A high-moisture-permeability, microporous plastic film randomly having a lot of recesses having different opening diameters and depths, with clefts formed in the recesses, is produced by pressing a first pattern roll randomly having a lot of high-hardness, fine particles having sharp edges on a roll body surface to a flat-surface metal roll, to produce an anvil roll randomly having a lot of recesses on a metal roll surface; arranging a second pattern roll randomly having a lot of high-hardness, fine particles having sharp edges on a roll body surface oppositely to the anvil roll; and passing a plastic film through a gap between the second pattern roll and the anvil roll.

An optical fiber polishing fixture assembly comprises a fixture base and a clamping assembly. The clamping assembly has first and second base portions, a lever, and a biasing member. Each of the first and second base portions has an inner facing side with a slot and an inner facing surface. The slots are adapted to receive bars on opposing sides of a fiber optic connector and cable assembly. The lever has a first end positioned between the inner facing surfaces and a second end extending outward therefrom. The clamping assembly has a locked position, when the first and second base portions are biased toward one another by the biasing member, and an unlocked position, when the lever overcomes a biasing force of the biasing member and separates the first and second base portions.

An integrated equipment for processing a plurality of fiber optic ferrules comprises a polishing system, a ferrule cleaning system, a drying system, a wiping system, and a robot system. The polishing system polishes a plurality of front end faces of the plurality of fiber optic ferrules mounted on a carrier. The ferrule cleaning system cleans the carrier and the fiber optic ferrules on the carrier after the fiber optic ferrules have been polished. The drying system dries the carrier and the fiber optic ferrules on the carrier after the carrier and the fiber optic ferrules have been cleaned. The wiping system wipes the front end faces of the fiber optic ferrules on the carrier after the carrier and the fiber optic ferrules have been dried. The robot system transfers the carrier to the polishing system, the ferrule cleaning system, the drying system, and the wiping system.

An integrated equipment for processing a plurality of fiber optic ferrules comprises a polishing system, a ferrule cleaning system, a drying system, a wiping system, and a robot system. The polishing system polishes a plurality of front end faces of the plurality of fiber optic ferrules mounted on a carrier. The ferrule cleaning system cleans the carrier and the fiber optic ferrules on the carrier after the fiber optic ferrules have been polished. The drying system dries the carrier and the fiber optic ferrules on the carrier after the carrier and the fiber optic ferrules have been cleaned. The wiping system wipes the front end faces of the fiber optic ferrules on the carrier after the carrier and the fiber optic ferrules have been dried. The robot system transfers the carrier to the polishing system, the ferrule cleaning system, the drying system, and the wiping system.

A high-moisture-permeability, microporous plastic film randomly having a lot of recesses having different opening diameters and depths, with clefts formed in the recesses, is produced by pressing a first pattern roll randomly having a lot of high-hardness, fine particles having sharp edges on a roll body surface to a flat-surface metal roll, to produce an anvil roll randomly having a lot of recesses on a metal roll surface; arranging a second pattern roll randomly having a lot of high-hardness, fine particles having sharp edges on a roll body surface oppositely to the anvil roll; and passing a plastic film through a gap between the second pattern roll and the anvil roll.

A silicon carbide single crystal substrate includes a first main surface, a second main surface, and a circumferential edge portion. The second main surface is opposite to the first main surface. The circumferential edge portion connects the first main surface and the second main surface. The circumferential edge portion has a linear orientation flat portion, a first arc portion having a first radius, and a second arc portion connecting the orientation flat portion and the first arc portion and having a second radius smaller than the first radius, when viewed along a direction perpendicular to the first main surface.

A silicon carbide single crystal substrate includes a first main surface, a second main surface, and a circumferential edge portion. The second main surface is opposite to the first main surface. The circumferential edge portion connects the first main surface and the second main surface. The circumferential edge portion has a linear orientation flat portion, a first arc portion having a first radius, and a second arc portion connecting the orientation flat portion and the first arc portion and having a second radius smaller than the first radius, when viewed along a direction perpendicular to the first main surface.

An apparatus for processing a ferrule with an abrasive element. The apparatus includes a first mount to which the ferrule is secured, a second mount to which the abrasive element is secured, and a controller operatively coupled to at least the second mount. The second mount includes a spindle to which the abrasive element is coupled, with the spindle having a central axis about which the spindle is configured to rotate. At least one of the first or second mounts is movable within a plane such that when the ferrule and the abrasive element are brought into contact with each other, the apparatus provides three degrees of freedom of movement for processing the ferrule with the abrasive element. A method of using the apparatus to process a ferrule is also disclosed.

An optical fiber polisher includes a polishing mechanism, a platen, and a memory for storing operational parameters entered by a user. The optical fiber polisher includes a processor to control a pressure applied by the polishing mechanism and a rotational speed of the platen, including causing a ramping down of at least one of the pressure and the rotational speed based on the operational parameters.

The cutter holder capable of polishing a workpiece has a body, a mandrel, a middle element and a brush assembly. The mandrel extends into the body. The middle element is mounted to the body with a part of the mandrel extending out of the middle element. The brush assembly is mounted with the part of the mandrel that extends out of the middle element.