A template and a template blank are used for imprint lithography transferring a transfer pattern in a concave and convex structure to a resin on a transfer substrate, in which a first step structure is formed on a main surface of a base, a second step structure is formed on the first step structure, and an outside region of the second step structure on an upper surface of the first step structure is covered with a light shielding film to solve the above problem.

An apparatus includes a first roll and a second roll on each of which a pattern is formed, a first motor and a second motor to rotate the respective rolls, a shaft direction supporting mechanism to support the second roll along a shaft direction and an axial position adjusting mechanism configured to move the shaft direction supporting mechanism along the shaft direction. The posture of the rotating shaft of the second motor is maintained constant at all times, and the second roll is moved in the shaft direction along the first roll, thereby adjusting the positions of both patterns on the first roll and the second roll along the shaft direction.

An imprint method includes arranging imprint material as droplets on shot region of substrate, bringing the imprint material on part of the shot region into contact with pattern region of mold and then enlarging contact region between the imprint material and the pattern region to whole region of the shot region, and curing the imprint material. in the arranging, in each of local regions located in radial direction from the part of the shot region, the imprint material is arranged such that directional drop density of the imprint material on line parallel to direction orthogonal to the radial direction and with droplets of the imprint material present thereon is smaller than that of the imprint material on line parallel to the radial direction and with droplets of the imprint material present thereon.

A roller embossing method for flexible graphite polar plates of fuel cells comprises: (1) adjusting a clearance of an embossing roller pair of a roller press to a target thickness value of a monopolar plate; (2) feeding a flexible graphite slab in front of the embossing roller pair, and entangling the flexible graphite slab by means of opposite rotation of the embossing roller pair; (3) after the slab is entangled, continuing to forward roll the slab for 10-100 mm, and then reversely rolling the slab for 5-90 mm by means of synchronous and opposite rotation of an upper and a lower embossing roller, wherein one time of forward rolling and one time of reverse rolling are referred to as reciprocal rolling; (4) forming a polar plate after several times of reciprocal rolling, and separating the polar plate from the embossing rollers; (5) performing subsequent treatment on the roll-formed flexible graphite polar plate.

The present invention provides an imprint apparatus including a holding member configured to hold the mold, a spring member configured to connect the holding member to a base unit that supports the holding member, a driving unit provided between the holding member and the base unit and configured to drive the holding member in a vertical direction with respect to the base unit, and a regulating surface configured to regulate, in a vertical range in which the holding member is driven by the driving unit, a driving end on a side that is towards the base unit, wherein the driving unit performs a driving for pressing the holding member against the regulating surface, and in the driving, generates heat while pressing the holding member against the regulating surface.

An imprint apparatus that forms a pattern of an imprint material on a substrate by using a mold comprising: at least one processor or circuit configured to function as a holding unit configured to hold the mold; an actuator configured to apply a force to a side surface of the mold held by the holding unit; wherein the holding unit includes a first mechanism that is able to hold the mold and is capable of limiting a motion of the mold in a direction in which the actuator applies the force; wherein the holding unit includes a second mechanism that is different from the first mechanism and that is able to hold the mold while allowing the motion of the mold in the direction in which the actuator applies the force.

A molding apparatus includes a mechanism configured to apply a curable composition onto a substrate with irregularities, a pressing and releasing mechanism that presses or releases a mold (super straight) having a flat surface against the curable composition on the substrate, and a curing mechanism configured to cure the curable composition by light radiation, a first supply unit configured to supply a first gas to the curable-composition application mechanism, and a second supply unit configured to supply a second gas different from the first gas to the pressing and releasing mechanism.

The invention concerns a super hydrophobic surface for handling a liquid and/or able to be contacted by a liquid, said surface comprising at least one hydrophobic liquid contact surface portion, wherein said hydrophobic liquid contact surface portion presents a micro- and nano-meter hierarchical patterned structure, the structure comprising: —homogeneously distributed micrometre-sized pillars (1), and—homogeneously distributed nanometre-sized pillars (2), preferably said pillars (2) having a dimension below 1 micrometer, at the upper surface of the micrometre-sized pillars, and—nanometre-sized protrusions (3) at the upper surface of the nanometre-sized pillars, the protrusions being positioned in a non-periodic, irregular pattern. The invention also relates to the use of such surfaces with micro- and nano-meter hierarchical patterned structure, for example in handling hot liquids, and a corresponding manufacturing process, e.g. using an injection moulding process for producing the component in polymer.

An imprinting method includes the steps of: adding a soluble material to a master mold; solidifying the soluble material to form a soluble mold; positioning an adhesive on a side of the soluble mold opposite to the master mold; attaching a taking device to the adhesive; removing the taking device from the master mold together with the soluble mold; positioning the soluble mold on a polymer layer; applying a first high temperature and a pressure to the soluble mold to form a transferred pattern corresponding to a convex-concave pattern of the soluble mold on the polymer layer and separate a support plate and a tape of the taking device; applying a second high temperature to the soluble mold to solidify the polymer layer; and dissolving the soluble mold by using a solvent to separate the solidified polymer layer and the support plate.

An imprint apparatus that forms a pattern by imprinting an imprint material on a substrate using an original, includes: an original support unit; a substrate support unit; a driving unit relatively driving the original support unit and the substrate support unit; a detection unit detecting a first alignment mark of the original and a second alignment mark of the substrate; a position adjustment unit adjusting a relative position between the original and the detection unit; and a control unit controlling the position adjustment unit to adjust a relative position between the original and the detection unit based on a position of the first alignment mark detected by the detection unit in a field of view of the detection unit during imprinting, and perform an alignment between the substrate and the original by the driving unit based on the first and second alignment marks detected by the detection unit.