTS

A method of manufacturing a printed circuit board assembly includes providing a circuit board, positioning a plurality of components including at least one thermally-sensitive component having a maximum temperature threshold on the circuit board, positioning a customized protective heat shield on the thermally-sensitive component, exposing the circuit board (having the thermally-sensitive component disposed thereon and the customized protective heat shield disposed on the thermally-sensitive component) to a high-temperature environment wherein temperatures exceed the maximum temperature threshold of the thermally-sensitive component, and removing the customized protective heat shield from the thermally-sensitive component. Customized protective heat shields are also provided.

PROTECTIVE HEAT SHIELDS FOR THERMALLY SENSITIVE COMPONENTS AND METHODS FOR PROTECTING THERMALLY SENSITIVE COMPONENTS

A method of manufacturing a printed circuit board assembly includes providing a circuit board, positioning a plurality of components including at least one thermally-sensitive component having a maximum temperature threshold on the circuit board, positioning a customized protective heat shield on the thermally-sensitive component, exposing the circuit board (having the thermally-sensitive component disposed thereon and the customized protective heat shield disposed on the thermally-sensitive component) to a high-temperature environment wherein temperatures exceed the maximum temperature threshold of the thermally-sensitive component, and removing the customized protective heat shield from the thermally-sensitive component. Customized protective heat shields are also provided.

ALUMINUM BRAZING SHEET AND METHOD FOR FLUX-FREE BRAZING OF ALUMINUM MEMBERS
20220347798 · 2022-11-03 · ·

An aluminum brazing sheet having a multi-layer structure of two layers or more, an aluminum alloy brazing material being located on an outermost surface by being cladded on one surface or both surfaces of a core material, and the aluminum brazing sheet being applied to brazing in which the aluminum brazing sheet is bonded to a member to be brazed made of aluminum or an aluminum alloy without using a flux in a non-oxidizing atmosphere without decompression. The brazing material is made of an Al—Si—Mg—Sn brazing material containing, by mass %, 0.01% to 2.0% of Mg, 1.5% to 14% of Si, and 0.005% to 1.5% of Sn, and in observation in a surface direction before brazing, there are more than 10 Mg—Sn compounds with a circle equivalent diameter of 0.01 μm or more and less than 5.0 μm in the Al—Si—Mg—Sn brazing material per 10000 μm.sup.2 field of view.

DUAL-TYPE SOLDER BALL PLACEMENT SYSTEM
20230088097 · 2023-03-23 ·

A dual-type solder ball placement system is capable of allowing solder balls of the same type or solder balls having two different types to be mounted simultaneously through two ball mounting lines, thereby efficiently mounting the solder balls arranged with various purposes and patterns. Specifically, the dual-type solder ball placement system allows solder balls serving as terminals and core balls serving as supports to be mounted simultaneously through an inline method, thereby preventing a wafer, a unit, a chipset, and the like that become lighter, thinner, shorter, and smaller from being bent.

BRAZING METHOD AND METAL FILM FORMING TOOL FOR BRAZING
20230086339 · 2023-03-23 ·

In a film formation step of a brazing method, a metal brush formed by bundling a plurality of metal wires is brought into contact with a film formation target portion of a workpiece. Here, the film formation target portion is a portion that includes a joining target portion and a brazing-material-allowed portion but does not include an avoidance portion. In this state, the film formation target portion and the metal brush are relatively moved to each other. Thus, the metal film is formed on the film formation target portion. In a brazing step, the joining target portions are joined in a state where a brazing material is arranged on the joining target portion and the brazing-material-allowed portion.