Patent classifications
B24B57/04
Methods for a web-based CMP system
Embodiments of the present disclosure generally provide methods, polishing systems with computer readable medium having the methods stored thereon, to facilitate consistent tensioning of a polishing article disposed on a web-based polishing system. In one embodiment, a substrate processing method includes winding a used portion of a polishing article onto a take-up roll of a polishing system by rotating a first spindle having the take-up roll disposed thereon; measuring, using an encoder wheel, a polishing article advancement length of the used portion of the polishing article wound onto the take-up roll; determining a tensioning torque to apply to a supply roll using the measured polishing article advancement length; and tensioning the polishing article by applying the tensioning torque to the supply roll.
CHAMBER COMPONENTS WITH POLISHED INTERNAL APERTURES
Disclosed herein is a plasma-resistant chamber component and a method for manufacturing the same. A plasma-resistant chamber component of a semiconductor processing chamber that generates a plasma environment includes a ceramic article having multiple polished apertures. A roughness of the multiple polished apertures is less than 32 .Math.in.
CHAMBER COMPONENTS WITH POLISHED INTERNAL APERTURES
Disclosed herein is a plasma-resistant chamber component and a method for manufacturing the same. A plasma-resistant chamber component of a semiconductor processing chamber that generates a plasma environment includes a ceramic article having multiple polished apertures. A roughness of the multiple polished apertures is less than 32 .Math.in.
CHAMBER COMPONENTS WITH POLISHED INTERNAL APERTURES
Disclosed herein is a plasma-resistant chamber component and a method for manufacturing the same. A plasma-resistant chamber component of a semiconductor processing chamber that generates a plasma environment includes a ceramic article having multiple polished apertures. A roughness of the multiple polished apertures is less than 32 μin.
ABRASIVE FLOW MACHINING PROCESS FOR A MERIDIONALLY DIVIDED TURBINE HOUSING, AND A MASKING FIXTURE USED IN SAID PROCESS
An abrasive flow machining process for a meridionally divided turbine housing for a turbocharger employs a fixture installed in the axial bore of the housing to force the abrasive medium to flow substantially 360° about the circumference of the volute, and to shield the portion of the divider of the turbine housing volute located proximate the turbine housing inlet.
CONDENSED GAS PAD CONDITIONER
A polishing system including a platen to support a polishing pad, a carrier head to hold a substrate against the polishing pad, a source of dry ice particles, and a pad conditioner. The pad conditioner includes a compressor to generate a compressed gas stream, a mixer coupled to the source and the compressor to mix the dry ice particles with the compressed gas stream to form a stream of compressed gas with entrained dry ice particles, and a nozzle coupled to the mixer to direct the stream of compressed gas with entrained dry ice particles onto a polishing surface of the polishing pad at sufficient velocity to condition the polishing pad.
CONDENSED GAS PAD CONDITIONER
A polishing system including a platen to support a polishing pad, a carrier head to hold a substrate against the polishing pad, a source of dry ice particles, and a pad conditioner. The pad conditioner includes a compressor to generate a compressed gas stream, a mixer coupled to the source and the compressor to mix the dry ice particles with the compressed gas stream to form a stream of compressed gas with entrained dry ice particles, and a nozzle coupled to the mixer to direct the stream of compressed gas with entrained dry ice particles onto a polishing surface of the polishing pad at sufficient velocity to condition the polishing pad.
Vibratory Grinding Device
A vibratory grinding device has a work container and a grinding body removal device by which grinding bodies can be led out of the work container.
Blasting System with Dual Dispensers from Single Chamber
A tank assembly. The tank assembly comprises a shell, a plurality of conical dispensers, a plurality of drawtubes, a plurality of drawtube apertures, a slurry reservoir, one or more spray equipment and a slurry mixture. The slurry reservoir comprises a fluid reservoir within the shell of the tank assembly. The slurry reservoir comprises an upper reservoir and a conical dispensers reservoir. The conical dispensers reservoir can comprise a fluid space within the plurality of conical dispensers. each among the plurality of drawtubes comprise a drawtube axis. The plurality of drawtubes comprise at least a first drawtube and a second drawtube.
Blasting System with Dual Dispensers from Single Chamber
A tank assembly. The tank assembly comprises a shell, a plurality of conical dispensers, a plurality of drawtubes, a plurality of drawtube apertures, a slurry reservoir, one or more spray equipment and a slurry mixture. The slurry reservoir comprises a fluid reservoir within the shell of the tank assembly. The slurry reservoir comprises an upper reservoir and a conical dispensers reservoir. The conical dispensers reservoir can comprise a fluid space within the plurality of conical dispensers. each among the plurality of drawtubes comprise a drawtube axis. The plurality of drawtubes comprise at least a first drawtube and a second drawtube.