An axial machining tool includes a cutter holder, a collet, a dust blower nut, and a cutter. The cutter holder has a receiving groove. The collet is extended into the receiving groove and has a containing space. The dust blower nut is sleeved on the collet and has a body, at least one blade, and a positioning element. The body has a threaded hole, a connecting groove, and at least one engaging groove. The threaded hole and the connecting groove are formed in the body and communicate with each other. The at least one engaging groove is formed on the body. The at least one blade is detachably mounted in the at least one engaging groove. The positioning element is mounted to the body and positions the at least one blade on the body. The cutter is extended into the containing space. A dust blower nut is also provided.

Provided is a method for filtering an additive-containing liquid that can achieve a polishing composition exhibiting excellent defect reducing capability while maintaining a practical filter life. The method for filtering a polishing additive-containing liquid provided by the present invention includes the step of: filtering the polishing additive-containing liquid with a filter that satisfies the following conditions (1) and (2). (1) The average pore diameter P measured by a palm porometer is 0.15 μm or less. (2) The pore diameter gradient (S.sub.in/S.sub.out), which is the ratio of the inlet-side average pore diameter (SO to the outlet-side average pore diameter (S.sub.out), both diameters being measured through observation with an SEM, is 3 or less.

A substrate processing apparatus includes a chuck configured to hold a substrate horizontally; a processing unit configured to press a processing tool against an outer periphery of the substrate held by the chuck to process the substrate; and a lower cup configured to collect a processing residue falling from the substrate over an entire circumference of the substrate. The lower cup is provided with a discharge opening through which the processing residue is discharged.

A substrate processing apparatus includes a chuck configured to hold a substrate horizontally; a processing unit configured to press a processing tool against an outer periphery of the substrate held by the chuck to process the substrate; and a lower cup configured to collect a processing residue falling from the substrate over an entire circumference of the substrate. The lower cup is provided with a discharge opening through which the processing residue is discharged.

An oil mist recovery, separation and purification device for a minimum quantity lubricant (MQL) grinding process, including: a pneumatic separation mechanism, a pipeline and a fan fixedly connected with one end of the pipeline, wherein the fan is configured to form a negative pressure in the pipeline, one cone-shaped filter mesh mechanism is disposed in the pipeline, and a tip of the cone-shaped filter mesh mechanism faces the side of an air inlet direction of the pipeline; and a filtering and recovery mechanism connected with the pipeline and including a case body, a filtering mechanism and a recovery mechanism, wherein the case body is connected with the pipeline through a connecting part, and the filtering mechanism is connected with the recovery mechanism. The device can separate, recover and reuse oil mist particles in the air.

An oil mist recovery, separation and purification device for a minimum quantity lubricant (MQL) grinding process, including: a pneumatic separation mechanism, a pipeline and a fan fixedly connected with one end of the pipeline, wherein the fan is configured to form a negative pressure in the pipeline, one cone-shaped filter mesh mechanism is disposed in the pipeline, and a tip of the cone-shaped filter mesh mechanism faces the side of an air inlet direction of the pipeline; and a filtering and recovery mechanism connected with the pipeline and including a case body, a filtering mechanism and a recovery mechanism, wherein the case body is connected with the pipeline through a connecting part, and the filtering mechanism is connected with the recovery mechanism. The device can separate, recover and reuse oil mist particles in the air.

Embodiments of the present disclosure generally provide apparatus for collecting and reuse polishing fluids and methods related thereto. In particular, the apparatus and methods provided herein feature a polishing fluid collection system used to collect and reuse polishing fluids dispensed during the chemical mechanical polishing (CMP) of a substrate in an electronic device manufacturing process. In one embodiment, a polishing fluid catch basin assembly includes a catch basin sized to surround at least a portion of a polishing platen and to be spaced apart therefrom. The catch basin features an outer wall, an inner wall disposed radially inward of the outer wall, and a base portion connecting the inner wall to the outer wall. The outer wall, the inner wall, and the base portion collectively define a trough. A radially inward facing surface of the inner wall is defined by an arc radius which is greater than a radius of the polishing platen the catch basin is sized to surround.

Embodiments of the present disclosure generally provide apparatus for collecting and reuse polishing fluids and methods related thereto. In particular, the apparatus and methods provided herein feature a polishing fluid collection system used to collect and reuse polishing fluids dispensed during the chemical mechanical polishing (CMP) of a substrate in an electronic device manufacturing process. In one embodiment, a polishing fluid catch basin assembly includes a catch basin sized to surround at least a portion of a polishing platen and to be spaced apart therefrom. The catch basin features an outer wall, an inner wall disposed radially inward of the outer wall, and a base portion connecting the inner wall to the outer wall. The outer wall, the inner wall, and the base portion collectively define a trough. A radially inward facing surface of the inner wall is defined by an arc radius which is greater than a radius of the polishing platen the catch basin is sized to surround.

A processing machine includes a chuck table, a chuck table cover having an opening through which a holding surface of the chuck table can protrude, a processing unit having a spindle, a spindle housing, and a mount portion arranged on a lower end portion of the spindle, the processing unit being configured to process a workpiece by a processing tool mounted on a lower part of the mount portion, a processing chamber construction cover that covers the chuck table and the mount portion. The processing machine further includes a processing tool cover that is secured to a lower end portion of the spindle housing and that has an upper wall and a side wall that extends downwardly from the upper wall. The processing tool cover is disposed inside the processing chamber construction cover and covers the processing tool from above and sides by the upper and side walls.

A processing machine includes a chuck table, a chuck table cover having an opening through which a holding surface of the chuck table can protrude, a processing unit having a spindle, a spindle housing, and a mount portion arranged on a lower end portion of the spindle, the processing unit being configured to process a workpiece by a processing tool mounted on a lower part of the mount portion, a processing chamber construction cover that covers the chuck table and the mount portion. The processing machine further includes a processing tool cover that is secured to a lower end portion of the spindle housing and that has an upper wall and a side wall that extends downwardly from the upper wall. The processing tool cover is disposed inside the processing chamber construction cover and covers the processing tool from above and sides by the upper and side walls.