B24B1/002

In-Line Focused Acoustic Energy Transducer and Methods of Use
20250373989 · 2025-12-04 ·

An acoustic energy tool comprising a crystal for generating acoustic energy when a volage is applied to the crystal, and a resonator. The resonator has a solid outer structure with the crystal being attached to the solid outer structure, with the resonator being comprised of a material that transmits the acoustic energy through the resonator. The tool includes a curved surface that focuses the acoustic energy being transmitted through the resonator and a fluid passageway that extends through the resonator for allowing a fluid to flow through the resonator. The acoustic energy being focused by the curved surface is concentrated in the fluid passageway so that it causes cavitation of the fluid in at least part of the fluid passageway. The cavitation of the fluid is used to break up clumps that form in the fluid or to generate reactive oxygen species.

ELECTROCHEMICAL POLISHING METHOD EMPLOYING SOLID ELECTRO-CONDUCTIVE MEDIA WITH BI-DIRECTIONAL PLANETARY MOTION

Disclosed is an electrochemical polishing method employing solid electro-conductive media with bi-directional planetary motion, mainly including the following steps: using solid particles absorbing an electrolyte as solid electro-conductive media, and submerging an anode (workpiece) in the solid electro-conductive media to perform bi-directional planetary motion during polishing, allowing the workpiece to fully contact and collide with the solid electro-conductive media, and ensuring that materials are uniformly removed from various surfaces of the workpiece. In the present disclosure, one-time overall polishing of complex-shaped workpieces can be achieved by bi-directional planetary motion of the workpieces, the consistency of material removal from various surfaces of the workpieces is improved, and the polishing performance and efficiency are enhanced.

COMPENSATION FOR SUBSTRATE DOPING IN EDGE RECONSTRUCTION FOR IN-SITU ELECTROMAGNETIC INDUCTIVE MONITORING

A method of compensating for a contribution of conductivity of the semiconductor wafer to a measured trace by an in-situ electromagnetic induction monitoring system includes storing or generating a modified reference trace. The modified reference trace represents measurements of a bare doped reference semiconductor wafer by an in-situ electromagnetic induction monitoring system as modified by a neutral network. The substrate is monitored with an in-situ electromagnetic induction monitoring system to generate a measured trace that depends on a thickness of the conductive layer, and at least a portion of the measured trace is applied to a neural network to generate a modified measured trace. An adjusted trace is generated, including subtracting the modified reference trace from the modified measured trace.

Method and device for dry treatment of metal surfaces by means of electrically active solid particles

Methods and devices for treatment of metal surfaces by means of electrically active solid particles that include a step of contact of the solid particles with the electrode of an electric source, a step of shooting the particles towards the metal surface to be treated and a step of transmission of electric charge of the particles on the metal surface to be treated. The transmission of the electricity between the electric source and the metal surface during the step of shooting preferably is by net charge of the particles or by electric conductivity by contact or by electric conductivity by means of voltaic arches. The current applied to the electrode is preferably a DC or a current that contains positive sections and negative sections.