A polishing tool and a device for polishing a workpiece with a corresponding polishing tool are proposed, the polishing tool having an elastic intermediate layer with two portions/parts of different hardness, the portion/part close to the processing surface being softer than the portion/part of the intermediate layer remote from the processing surface.

A compensating pad for applying to an ophthalmic lens blank to be blocked, or for interposing between an ophthalmic lens blank and a block piece. The compensating pad comprises a main body that is designed to be elastic having a maximum thickness corresponding to a maximum layer thickness difference of the ophthalmic lens blank, in order to locally compensate for the layer thickness difference of the blocked ophthalmic lens blank.

A compensating pad for applying to an ophthalmic lens blank to be blocked, or for interposing between an ophthalmic lens blank and a block piece. The compensating pad comprises a main body that is designed to be elastic having a maximum thickness corresponding to a maximum layer thickness difference of the ophthalmic lens blank, in order to locally compensate for the layer thickness difference of the blocked ophthalmic lens blank.

A polishing pad or polishing tape with abrasive particles (e.g., diamond, aluminum-oxide, silicon-carbide, etc.) having an average particle size of between approximately 0.5 micrometers (m) and 5.0 m, which are strongly adhered with water-insoluble binders to a flexible and lens-conformable substrate having a cushion so that there is little-to-no shedding or release of the particles from the substrate.

A polishing pad or polishing tape with abrasive particles (e.g., diamond, aluminum-oxide, silicon-carbide, etc.) having an average particle size of between approximately 0.5 micrometers (m) and 5.0 m, which are strongly adhered with water-insoluble binders to a flexible and lens-conformable substrate having a cushion so that there is little-to-no shedding or release of the particles from the substrate.

A method for the zonal polishing of a workpiece includes using a polishing tool to guide a structured polishing pad over the surface of workpiece to remove material from the workpiece. A structured polishing pad includes a structuring adapted to the movement of a polishing tool.

A method for the zonal polishing of a workpiece includes using a polishing tool to guide a structured polishing pad over the surface of workpiece to remove material from the workpiece. A structured polishing pad includes a structuring adapted to the movement of a polishing tool.

The invention relates to a polishing disc for a tool for fine processing optically active surfaces on spectacle lenses, having a main body which has a central axis and to which an intermediate layer that is softer than the main body and is made of a resilient material is secured, a polishing medium carrier resting on the intermediate layer. The intermediate layer has at least two regions with different degrees of hardness, said regions being arranged one behind the other in the direction of the central axis of the main body. The intermediate layer region adjoining the main part is softer than the intermediate layer region on which the polishing medium carrier rests.

A tool, a device, and a method for zonal polishing of optical workpieces, wherein the tool has a preformed cap for forming a polishing surface, and the tool is placed against the workpiece that is to be polished in such a way that the tilt angle of the axis of rotation of the tool to the normal of the contact surface on the workpiece remains at least essentially constant and/or the size of the contact surface remains at least essentially constant.

A tool, a device, and a method for zonal polishing of optical workpieces, wherein the tool has a preformed cap for forming a polishing surface, and the tool is placed against the workpiece that is to be polished in such a way that the tilt angle of the axis of rotation of the tool to the normal of the contact surface on the workpiece remains at least essentially constant and/or the size of the contact surface remains at least essentially constant.