Patent classifications
B24B31/003
CHAMBER COMPONENTS WITH POLISHED INTERNAL APERTURES
Disclosed herein is a plasma-resistant chamber component and a method for manufacturing the same. A plasma-resistant chamber component of a semiconductor processing chamber that generates a plasma environment includes a ceramic article having multiple polished apertures. A roughness of the multiple polished apertures is less than 32 μin.
Method for removing adhering matter
An adhering matter removing method for removing adhering matter on a surface of an article includes the step of immersing a target surface of the article into a fluidized bed.
Vibrating barrel polishing method and vibrating barrel polishing system
In one embodiment, a vibration barrel polishing method using a vibration barrel polishing system that includes a polishing tank having a bottom surface therein and a polishing jig capable of holding a workpiece and rotatable around a rotation axis is provided. This method includes a step of supporting the polishing jig in the polishing tank in a state in which a lowermost portion of the polishing jig is separated from the bottom surface, a clearance d between the lowermost portion of the polishing jig and the bottom surface being greater than or equal to a grain diameter of a polishing medium, a step of causing the polishing medium to flow in the polishing tank, and a step of rotating the polishing jig around the rotation axis in the state in which the lowermost portion of the polishing jig is separated from the bottom surface.
ABRASIVE PEENING APPARATUS AND ABRASIVE PEENING METHOD
An apparatus capable of efficiently performing a metal surface processing. The abrasive peening apparatus includes a processing tank storing abrasive particles and peening liquid, and including a bottom portion in which a workpiece is immersed in the peening liquid; a dispensing chamber having a plurality of recesses on an upper surface, and disposed in the bottom portion to dispense the peening liquid; a stirring nozzle disposed at a center of the recess directing vertically upward and connected to the dispensing chamber to eject the peening liquid; a peening nozzle immersed inside the processing tank to eject the peening liquid toward the workpiece; and a moving device moving the peening nozzle relative to the workpiece.
Method for smoothing and polishing metals via ion transport via free solid bodies and solid bodies for performing the method
An apparatus and method for smoothing and polishing metals via ion transport by free solid bodies. The method includes connecting a part to be treated to a positive pole (anode) of a current generator and subjecting the part to friction with a set of particles comprising electrically conductive free solid bodies charged with negative electrical charge in a gaseous environment.
Vibratory Grinding Device
A vibratory grinding device has a work container and a grinding body removal device by which grinding bodies can be led out of the work container.
METHOD FOR REMOVING ADHERING MATTER
An adhering matter removing method for removing adhering matter on a surface of an article includes the step of immersing a target surface of the article into a fluidized bed.
Method and apparatus for machining a component
The present subject matter relates to a method and an apparatus in the form of a machine system (1200) for machining a component (100) with an internal passage (115). In an aspect, the method comprises periodically injecting 5 abrasive slurry back and forth through the internal passage (115) at a pressure ranging from about 25 bar to about 35 bar. The abrasive slurry comprises a mixture of abrasive particles having a size in the range of about 40 m to about 60 m, and a slurry medium. The volume fraction of the abrasive particles in the slurry medium is about 40% to about 50%. Further, the injection of the abrasive 10 slurry is performed for a predefined number of process cycles at predetermined time versus pressure changes to obtain the component having a final average surface roughness of less than about 3.0 m.
METHOD FOR SMOOTHING AND POLISHING METALS VIA ION TRANSPORT VIA FREE SOLID BODIES AND SOLID BODIES FOR PERFORMING THE METHOD
A method for smoothing and polishing metals via ion transport by free solid bodies comprises connecting a part to be treated to a positive pole (anode) of a current generator and subjecting the part to friction with a set of particles comprising electrically conductive free solid bodies charged with negative electrical charge in a gaseous environment.
METHOD FOR SMOOTHING AND POLISHING METALS VIA ION TRANSPORT VIA FREE SOLID BODIES AND SOLID BODIES FOR PERFORMING THE METHOD
An apparatus and method for smoothing and polishing metals via ion transport by free solid bodies. The method includes connecting a part to be treated to a positive pole (anode) of a current generator and subjecting the part to friction with a set of particles comprising electrically conductive free solid bodies charged with negative electrical charge in a gaseous environment.