The present invention relates to a polishing pad and a method for making the same. The polishing pad includes a polymeric elastomer and a plurality of hollow structures. The hollow structures are distributed in the polymeric elastomer uniformly, and the sizes of the hollow structures are substantially equal to each other.

A problem solved is realizing a self-sharpening of a rotary grindstone in the most efficient manner and allowing sequential appearances of sharp cutting faces. To solve the problem, the invention provides a manufacturing method of a rotary grindstone 1 with one or more sheets of glass cloth 4 as a reinforcing material, wherein the glass cloth 4 is weaved by thirl plain weave/twill weave or leno weave composed of twist yarns having a diameter of 0.1 mm or less and formed in meshes with lengthwise and crosswise lengths of 2.0 mm or less, and attaching liquid resin to the glass cloth 4 to produce a prepreg 6, attaching resin-coat abrasive grains to both faces of the prepreg 6, and pressing the prepreg 6 in a press machine and further performing predetermined press working in a metal mold, performing baking.

An impregnated diamond cutter and a method of making the impregnated diamond cutter are disclosed. An impregnated diamond cutter may comprise a superabrasive volume. The superabrasive volume may have a plurality of diamond particles and a metal binder. The metal binder may comprise CoCuFeP.

This invention relates to composite backing materials (e.g., polymer impregnated nonwoven fabrics) and coated abrasive articles that include such composite backing materials. This invention also relates to methods of making and using said composite backing materials and coated abrasive articles. The claimed processes and systems related to the use and manufacturing of coated abrasive articles are improved and cost effective.

The disclosure herein relates to a method for preparing ceramic grains comprising: making a slurry comprising inorganic particles and a gelling agent; making droplets of the slurry; introducing the droplets in a liquid gelling-reaction medium wherein the droplets are gellified; deforming the droplets before, during or after gellification; drying the gellified deformed droplets, thereby obtaining dried grains and sintering the dried grains, thereby obtaining the ceramic grains.

The disclosure herein further relates to ceramic grains obtainable by a disclosed method.

The invention relates to an abrasive support comprising a support material composed of at least one wet- or dry-laid nonwoven based on natural and/or synthetic fibers. The support material is impregnated with a thermally curable polymer solution on one side and with an aqueous polymer dispersion on the opposite side. The thermally curable polymer solution penetrates at least 50% and at most 80% of the thickness of the support material, while the aqueous polymer dispersion penetrates at least 25% and at most 50% of the thickness of the support material.

The invention relates to an abrasive support, to an abrasive article comprising such a support, to the method for producing the same, and to the use of the abrasive article. According to at least one embodiment, the abrasive support comprises an impregnated support material based on synthetic fibers. The impregnated support material has at least on one side having a surface roughness R.sub.z of 100 m to 500 m, and having an R.sub.max of 250 m to 600 m. The support has an air permeability of at most 20 l/m.sup.2s.

The polishing pad according to an embodiment comprises a top-pad that is brought into contact with a wafer to perform polishing and a sub-pad that is located on one side of the top-pad, wherein the polishing rate at a distance of 95 mm from the center of the wafer in the polishing rate profile in a CMP process for a silicon oxide layer is greater than the polishing rate at a distance of 85 mm from the center of the wafer. As a result, the polishing rate and polishing flatness can be enhanced; in particular, the polishing rate profile characteristics of the polishing pad edge are excellent.