A polishing device configured to polish a glass substrate is disclosed, including a polishing wheel fixedly arranged, a cooling pipe, and a movable platform. The polishing wheel has an outer peripheral polishing surface, the glass substrate is placed on the platform and is driven by the platform to move so as to make the outer peripheral polishing surface polish the predetermined polishing surface of the glass substrate; the polishing wheel further has a chamber, and the cooling pipe containing a coolant is disposed in the chamber to decrease a temperature of the chamber and then to make temperatures of the outer peripheral polishing surface and the predetermined polishing surface during polishing is lower than a preset temperature. The disclosure solves the problem of high polishing temperature of the polishing wheel and the glass substrate, thereby enhancing the service life of the polishing wheel and the yield of the glass substrate.

A machine tool includes a main shaft unit; a polishing head for processing a workpiece; and an unnecessary byproduct leakage preventing unit for preventing leakage of abrasive resulting from processing at or around a part of the workpiece, the part being processed, and wherein the unnecessary byproduct leakage preventing unit includes a cover provided separately from the polishing head, the cover having a structure that is open in three directions and that has walls in another three directions such that a protection space where to hold a part of the workpiece is defined, the cover for receiving the abrasive, and a movement mechanism for moving the cover so as to stay apart from the workpiece while the workpiece is not being processed and so as to have a part of the workpiece held in the protection space while the workpiece is being processed.

A machine tool includes a main shaft unit; a polishing head for processing a workpiece; and an unnecessary byproduct leakage preventing unit for preventing leakage of abrasive resulting from processing at or around a part of the workpiece, the part being processed, and wherein the unnecessary byproduct leakage preventing unit includes a cover provided separately from the polishing head, the cover having a structure that is open in three directions and that has walls in another three directions such that a protection space where to hold a part of the workpiece is defined, the cover for receiving the abrasive, and a movement mechanism for moving the cover so as to stay apart from the workpiece while the workpiece is not being processed and so as to have a part of the workpiece held in the protection space while the workpiece is being processed.

The present disclosure provides a method of operating a separator (1,1a, 1b) for separating particles from a particle-laden airflow. The method comprises receiving, in the controller (18), a separation unit status signal from the separation unit status sensor (16a, 16b, 16c, 16d), deriving, in the controller (18), separator status data based on the separation unit status signal, communicating, via the communication device (19), the separator status data to the external unit (1a, 1b, 26), receiving, via the communication device (19), incoming control data from the external unit (1a, 1b, 26), determining, in the controller (18), based on the separator status data and based on the incoming control data, whether to initiate separating unit maintenance, and selectively initiating separating unit maintenance based on said determination. The disclosure also provides a separator for implementing the method and a system comprising two or more such separators.

The present invention relates to a device for recovering, separating and purifying oil mist in a minimum quantity lubricant (MQL) grinding process, comprising: an air separating mechanism, which comprises a pipeline and a fan fixedly connected with one end of the pipeline, wherein the fan is used for forming negative pressure in the pipeline, at least, one conical filter mesh mechanism is arranged in the pipeline, and a tip of the conical filter mesh mechanism faces one side of an air inlet direction of the pipeline; and a filtering and recovering mechanism, which is connected with the pipeline and comprises a tank body, a filtering mechanism and a recovering mechanism, wherein the tank body is connected with the pipeline by a connecting part, and the filtering mechanism is connected with the recovering mechanism.

A substrate polishing apparatus includes a polishing table 30 having a polishing surface 10 in the upper surface, a substrate holding portion 31 that holds a substrate W having a surface to be polished in the lower surface, and a holding portion cover 36 that covers the outer side of the substrate holding portion 31. Between the lower portion of the holding portion cover 36 and the upper surface of the polishing table 30, a gap portion for intake 37 is provided, and in the upper portion of the holding portion cover 36, a pipe for exhaust 39 connected to an exhaust mechanism 38 is provided. By operating the exhaust mechanism 38, a rising air current from the gap portion 37 toward the pipe 39 is formed between the outer surface of the substrate holding portion 31 and the inner surface of the holding portion cover 36.

A substrate polishing apparatus includes a polishing table 30 having a polishing surface 10 in the upper surface, a substrate holding portion 31 that holds a substrate W having a surface to be polished in the lower surface, and a holding portion cover 36 that covers the outer side of the substrate holding portion 31. Between the lower portion of the holding portion cover 36 and the upper surface of the polishing table 30, a gap portion for intake 37 is provided, and in the upper portion of the holding portion cover 36, a pipe for exhaust 39 connected to an exhaust mechanism 38 is provided. By operating the exhaust mechanism 38, a rising air current from the gap portion 37 toward the pipe 39 is formed between the outer surface of the substrate holding portion 31 and the inner surface of the holding portion cover 36.

A cleaning device arranged in a table which is driven. The cleaning device includes one or more cleaning through holes provided in the table and opened at positions facing a workpiece or a jig, a container unit provided in the table and including a storage space which receives cleaning fluid; a movable member that is arranged in the container unit, that defines the storage space, and that is supported movably in a direction intersecting a horizontal axis line; and a cleaning piping component connecting the storage space and the cleaning through holes.

A processing machine includes a chuck table, a chuck table cover having an opening through which a holding surface of the chuck table can protrude, a processing unit having a spindle, a spindle housing, and a mount portion arranged on a lower end portion of the spindle, the processing unit being configured to process a workpiece by a processing tool mounted on a lower part of the mount portion, a processing chamber construction cover that covers the chuck table and the mount portion. The processing machine further includes a processing tool cover that is secured to a lower end portion of the spindle housing and that has an upper wall and a side wall that extends downwardly from the upper wall. The processing tool cover is disposed inside the processing chamber construction cover and covers the processing tool from above and sides by the upper and side walls.

A processing machine includes a chuck table, a chuck table cover having an opening through which a holding surface of the chuck table can protrude, a processing unit having a spindle, a spindle housing, and a mount portion arranged on a lower end portion of the spindle, the processing unit being configured to process a workpiece by a processing tool mounted on a lower part of the mount portion, a processing chamber construction cover that covers the chuck table and the mount portion. The processing machine further includes a processing tool cover that is secured to a lower end portion of the spindle housing and that has an upper wall and a side wall that extends downwardly from the upper wall. The processing tool cover is disposed inside the processing chamber construction cover and covers the processing tool from above and sides by the upper and side walls.