B24D11/04

METHODS AND PRECURSOR FORMULATIONS FOR FORMING ADVANCED POLISHING PADS BY USE OF AN ADDITIVE MANUFACTURING PROCESS

Embodiments of the present disclosure relate to advanced polishing pads with tunable chemical, material and structural properties, and new methods of manufacturing the same. According to one or more embodiments of the disclosure, it has been discovered that a polishing pad with improved properties may be produced by an additive manufacturing process, such as a three-dimensional (3D) printing process. Embodiments of the present disclosure thus may provide an advanced polishing pad that has discrete features and geometries, formed from at least two different materials that include functional polymers, functional oligomers, reactive diluents, addition polymer precursor compounds, catalysts, and curing agents. For example, the advanced polishing pad may be formed from a plurality of polymeric layers, by the automated sequential deposition of at least one polymer precursor composition followed by at least one curing step, wherein each layer may represent at least one polymer composition, and/or regions of different compositions. Embodiments of the disclosure further provide a polishing pad with polymeric layers that may be interpenetrating polymer networks.

METHODS AND PRECURSOR FORMULATIONS FOR FORMING ADVANCED POLISHING PADS BY USE OF AN ADDITIVE MANUFACTURING PROCESS

Embodiments of the present disclosure relate to advanced polishing pads with tunable chemical, material and structural properties, and new methods of manufacturing the same. According to one or more embodiments of the disclosure, it has been discovered that a polishing pad with improved properties may be produced by an additive manufacturing process, such as a three-dimensional (3D) printing process. Embodiments of the present disclosure thus may provide an advanced polishing pad that has discrete features and geometries, formed from at least two different materials that include functional polymers, functional oligomers, reactive diluents, addition polymer precursor compounds, catalysts, and curing agents. For example, the advanced polishing pad may be formed from a plurality of polymeric layers, by the automated sequential deposition of at least one polymer precursor composition followed by at least one curing step, wherein each layer may represent at least one polymer composition, and/or regions of different compositions. Embodiments of the disclosure further provide a polishing pad with polymeric layers that may be interpenetrating polymer networks.

Advanced polishing pad materials and formulations

Embodiments of the present disclosure relate to advanced polishing pads with tunable chemical, material and structural properties, and new methods of manufacturing the same. According to one or more embodiments of the disclosure, it has been discovered that a polishing pad with improved properties may be produced by an additive manufacturing process, such as a three-dimensional (3D) printing process. Embodiments of the present disclosure thus may provide an advanced polishing pad that has discrete features and geometries, formed from at least two different materials that include functional polymers, functional oligomers, reactive diluents, and curing agents. For example, the advanced polishing pad may be formed from a plurality of polymeric layers, by the automated sequential deposition of at least one resin precursor composition followed by at least one curing step, wherein each layer may represent at least one polymer composition, and/or regions of different compositions.

Advanced polishing pad materials and formulations

Embodiments of the present disclosure relate to advanced polishing pads with tunable chemical, material and structural properties, and new methods of manufacturing the same. According to one or more embodiments of the disclosure, it has been discovered that a polishing pad with improved properties may be produced by an additive manufacturing process, such as a three-dimensional (3D) printing process. Embodiments of the present disclosure thus may provide an advanced polishing pad that has discrete features and geometries, formed from at least two different materials that include functional polymers, functional oligomers, reactive diluents, and curing agents. For example, the advanced polishing pad may be formed from a plurality of polymeric layers, by the automated sequential deposition of at least one resin precursor composition followed by at least one curing step, wherein each layer may represent at least one polymer composition, and/or regions of different compositions.

Polishing pads produced by an additive manufacturing process

Embodiments of the present disclosure relate to advanced polishing pads with tunable chemical, material and structural properties, and new methods of manufacturing the same. According to one or more embodiments of the disclosure, it has been discovered that a polishing pad with improved properties may be produced by an additive manufacturing process, such as a three-dimensional (3D) printing process. Embodiments of the present disclosure thus may provide an advanced polishing pad that has discrete features and geometries, formed from at least two different materials that include functional polymers, functional oligomers, reactive diluents, and curing agents. For example, the advanced polishing pad may be formed from a plurality of polymeric layers, by the automated sequential deposition of at least one resin precursor composition followed by at least one curing step, wherein each layer may represent at least one polymer composition, and/or regions of different compositions.

