A method of shaping a cutting blade, includes a modified layer forming step of forming a plurality of modified layers at different heights within a dressing member by irradiating the dressing member with a laser beam having a wavelength transmissible through the dressing member from one surface of the dressing member a plurality of times while a focusing point of the laser beam is positioned within the dressing member, and a blade shaping step of shaping the cutting blade into a predetermined shape formed by the plurality of modified layers by cutting the dressing member by the cutting blade until the cutting blade reaches the modified layers after performing the modified layer forming step.

A method of shaping a cutting blade, includes a modified layer forming step of forming a plurality of modified layers at different heights within a dressing member by irradiating the dressing member with a laser beam having a wavelength transmissible through the dressing member from one surface of the dressing member a plurality of times while a focusing point of the laser beam is positioned within the dressing member, and a blade shaping step of shaping the cutting blade into a predetermined shape formed by the plurality of modified layers by cutting the dressing member by the cutting blade until the cutting blade reaches the modified layers after performing the modified layer forming step.

A coupling mechanism which enables a rotating body to follow an undulation of a polishing surface without generating flutter or vibration of the rotating body, and can finely control a load on the rotating body on a polishing surface in a load range which is smaller than the gravity of rotating body is disclosed. The coupling mechanism includes an upper spherical bearing and a lower spherical bearing disposed between a drive shaft and the rotating body. The upper spherical bearing has a first concave contact surface and a second convex contact surface which are in contact with each other, and the lower spherical bearing has a third concave contact surface and a fourth convex contact surface which are in contact with each other. The first concave contact surface and the second convex contact surface are located above the third concave contact surface and the fourth convex contact surface. The first concave contact surface, the second convex contact surface, the third concave contact surface, the fourth convex contact surface are arranged concentrically.

A coupling mechanism which enables a rotating body to follow an undulation of a polishing surface without generating flutter or vibration of the rotating body, and can finely control a load on the rotating body on a polishing surface in a load range which is smaller than the gravity of rotating body is disclosed. The coupling mechanism includes an upper spherical bearing and a lower spherical bearing disposed between a drive shaft and the rotating body. The upper spherical bearing has a first concave contact surface and a second convex contact surface which are in contact with each other, and the lower spherical bearing has a third concave contact surface and a fourth convex contact surface which are in contact with each other. The first concave contact surface and the second convex contact surface are located above the third concave contact surface and the fourth convex contact surface. The first concave contact surface, the second convex contact surface, the third concave contact surface, the fourth convex contact surface are arranged concentrically.

A gimbal for a conditioning system for a CMP tool is configured to maintain a conditioning disk in contact with a polishing pad of the CMP tool. The gimbal includes an arm coupling for coupling to a conditioning swing arm of the CMP tool; and a disk holder for holding the conditioning disk. A flexible diaphragm extends between the arm coupling and the disk holder. The flexible diaphragm allows the disk holder to flex relative to the arm coupling. The flexible diaphragm is made of a metal or metal alloy.

A gimbal for a conditioning system for a CMP tool is configured to maintain a conditioning disk in contact with a polishing pad of the CMP tool. The gimbal includes an arm coupling for coupling to a conditioning swing arm of the CMP tool; and a disk holder for holding the conditioning disk. A flexible diaphragm extends between the arm coupling and the disk holder. The flexible diaphragm allows the disk holder to flex relative to the arm coupling. The flexible diaphragm is made of a metal or metal alloy.

A sample preparation saw (10) has a base (130, 146, 14, 47), a housing (12, 76), a saw (10) assembly (30, 58) mounted to the base (130, 146, 14, 47), a dressing assembly (58), a sample clamping assembly (100) mounted to the base (130, 146, 14, 47), and a reservoir assembly (30, 58). The saw (10) assembly (30, 58) includes a blade assembly (30) with a rotating blade (24). The blade assembly (30) is movable along x-, y- and z-axes by at least two drives (27, 36). The dressing assembly (58) is operable to dress the rotating blade (24). The sample clamping assembly (100) includes a rail (102), a sample mount (104) removably positioned on the rail (102) and a saddle (106) operable to hold a sample. The reservoir assembly (30, 58) is operable to recirculate a rinse fluid sprayed on the rotating blade (24), and includes a basin (178) having a pump (180) and a series of weirs (188A, 188).

A workpiece processing method includes: a dresser preparing step of preparing a dresser of a predetermined thickness; a fixing step of fixing the workpiece and the dresser on a support member adjacently to each other in a first direction; a holding step of holding the support member by a holding table, after the fixing step is performed; and a cutting step of positioning a tool edge of the cutting blade at a predetermined height and cutting the workpiece and the dresser in the first direction by a cutting blade, after the holding step is performed.

A workpiece processing method includes: a dresser preparing step of preparing a dresser of a predetermined thickness; a fixing step of fixing the workpiece and the dresser on a support member adjacently to each other in a first direction; a holding step of holding the support member by a holding table, after the fixing step is performed; and a cutting step of positioning a tool edge of the cutting blade at a predetermined height and cutting the workpiece and the dresser in the first direction by a cutting blade, after the holding step is performed.

A method for performing a chemical mechanical polishing (CMP) is disclosed. The method includes supplying a slurry onto a polishing pad, holding a first wafer against the polishing pad by a first polishing head, holding a second wafer against the polishing pad by a second polishing head, and rotating the polishing pad.