B23Q3/15

ELECTROSTATIC CHUCK WITH POROUS PLUG
20230241731 · 2023-08-03 ·

Electrostatic chucks and method for forming the same are described herein. The electrostatic chucks include a backside gas passage having a ceramic porous plug secured therein by a ceramic body of the chuck with a ceramic-to-ceramic body. In one example, ceramic porous plug is sintered with the ceramic body.

ELECTROSTATIC CHUCK WITH POROUS PLUG
20230241731 · 2023-08-03 ·

Electrostatic chucks and method for forming the same are described herein. The electrostatic chucks include a backside gas passage having a ceramic porous plug secured therein by a ceramic body of the chuck with a ceramic-to-ceramic body. In one example, ceramic porous plug is sintered with the ceramic body.

SAMPLE HOLDER
20220028719 · 2022-01-27 · ·

Provided is a sample holder capable of reducing thermal stress developed between an insulating sleeve and a metallic support. A sample holder includes: an insulating base including a sample holding face; and a support joined to the insulating base, a through hole provided in the insulating base and a hole part provided in the support communicate with each other to constitute a gas inflow hole. A tubular sleeve is situated in the hole part, and an annular member located between an outer peripheral surface of the sleeve and an inner peripheral surface of the hole part is provided. The annular member surrounds the sleeve and secures the sleeve to the support.

SAMPLE HOLDER
20220028719 · 2022-01-27 · ·

Provided is a sample holder capable of reducing thermal stress developed between an insulating sleeve and a metallic support. A sample holder includes: an insulating base including a sample holding face; and a support joined to the insulating base, a through hole provided in the insulating base and a hole part provided in the support communicate with each other to constitute a gas inflow hole. A tubular sleeve is situated in the hole part, and an annular member located between an outer peripheral surface of the sleeve and an inner peripheral surface of the hole part is provided. The annular member surrounds the sleeve and secures the sleeve to the support.

Impulse electrically generated force separation of blanks for the automated destacking of metal sheet

A method of separating a blank from a stack of blanks is provided and includes grasping a first blank and moving the first blank away from a plurality of blanks. At least one additional blank from the plurality of blanks is adhered to the first blank to form a sub-stack of blanks and at least one impulse electrically generated force (EGF) is applied to separate the at least one additional blank from the first blank. The first blank may be grasped by a device with a force F1, and the at least one impulse EGF may be less than the force F1. Also, the at least one impulse EGF may be applied to separate the at least one additional blank from the first blank by passing a pulse of current through an EGF generator positioned adjacent the first blank and inducing an EGF within the plurality of blanks.

Impulse electrically generated force separation of blanks for the automated destacking of metal sheet

A method of separating a blank from a stack of blanks is provided and includes grasping a first blank and moving the first blank away from a plurality of blanks. At least one additional blank from the plurality of blanks is adhered to the first blank to form a sub-stack of blanks and at least one impulse electrically generated force (EGF) is applied to separate the at least one additional blank from the first blank. The first blank may be grasped by a device with a force F1, and the at least one impulse EGF may be less than the force F1. Also, the at least one impulse EGF may be applied to separate the at least one additional blank from the first blank by passing a pulse of current through an EGF generator positioned adjacent the first blank and inducing an EGF within the plurality of blanks.

ELECTROSTATIC CHUCK

An electrostatic chuck fixes a substrate and includes a first area and a second area adjacent to the first area. The electrostatic chuck includes a first electrode portion disposed in the first area and a second electrode portion disposed in the second area. The first electrode portion has a first width, and the second electrode portion has a second width smaller than the first width.

ELECTROSTATIC CHUCK

An electrostatic chuck fixes a substrate and includes a first area and a second area adjacent to the first area. The electrostatic chuck includes a first electrode portion disposed in the first area and a second electrode portion disposed in the second area. The first electrode portion has a first width, and the second electrode portion has a second width smaller than the first width.

Electrostatic chuck for clamping in high temperature semiconductor processing and method of making same

An electrostatic chuck with a top surface adapted for Johnsen-Rahbek clamping in the temperature range of 500 C to 750 C. The top surface may be sapphire. The top surface is attached to the lower portion of the electrostatic chuck using a braze layer able to withstand corrosive processing chemistries. A method of manufacturing an electrostatic chuck with a top surface adapted for Johnsen-Rahbek clamping in the temperature range of 500 C to 750 C.

Electrostatic chuck for clamping in high temperature semiconductor processing and method of making same

An electrostatic chuck with a top surface adapted for Johnsen-Rahbek clamping in the temperature range of 500 C to 750 C. The top surface may be sapphire. The top surface is attached to the lower portion of the electrostatic chuck using a braze layer able to withstand corrosive processing chemistries. A method of manufacturing an electrostatic chuck with a top surface adapted for Johnsen-Rahbek clamping in the temperature range of 500 C to 750 C.