An apparatus includes a first roll and a second roll on each of which a pattern is formed, a first motor and a second motor to rotate the respective rolls, a shaft direction supporting mechanism to support the second roll along a shaft direction and an axial position adjusting mechanism configured to move the shaft direction supporting mechanism along the shaft direction. The posture of the rotating shaft of the second motor is maintained constant at all times, and the second roll is moved in the shaft direction along the first roll, thereby adjusting the positions of both patterns on the first roll and the second roll along the shaft direction.

An imprint apparatus including a control unit configured to obtains data for estimating a fluctuation of a positional shift between a mold and a substrate occurring during a contact step, and when performing an imprint process on the substrate, obtains an estimation value by estimating the positional shift occurring during the contact step from the positional shift measured by a measurement unit at a reference time during the contact step and the data, and drives at least one of the mold and the substrate in the contact step based on the estimation value so as to reduce the positional shift at a start of an alignment step.

A stamp for micro-transfer printing includes a support having a support stiffness and a support coefficient of thermal expansion (CTE). A pedestal layer is formed on the support, the pedestal layer having a pedestal layer stiffness that is less than the support stiffness and a pedestal layer coefficient of thermal expansion (CTE) that is different from the support coefficient of thermal expansion (CTE). A stamp layer is formed on the pedestal layer, the stamp layer having a body and one or more protrusions extending from the body in a direction away from the pedestal layer. The stamp layer has a stamp layer stiffness that is less than the support stiffness and a stamp layer coefficient of thermal expansion that is different from the support coefficient of thermal expansion.

An imprint apparatus that forms a curable composition on a substrate using a mold includes a first measurement unit configured to measure a height distribution of the substrate at a contact position where the mold and the curable composition are brought into contact with each other. The first measurement unit measures a height of the substrate by bringing a probe into contact with a surface of the substrate, the probe having a contact surface area smaller than a contact surface area of the mold.

An apparatus includes a first roll and a second roll on each of which a pattern is formed, a first motor and a second motor to rotate the respective rolls, a shaft direction supporting mechanism to support the second roll along a shaft direction and an axial position adjusting mechanism configured to move the shaft direction supporting mechanism along the shaft direction. The posture of the rotating shaft of the second motor is maintained constant at all times, and the second roll is moved in the shaft direction along the first roll, thereby adjusting the positions of both patterns on the first roll and the second roll along the shaft direction.

An alignment method of aligning a first object and a second object includes detecting a moire fringe formed by a mark of the first object and a mark of the second object by using a detection unit, detecting an evaluation mark for correcting a detection result of the moire fringe, by the detection unit, and acquiring a detection result of the evaluation mark, determining a relative position of the mark of the first object and the mark of the second object by correcting a detection result of the moire fringe by use of the detection result of the evaluation mark, and aligning the first object and the second object based on the relative position. The evaluation mark is provided in at least one of the first object and the second object.

An imprint apparatus for forming a pattern of an imprint material on a substrate using a mold, includes a mold holding unit including an actuator for moving mold, a force sensor detecting force generated by actuator, a position sensor measuring a position of mold, and a controlling unit controlling operation of mold holding unit. The controlling unit controls mold holding unit according to either a force imprint profile or a position imprint profile. The force imprint profile is for controlling movement of mold based on force generated by actuator and detected by force sensor. The position imprint profile is for controlling movement of mold based on position of mold measured by position sensor. When pattern of imprint material is formed on substrate, either force imprint profile or position imprint profile is selectable.

According to one embodiment, a template includes a base body, and a first film. The base body has a first surface and a second surface. The first surface includes silicon oxide and spreads along a first plane. The second surface crosses the first plane. The first film includes aluminum oxide. A direction from the second surface toward the first film is aligned with a direction perpendicular to the second surface. A thickness of the first film along the direction perpendicular to the second surface is not less than 0.3 nm and not more than 10 μm. The first surface includes an unevenness.

A medical device for delivering a drug compound through a stratum corneum includes a support having an aperture, an array of microneedles extending outwardly from the support, a plurality of nanostructures associated with each microneedle, and a reservoir wherein the drug compound is retained. At least one microneedle contains a shaft extending from the support. The shaft includes a tip configured to penetrate the stratum corneum. The shaft defines a channel extending from the support to the tip. The channel is in at least partial alignment with the aperture. At least some of the microneedles of the array of microneedles each have a cross-sectional dimension of from about 1 micrometer to about 1 millimeter. At least some of the nanostructures have a cross-sectional dimension less than about 500 nanometers and greater than about 5 nanometers and an aspect ratio of from about 0.2 to about 5.

Provided herein are methods of forming and optimizing cured features on a surface including controlling the surface upon which the cured features are applied. Additionally, a system for forming and processing the topographical features on the membrane is also described, along with mechanical features at specific system stations. More particularly, provided herein are methods of forming and optimizing topographical features applied to a membrane surface by controlling the membrane surface and by controlling the direction and magnitude of pressure applied to the membrane (substrate), as well as initially partially curing the topographical features, followed by fully curing of the topographical features to form the membrane having topographical spacing features formed thereon.