Patent classifications
B29C59/005
NANONIMPRINT LIQUID MATERIAL, METHOD FOR MANUFACTURING NANOIMPRINT LIQUID MATERIAL, METHOD FOR MANUFACTURING CURED PRODUCT PATTERN, METHOD FOR MANUFACTURING OPTICAL COMPONENT, AND METHOD FOR MANUFACTURING CIRCUIT BOARD
A nanoimprint liquid material in which the particle number concentration of particles having a particle diameter of 0.07 m or more is less than 310/mL is provided.
LAMINATED FILM FOR DECORATING THREE-DIMENSIONAL MOLDED PRODUCT BY VACUUM FORMING, PRODUCTION METHOD THEREOF, AND METHOD FOR DECORATING THREE-DIMENSIONAL MOLDED PRODUCT
The present disclosure is to provide a laminated film for decorating a three-dimensional molded product by vacuum forming which has a crack and strain-free uneven design on the clear coating film layer being an outermost layer at the time of use and provide a good design property to a molded product.
A laminated film for decorating a three-dimensional molded product by vacuum forming, having a base material film layer (A), a clear coating film layer (B), and a design layer (C), wherein at least one face of the base material film layer (A) bordering the clear coating film layer (B) has an uneven design.
Curable composition for imprints, patterning method and pattern
Disclosed is a to provide a curable composition for imprints capable of keeping a good patternability and of producing less defects even after repetitive pattern transfer. The curable composition for imprints comprising: a polymerizable compound (A); a photo-polymerization initiator (B); and a non-polymerizable compound (C) having a polyalkylene glycol structure having at least one terminal hydroxy group, or at least one etherified terminal hydroxy group, and containing substantially no fluorine atom and no silicon atom.
Method for manufacturing an opto-electronic component substrate
The invention relates to a method for manufacturing an optoelectronic component substrate (12) comprising a stack of layers, the method comprising a step of: preforming a substrate (12) comprising a face which has a pattern with at least one zone made of a first material and one zone made of a second material, the two materials being thermosetting or thermoplastic materials, the first material being an electrically conductive material and the second material being an electrically insulating material, and molding by compression the face of the substrate (12) with a face of a reference element (22) having a surface roughness less than or equal to 50 nanometers.
FEEDSTOCKS FOR ADDITIVE MANUFACTURING AND METHODS FOR THEIR PREPARATION AND USE
Feedstocks for additive manufacturing are provided. The feedstock may include a matrix material, and one or more capsules disposed in the matrix material, wherein the one or more capsules are configured to be removable from a surface portion when the matrix material is solidified to form one or more cavities in the surface portion. Methods of depositing the feedstocks and objects formed from the feedstocks are also provided.
Absorbent article and components thereof having improved softness signals, and methods for manufacturing
An absorbent article having improved softness signals is disclosed. The article may include a topsheet or a backsheet including a nonwoven web. The web may have a basis weight of 30 gsm or less, may be formed of spunlaid fibers including polyolefin and up to 5 percent by weight TiO.sub.2, and may be impressed with a pattern of bond impressions to a bond area percentage of at least 10 percent forming a pattern of bonded regions and raised regions. The web may have opacity of 42 or greater; have an average height difference between bonded regions and raised regions of at least 280 m; be hydroengorged; and/or have a cross-direction tensile strength of 350 gf/cm. A nonwoven web manufactured to have a suitable combination of such features exhibits an enhanced appearance of softness, soft tactile feel and satisfactory mechanical attributes, while being relatively cost effective.
Resin Mold for Nanoimprinting and Production Method Thereof
A resin mold for nanoimprinting has a substrate, a resin layer formed upon the substrate and having a depressions and protrusions pattern on a surface, an inorganic substance layer formed of uniform thickness on at least the surface having the depressions and protrusions pattern of the resin layer, and a mold release agent layer formed of uniform thickness on at least the surface having the depressions and protrusions pattern of the inorganic substance layer. The resin of the resin layer includes constituent units derived from an epoxy group-containing unsaturated compound at a concentration of 1 to 50 percent relative to total constituent units, and the epoxy value is 7.010.sup.4 to 4.010.sup.2.
Resin mold for nanoimprinting and production method thereof
A resin mold for nanoimprinting has a substrate, a resin layer formed upon the substrate and having a depressions and protrusions pattern on a surface, an inorganic substance layer formed of uniform thickness on at least the surface having the depressions and protrusions pattern of the resin layer, and a mold release agent layer formed of uniform thickness on at least the surface having the depressions and protrusions pattern of the inorganic substance layer. The resin of the resin layer includes constituent units derived from an epoxy group-containing unsaturated compound at a concentration of 1 to 50 percent relative to total constituent units, and the epoxy value is 7.010.sup.4 to 4.010.sup.2.
CURABLE COMPOSITION, FILM FORMING METHOD AND ARTICLE MANUFACTURING METHOD
A curable composition containing a polymerizable compound (a), a photopolymerization initiator (b), and a solvent (c), wherein the curable composition has viscosity of not less than 2 mPas and not more than 60 mPa.Math.s at 23 C., a content of the solvent (d) with respect to the whole curable composition is not less than 5 vol % and not more than 95 vol %, a boiling point of the solvent (d) at normal pressure is less than 250 C., and the polymerizable compound (a) contains a compound (a-1) containing not less than one aromatic ring or aromatic heterocycle, and not less than four vinyl groups directly bonding to the aromatic ring or the aromatic heterocycle.
CURABLE COMPOSITION, PATTERN FORMING METHOD, PATTERN, AND METHOD FOR MANUFACTURING DEVICE
Provided are a curable composition having excellent releasability and ink jet discharge accuracy, a pattern forming method, a pattern, and a method for manufacturing a device.
The curable composition includes a polymerizable compound and a photopolymerization initiator, in which neopentyl glycol diacrylate accounts for 10% by mass or more of the polymerizable compound, and the total content of a compound represented by the following Formula (I) and a compound represented by the following Formula (II) is 5% by mass or less with respect to the content of neopentyl glycol diacrylate.
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