Polishing pads produced by an additive manufacturing process

Embodiments of the present disclosure relate to advanced polishing pads with tunable chemical, material and structural properties, and new methods of manufacturing the same. According to one or more embodiments of the disclosure, it has been discovered that a polishing pad with improved properties may be produced by an additive manufacturing process, such as a three-dimensional (3D) printing process. Embodiments of the present disclosure thus may provide an advanced polishing pad that has discrete features and geometries, formed from at least two different materials that include functional polymers, functional oligomers, reactive diluents, and curing agents. For example, the advanced polishing pad may be formed from a plurality of polymeric layers, by the automated sequential deposition of at least one resin precursor composition followed by at least one curing step, wherein each layer may represent at least one polymer composition, and/or regions of different compositions.

COATED ABRASIVE DISC AND METHODS OF MAKING AND USING THE SAME

A coated abrasive disc includes a disc backing and an abrasive layer disposed thereon. The abrasive layer comprises abrasive elements secured to a major surface of the disc backing by at least one binder material. The abrasive elements are disposed at contiguous intersections of horizontal and vertical lines of a rectangular grid pattern. At least 70 percent of the intersections have one of the abrasive elements disposed thereat. Each of the abrasive elements has two triangular abrasive platelets. Each one of the triangular abrasive platelets has respective top and bottom surfaces connected to each other, and separated by, three sidewalls. On a respective basis, one sidewall of at least 90 percent of the triangular abrasive platelets is disposed facing and proximate to the disc backing. The abrasive elements are arranged such that the triangular abrasive platelets in orthogonally adjacent abrasive elements have a Z-axis rotational orientation within 10 degrees of perpendicular to each other. Methods of making and using the coated abrasive disc are also disclosed.

COATED ABRASIVE DISC AND METHODS OF MAKING AND USING THE SAME

A coated abrasive disc includes a disc backing and an abrasive layer disposed thereon. The abrasive layer comprises abrasive elements secured to a major surface of the disc backing by at least one binder material. The abrasive elements are disposed at contiguous intersections of horizontal and vertical lines of a rectangular grid pattern. At least 70 percent of the intersections have one of the abrasive elements disposed thereat. Each of the abrasive elements has two triangular abrasive platelets. Each one of the triangular abrasive platelets has respective top and bottom surfaces connected to each other, and separated by, three sidewalls. On a respective basis, one sidewall of at least 90 percent of the triangular abrasive platelets is disposed facing and proximate to the disc backing. The abrasive elements are arranged such that the triangular abrasive platelets in orthogonally adjacent abrasive elements have a Z-axis rotational orientation within 10 degrees of perpendicular to each other. Methods of making and using the coated abrasive disc are also disclosed.

GRINDING MATERIAL

An object of the present invention is to provide a grinding material in which grinding portions can be increased in thickness while a decrease in grinding rate is inhibited. The grinding material according to the present invention includes a base, and a grinding layer overlaid on a front face side of the base and containing abrasive grains and a binder. The grinding layer includes a plurality of columnar grinding portions. The plurality of the grinding portions are configured so that the grinding portions are arranged in a staggered manner. The average thickness of the grinding portions is no less than 300 m. The area of a top face of each of the grinding portions is no less than 6 mm.sup.2. The average thickness of the base is no less than 300 m and no greater than 3,000 m.

GRINDING MATERIAL

An object of the present invention is to provide a grinding material in which grinding portions can be increased in thickness while a decrease in grinding rate is inhibited. The grinding material according to the present invention includes a base, and a grinding layer overlaid on a front face side of the base and containing abrasive grains and a binder. The grinding layer includes a plurality of columnar grinding portions. The plurality of the grinding portions are configured so that the grinding portions are arranged in a staggered manner. The average thickness of the grinding portions is no less than 300 m. The area of a top face of each of the grinding portions is no less than 6 mm.sup.2. The average thickness of the base is no less than 300 m and no greater than 3,000 m.