The invention relates to a belt roller system for applying a surface structure in a floor panel or wall panel, said system comprising at least one upper endless belt and at least one lower endless belt, wherein each belt is rotatable around at least two pulleys, and at least one drive unit for rotating the upper endless belt and/or the lower endless belt. At least part of the upper endless belt comprises a surface structure and/or at least part of the lower endless belt comprises a surface structure. The upper endless belt and the lower endless belt are positioned substantially parallel to each other such that a panel can be transported between the upper endless belt and the lower endless belt such that the surface structure of the upper endless belt and/or the surface structure of the lower endless belt is transferred into the panel upon transport of the panel between said upper endless belt and said lower endless belt.

Provided are an imprint mold having a plurality of recesses constituting a predetermined mold pattern, in which the imprint mold comprises a stack, comprising a plurality of mold base material layers and an etching stopper layer interposed between the mold base material layers, on a substrate, the stack has the plurality of recesses having different depths, the mold base material layer and the etching stopper layer are made of materials having etching selectivity for each other, and each of the plurality of recesses has a bottom surface on which the etching stopper layer is exposed, and technology related thereto.

An imprint apparatus that forms a pattern by imprinting an imprint material on a substrate using an original, includes: an original support unit; a substrate support unit; a driving unit relatively driving the original support unit and the substrate support unit; a detection unit detecting a first alignment mark of the original and a second alignment mark of the substrate; a position adjustment unit adjusting a relative position between the original and the detection unit; and a control unit controlling the position adjustment unit to adjust a relative position between the original and the detection unit based on a position of the first alignment mark detected by the detection unit in a field of view of the detection unit during imprinting, and perform an alignment between the substrate and the original by the driving unit based on the first and second alignment marks detected by the detection unit.

Provided is a method of producing a cured product pattern, including: a first step (arranging step) of arranging a layer formed of a curable composition (α1′) that is the components of the curable composition (α1) except the component (D) serving as a solvent on a substrate; and a second step (applying step) of applying droplets of a curable composition (α2) discretely onto the layer formed of the curable composition (α1), the curable composition (α1) having a number concentration of particles each having a particle diameter of 0.07 μm or more of less than 2,021 particles/mL, and the curable composition (α1′) having a surface tension larger than that of the curable composition (α2).

A method for producing a shaped plastic part having a decorated surface, having the steps of: providing a plastic intermediate product having an injection-molded part and at least a first decorative ply of a first stamping film providing a second stamping film with a second decorative ply, hot stamping the second stamping film onto the plastic intermediate product and/or onto the injection-molded part. A shaped plastic part including an injection-molded part with at least a first and a second region of surface, a first decorative ply and a second decorative ply, wherein the first decorative ply is arranged at least in the first region of surface and the second decorative ply is arranged at least in the second region of surface.

The present invention provides an imprint method of performing, for each of a plurality of shot regions on a substrate, a process of forming a pattern of an imprint material on the substrate using a mold, comprising: obtaining a model configured to receive condition information representing a condition of the process and output an extrusion state of the imprint material from a shot region; estimating the extrusion state of the imprint material from at least one first shot region that has already undergone the process, by the model, based on the condition information obtained in the process of the first shot region; and determining, based on the estimated extrusion state in the first shot region, whether to execute the process for a second shot region scheduled to undergo the process next to the first shot region.

The present invention provides an imprint apparatus that forms a pattern of an imprint material on a substrate using a mold, the apparatus comprising: a supplier configured to supply the imprint material as a plurality of droplets onto the substrate; and a controller configured to control the supplier based on information indicating a target arrangement of the imprint material to be supplied as the plurality of droplets onto a predetermined region of the substrate, wherein the plurality of droplets in the target arrangement include a first droplet group including a plurality of first droplet arrays, a second droplet group including a plurality of second droplet arrays, and a third droplet array.

An imprint apparatus performing a pattern formation on an imprint material on a substrate by bringing the imprint material on the substrate and a mold into contact with each other, includes: an imprint unit configured to perform the pattern formation; and a control unit configured to control an operation of the imprint unit, in which the control unit performs a control such that the pattern formation is performed on all shot regions, in which no foreign substance exists, on a plurality of substrates using a first mold based on a foreign substance information on the substrate, and then the pattern formation is performed on all shot regions where the foreign substance exists on the plurality of substrates using a second mold different from the first mold.

An imprint apparatus that performs an imprint process of forming a pattern of an imprint material on a substrate using a mold, the apparatus including a control unit configured to control a mold driving unit and a substrate driving unit, and the imprint process including curing the imprint material, and releasing the mold from the cured imprint material, wherein the control unit includes a compensator configured to feedback-control driving of at least one of the mold driving unit and the substrate driving unit such that a positional relationship between the mold and the substrate in the releasing is maintained at a positional relationship between the mold and the substrate in the curing, and makes a gain of the compensator in the releasing smaller than a gain of the compensator in a step of the imprint process other than the releasing.

A method for conveying a substrate from a first to a second apparatus is provided. Material is applied to the substrate when on the first apparatus. A substrate conveyance apparatus including first and second holding portions is used. As a first step, the substrate is transferred from a first apparatus placement surface to the substrate conveyance apparatus. The substrate is then conveyed from the first apparatus to the second apparatus. The substrate is then transferred from the first holding portion to the second apparatus. In the first step, raising the first holding portion in a state where the first holding portion is inserted in a space under the substrate causes the first holding portion to hold the substrate, and the second holding portion to hold a protection member by holding a holding and receiving portion provided on a protection member surface opposite to a protection member surface facing the substrate.