Provided are a resin composition for underlayer film formation with which a variation hardly occurs in the line width distribution after processing due to a small thickness of a residual film after mold pressing, a layered product, a method for forming a pattern, an imprint forming kit, and a process for producing a device. Disclosed is a resin composition for underlayer film formation which is used to form an underlayer film by being applied onto a base material, including a first resin having a radical reactive group in the side chain, a second resin containing at least one selected from a fluorine atom and a silicon atom, and a solvent. The second resin is preferably a resin containing a fluorine atom. The radical reactive group of the first resin is preferably a (meth)acryloyl group.

A composite molded article in which another material is integrated on a face having grooves in a grooved resin molded article having grooves in which end parts of a fibrous inorganic filler protrude and are exposed from lateral faces of the grooves on a surface side in at least the insides of the grooves. Exposure of the end parts of the fibrous inorganic filler and formation of the grooves may be accomplished by laser irradiation, and the depth of the grooves may be at least 200 m. Another molded article comprising the other material is arranged surrounding the fibrous inorganic filler in the insides of the grooves.

A method for preparing the antimicrobial plastic includes contacting a non-leachable antimicrobial agent to a surface of a plastic article to form the antimicrobial plastic. In certain variations, the contacting includes applying a precursor antimicrobial layer including non-leachable antimicrobial agents to a surface of a plastic article to form a precursor assembly and hot pressing the precursor assembly to embed the non-leachable antimicrobial agents within the surface of the plastic article to form the antimicrobial plastic. In other variations, the contacting includes preparing an antimicrobial layer including a non-leachable antimicrobial agent on a foil and transferring the antimicrobial layer from the foil to the surface of the plastic article to form the antimicrobial plastic, where the transferring includes contacting the antimicrobial layer and the surface of the plastic article and applying a transfer temperature that is greater than a softening temperature of the plastic article.

Embodiments of the present disclosure generally relate to imprint compositions and materials and related processes useful for nanoimprint lithography (NIL). In one or more embodiments, an imprint composition contains one or more types of nanoparticles, one or more surface ligands, one or more solvents, one or more additives, and one or more acrylates.

Forming features in the surface of a bicycle component involves depositing a substance onto a substrate in a geometric pattern to form a transfer medium. Forming features may also involve positioning the transfer medium relative to an unformed bicycle component, and forming a negative of the geometric pattern in the bicycle component through the application of heat and/or pressure to the transfer medium and the unformed bicycle component. The transfer medium may be configured for use in the molding of carbon fiber reinforced plastic (CFRP) bicycle components and may include a substrate formed of a flexible material, and a geometric pattern formed of a hard material, the hard material different than the flexible material.

A method for etching a layer of assembled block copolymer including first and second polymer phases, the etching method including a first step of etching by a first plasma formed from carbon monoxide or a first gas mixture including a fluorocarbon gas and a depolymerising gas, the first etching step being carried out so as to partially etch the first polymer phase and to deposit a carbon layer on the second polymer phase, and a second step of etching by a second plasma formed from a second gas mixture including a depolymerising gas and a gas selected among the carbon oxides and the fluorocarbon gases, the second etching step being carried out so as to etch the first polymer phase and the carbon layer on the second polymer phase.

Provided are a resin composition for underlayer film formation with which a variation hardly occurs in the line width distribution after processing due to a small thickness of a residual film after mold pressing, a layered product, a method for forming a pattern, an imprint forming kit, and a process for producing a device. A resin composition for underlayer film formation includes a resin having a group represented by General Formula (A) and at least one group selected from a group represented by General Formula (B), an oxiranyl group and an oxetanyl group, a nonionic surfactant and a solvent. R.sup.a1 represents a hydrogen atom or a methyl group, R.sup.b1 and R.sup.b2 each independently represent a group selected from an unsubstituted linear or branched alkyl group having 1 to 20 carbon atoms and an unsubstituted cycloalkyl group having 3 to 20 carbon atoms, R.sup.b3 represents a group selected from an unsubstituted linear or branched alkyl group having 2 to 20 carbon atoms and an unsubstituted cycloalkyl group having 3 to 20 carbon atoms, and R.sup.b2 and R.sup.b3 may be bonded to each other to form a ring. ##STR00001##

Provided are a curable composition having excellent releasability and ink jet discharge accuracy, a pattern forming method, a pattern, and a method for manufacturing a device. The curable composition includes a polymerizable compound and a photopolymerization initiator, in which neopentyl glycol diacrylate accounts for 10% by mass or more of the polymerizable compound, and the total content of a compound represented by the following Formula (I) and a compound represented by the following Formula (II) is 5% by mass or less with respect to the content of neopentyl glycol diacrylate. ##STR00001##

Feedstocks for additive manufacturing are provided. The feedstock may include a matrix material, and one or more capsules disposed in the matrix material, wherein the one or more capsules are configured to be removable from a surface portion when the matrix material is solidified to form one or more cavities in the surface portion. Methods of depositing the feedstocks and objects formed from the feedstocks are also provided.

In a system and method for making a capped structure having a variegated cap layer a layer of cap materials is applied to a substrate and pin stripes are applied onto the cap layer through an extrusion die. After these materials exit the extrusion die they are passed through a single opening in a die plate to create a capped structure having a variegated appearance. This capped structure has a smooth surface that enables an embosser to create a consistent embossing pattern on the entire surface.