Patent classifications
B25J11/0095
METHOD AND APPARATUS FOR SUBSTRATE TRANSPORT APPARATUS POSITION COMPENSATION
A substrate transport empiric arm droop mapping apparatus for a substrate transport system of a processing tool, the mapping apparatus including a frame, an interface disposed on the frame forming datum features representative of a substrate transport space in the processing tool defined by the substrate transport system, a substrate transport arm, that is articulated and has a substrate holder, mounted to the frame in a predetermined relation to at least one of the datum features, and a registration system disposed with respect to the substrate transport arm and at least one datum feature so that the registration system registers, in an arm droop distance register, empiric arm droop distance, due to arm droop changes, between a first arm position and a second arm position different than the first arm position and in which the substrate holder is moved in the transport space along at least one axis of motion.
SUBSTRATE TRANSFER DEVICE
The present application relates to a substrate transfer device, comprising a horizontally arranged cross beam, and support beams longitudinally arranged at two ends of the cross beam, wherein a substrate carrier is suspended on the cross beam, the substrate carrier is located between the two support beams, and the substrate carrier is parallel to a plane where the two support beams are located, the substrate carrier comprises two side walls oppositely arranged in a horizontal direction, and each of the support beams is provided with an auxiliary clamping structure for clamping the substrate carrier during transferring of the substrate carrier.
Plasma processing apparatus having a focus ring adjustment assembly
A plasma processing apparatus is provided. The plasma processing apparatus includes a processing chamber defining a vertical direction and a lateral direction. The plasma processing apparatus includes a pedestal disposed within the processing chamber. The pedestal is configured to support the substrate. The plasma processing apparatus includes a radio frequency (RF) disposed within the processing chamber. The RF bias electrode defines a RF zone extending between a first end of the RF bias electrode and a second end of the RF bias electrode along the lateral direction. The plasma processing apparatus includes a focus ring disposed within the processing chamber. The plasma processing apparatus further includes a focus ring adjustment assembly. The focus ring adjustment assembly includes a lift pin positioned outside of the RF zone. The lift pin is movable along the vertical direction to adjust a distance between the pedestal and the focus ring along the vertical direction.
SUBSTRATE PROCESSING APPARATUS
A substrate processing apparatus including a frame, a SCARA arm mounted to the frame at a shoulder joint having two links with at least one end effector dependent therefrom, the links defining an upper arm and a forearm, each end effector pivotally joined to the forearm at a wrist to rotate about a wrist axis, and a drive section with at least one degree of freedom operably coupled to the arm to rotate the arm about a shoulder axis articulating extension and retraction, wherein the end effector is coupled to a wrist joint pulley so that extension and retraction effects rotation of the pulley and end effector as a unit about the wrist axis, and wherein a height of the end effector is within a stack height profile of the wrist joint so that a total stack height is sized to conform with and pass through a pass-through of a slot valve.
GRIP-BASED TRANSPORT SPEEDS FOR TRANSPORTING OBJECTS AT A MANUFACTURING SYSTEM
Systems and methods for grip-based transport speeds for objects transported at a manufacturing system is provided. A controller can detect an object placed on an end effector of a robot arm. The controller can apply vacuum pressure to secure the object to the end effector via vacuum grip pads. The controller can obtain a vacuum pressure measurement indicating the amount of vacuum pressure between the object and the end effector and determine whether the obtained vacuum pressure measurement satisfies a vacuum pressure criterion. The controller can determine a transport speed setting for transporting the object using the robot arm based on whether the obtained vacuum pressure measurement satisfies the vacuum pressure criterion. The controller can cause the robot arm to move the object according to the transport speed setting.
Robot
A robot includes first and second arms to rotate and convey an object; a first rotary body to support the first arm and having a first fluid passage and at least one second fluid passage communicating with the first fluid passage; a base-end-side arm formed with an internal space and a hole part into which a part of the first rotary body is inserted; a second rotary body to support the second arm and having a third fluid passage communicating at one end thereof with the second fluid passage and communicating at the other end thereof with the internal space; a supplying device disposed in the internal space and connected to an upstream-end side of the first fluid passage, and to supply fluid to the first fluid passage; a first motor to rotate the first rotary body; and a second motor to rotate the second rotary body.
Asymmetric Dual End Effector Robot Arm
An apparatus includes a first arm comprising an unequal-link linkage having a first end effector; a second arm comprising an equal-link linkage having a second end effector; and a drive unit coupled to the first arm and the second arm, the drive unit being configured to move the first arm and the second arm. The first end effector is asymmetric to the second end effector. The first end effector is angled relative to the second end effector such that a first substrate support section on the first end effector is not positioned over or under a second substrate support section on the second end effector.
TRANSFER APPARATUS
With reference to a plurality of images formed by imaging by an imaging unit, the position of a robot hand to be inserted into a cassette at the time of unloading a workpiece from the cassette is determined. Hence, it is not necessary for an operator to recognize in advance configuration details of the cassette and a warp or bending of the workpiece accommodated in the cassette. Accordingly, the operator's work at the time of unloading the workpiece from the cassette is simplified.
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE ALIGNMENT METHOD USING THE SAME
A method includes performing a substrate processing process by carrying a substrate into a chamber, and disposing the substrate in a loading region of the chamber, capturing an image of a lower surface of the substrate to acquire a first image, identifying particle patterns formed on the lower surface of the substrate in the substrate processing process, and an edge of the substrate, from the first image, calculating a first alignment error value of a deviation between an approximate position value for the center of the loading region calculated from the particle patterns and an approximate position value for a center of the substrate calculated from the edge of the substrate, and determining a point in time for teaching a transfer robot that deposits the substrate into the chamber, based on the first alignment error value.
CONVEYANCE APPARATUS, SUBSTRATE PROCESSING APPARATUS, CONVEYANCE METHOD, AND ARTICLE MANUFACTURING METHOD
A conveyance apparatus connected to a substrate processing apparatus configured to bring a pressing member and a material on a substrate into contact with each other to form a cured film of the material on the substrate, the conveyance apparatus includes an acquisition unit configured to acquire a state of a peripheral portion of an adhesion substrate including the pressing member and the substrate adhering to the pressing member with the material interposed in between, a position adjusting unit configured to adjust a position of the adhesion substrate based on a result acquired by the acquisition unit, and a conveyance unit configured to convey the adhesion substrate adjusted by the position adjusting unit.