A substrate polishing apparatus including a stage configured to load a substrate, the stage having a flat surface, which is parallel to a first direction and a second direction, and on which the substrate is loaded, a pressing unit configured to exert a pressure on the substrate in a third direction, a rotary unit configured to revolve the pressing unit around a central axis parallel to the third direction, when viewed in a plan view, a plurality of polishing pads provided between the pressing unit and the substrate to be in contact with the substrate, and a nozzle part configured to supply a slurry onto the substrate. The polishing pads may be spaced apart from each other in a direction and may have a rectangular shape in the plan view.

A rocker polishing apparatus for full-aperture deterministic polishing of a planar part includes a control system, a substrate, a lifting plate, a polishing module and a measuring module. The polishing module and the measuring module are arranged on the substrate. The lifting plate is arranged between the polishing module and the measuring module. The polishing module includes a rocker mechanism, a polishing pad surface dressing mechanism, a polishing pad surface profile measuring apparatus and a continuous polishing pad mechanism. The apparatus allows the material removal rate distribution of the planar part and the surface profile of the planar part be in the normalized mirror symmetry relationship by controlling the material removal rate distribution on the surface of the planar part, thereby implementing the deterministic polishing of the planar part and ensuring the efficient convergence of the surface profile of the planar part in the polishing process.

A rocker polishing apparatus for full-aperture deterministic polishing of a planar part includes a control system, a substrate, a lifting plate, a polishing module and a measuring module. The polishing module and the measuring module are arranged on the substrate. The lifting plate is arranged between the polishing module and the measuring module. The polishing module includes a rocker mechanism, a polishing pad surface dressing mechanism, a polishing pad surface profile measuring apparatus and a continuous polishing pad mechanism. The apparatus allows the material removal rate distribution of the planar part and the surface profile of the planar part be in the normalized mirror symmetry relationship by controlling the material removal rate distribution on the surface of the planar part, thereby implementing the deterministic polishing of the planar part and ensuring the efficient convergence of the surface profile of the planar part in the polishing process.

A system for the polishing treatment of inner walls of aquatic enclosures includes at least one tank of abrasive mixture and at least one surface treatment head which communicates fluidically with the tank of abrasive mixture, a mover allowing the treatment head to be moved along the wall to be treated, and a supply allowing the treatment head to be supplied with a substantially continuous flow of abrasive mixture.

A system for the polishing treatment of inner walls of aquatic enclosures includes at least one tank of abrasive mixture and at least one surface treatment head which communicates fluidically with the tank of abrasive mixture, a mover allowing the treatment head to be moved along the wall to be treated, and a supply allowing the treatment head to be supplied with a substantially continuous flow of abrasive mixture.

Provided are a mask blank substrate processing device, a mask blank substrate processing method, a mask blank substrate fabrication method, a mask blank fabrication method, and a transfer mask fabrication method, for surface processing a mask blank substrate such that a high-level smoothness and a low-defect quality are satisfied. A mask blank substrate processing device (1) comprises: substrate support means (3) for supporting a substrate (Y); a catalytic surface plate (4) comprising a catalytic face (4a) which is positioned opposite the principal surface of the substrate (Y); relative movement means (5) for causing the catalytic face (4a) and the principal surface to move relative to each other in a state of being either in contact or in close proximity; first processing fluid supply means (6) which supplies a first processing fluid for CARE to the principal surface; and physical cleaning means (7) for removing foreign matter which has adhered to the principal surface from the principal surface, using a physical action.

Provided are a mask blank substrate processing device, a mask blank substrate processing method, a mask blank substrate fabrication method, a mask blank fabrication method, and a transfer mask fabrication method, for surface processing a mask blank substrate such that a high-level smoothness and a low-defect quality are satisfied. A mask blank substrate processing device (1) comprises: substrate support means (3) for supporting a substrate (Y); a catalytic surface plate (4) comprising a catalytic face (4a) which is positioned opposite the principal surface of the substrate (Y); relative movement means (5) for causing the catalytic face (4a) and the principal surface to move relative to each other in a state of being either in contact or in close proximity; first processing fluid supply means (6) which supplies a first processing fluid for CARE to the principal surface; and physical cleaning means (7) for removing foreign matter which has adhered to the principal surface from the principal surface, using a physical action.

Provided is a tire mounting method for mounting tires on a tire holding device 1, wherein the tire holding device comprises a pair of split rim members 4 facing each other, a center axis A of each of the pair of split rim members is on a common predetermined axis O, the tire mounting method includes: a clamping step clamping a tire by the pair of split rim members, and a rotating step, after the clamping step, mounting each bead portion of the tire to the pair of split rim members while rotating the pair of split rim members around the predetermined axis.

Provided is a tire mounting method for mounting tires on a tire holding device 1, wherein the tire holding device comprises a pair of split rim members 4 facing each other, a center axis A of each of the pair of split rim members is on a common predetermined axis O, the tire mounting method includes: a clamping step clamping a tire by the pair of split rim members, and a rotating step, after the clamping step, mounting each bead portion of the tire to the pair of split rim members while rotating the pair of split rim members around the predetermined axis.

The present application provides a tool for cleaning a groove of a turbine rotor disk. The tool may include a pair of guides spaced apart from one another in a direction of a longitudinal axis of the tool, and a number of cleaning sheets positioned between the guides in the direction of the longitudinal axis of the tool. At least a portion of each guide may have a cross-sectional profile corresponding to a cross-sectional profile of the groove, and at least a portion of each cleaning sheet may have a cross-sectional profile corresponding to the cross-sectional profile of the groove. The present application further provides a method for cleaning a groove of a turbine rotor disk, and a tool system for cleaning a groove of a turbine rotor disk.