A curvature retaining device (1) includes two support points (25a) that can abut against one surface of a plate-shaped workpiece W, one or more pressing points (40a) that can abut against a position of the other surface of the plate-shaped workpiece (W) between the support points (25a), and forward/backward drive means (support unit (23) and pressing unit (33)) for moving at least either the support points (25a) or the pressing points (40a) forward to and backward from the other. Preferably, the two support points (25a) abut against the one surface of the plate-shaped workpiece (W) at a first distance (Ls), the two pressing points (40a) abut against the other surface of the plate-shaped workpiece (W) at second distance (Lp) shorter than the first distance (Ls), and a middle point of the first distance (Ls) and a middle point of the second distance (Lp) match with each other.

An impeller for a centrifugal blasting wheel includes a base plate, a support collar, and a plurality of spaced rotor blades interconnecting the base plate and support collar. A step is formed at the inner end of the collar and the outer ends of the rotor blades which causes blasting shot to be discharged to the throwing blades of the blasting wheel in a relatively more radial direction to reduce wear of the throwing blades. The base plate also has a frustum-shaped central boss formed to minimize wear of the base plate by the blasting shot. The frustum-shaped central boss has a recess formed therein so that the head of the bolt that connects the impeller to the throwing wheel is located entirely within the recess to also reduce wear of the bolt head.

An impeller for a centrifugal blasting wheel includes a base plate, a support collar, and a plurality of spaced rotor blades interconnecting the base plate and support collar. A step is formed at the inner end of the collar and the outer ends of the rotor blades which causes blasting shot to be discharged to the throwing blades of the blasting wheel in a relatively more radial direction to reduce wear of the throwing blades. The base plate also has a frustum-shaped central boss formed to minimize wear of the base plate by the blasting shot. The frustum-shaped central boss has a recess formed therein so that the head of the bolt that connects the impeller to the throwing wheel is located entirely within the recess to also reduce wear of the bolt head.

An apparatus for treating a surface of an object is disclosed, including a carrier configured to transport the object through a treatment zone and an array of nozzle devices, each nozzle device positioned to deliver a cavitating jet into the treatment zone. The apparatus further includes a fluid source, a pump connected to the fluid source, and a hose configured to carry fluid under high pressure generated by the pump from the fluid source to the array of nozzle devices.

A cavitation peening system is disclosed, including a tank containing a fluid, a carrier, and an array of cavitation nozzles. The carrier is configured to deliver a workpiece to a treatment zone in the tank, and the array of cavitation nozzles are collectively configured to generate a cavitation induced whirlpool in the treatment zone.

A cavitation peening system is disclosed, including a tank containing a fluid, a carrier, and an array of cavitation nozzles. The carrier is configured to deliver a workpiece to a treatment zone in the tank, and the array of cavitation nozzles are collectively configured to generate a cavitation induced whirlpool in the treatment zone.

In a WJP execution method for a reactor vessel lid, WJP is executed on the inner surface of the reactor vessel lid in a state in which an underwater environment is formed on the inner surface of the reactor vessel lid and an aerial environment is formed on the outer surface thereof. In addition, the reactor vessel lid with a waterproof jig attached thereto is arranged in water, the waterproof jig having a cylindrical shape extending to the side of the outer surface of the reactor vessel lid and constituting a vessel with the reactor vessel lid as the bottom portion thereof. Moreover, the reactor vessel lid is arranged on a base installed in the water.

In a WJP execution method for a reactor vessel lid, WJP is executed on the inner surface of the reactor vessel lid in a state in which an underwater environment is formed on the inner surface of the reactor vessel lid and an aerial environment is formed on the outer surface thereof. In addition, the reactor vessel lid with a waterproof jig attached thereto is arranged in water, the waterproof jig having a cylindrical shape extending to the side of the outer surface of the reactor vessel lid and constituting a vessel with the reactor vessel lid as the bottom portion thereof. Moreover, the reactor vessel lid is arranged on a base installed in the water.

A peening device for treating a component includes a shot media propulsion source configured to propel a quantity of shot media. The device also includes a plurality of treatment enclosures each selectively coupleable to the shot media propulsion source. Each of the treatment enclosures has a shape complementary to a corresponding one of a plurality of portions of the component, such that each treatment enclosure and the corresponding portion cooperate to enclose the shot media.

A peening device for treating a component includes a shot media propulsion source configured to propel a quantity of shot media. The device also includes a plurality of treatment enclosures each selectively coupleable to the shot media propulsion source. Each of the treatment enclosures has a shape complementary to a corresponding one of a plurality of portions of the component, such that each treatment enclosure and the corresponding portion cooperate to enclose the shot media.