Patent classifications
B29C59/02
Imprinting apparatus and method of manufacturing product
An imprinting apparatus 100 includes a control unit 126 that controls movement of a stage 104. During a period after a pattern is formed in a first region of regions until a pattern is formed in a second region that differs from the first region of the regions, the control unit 126 does not allow the first region to pass through a facing portion that faces a discharge ports 122b. After a predetermined time has elapsed since the discharging unit 106 finally discharges a imprint material 127 to the substrate with an airstream generated along a substrate from the facing portion at the facing portion that faces the discharge ports 122b, the control unit 126 controls movement of the stage such that the regions in which the pattern is formed are allowed to pass through the facing portion.
Imprinting apparatus and method of manufacturing product
An imprinting apparatus 100 includes a control unit 126 that controls movement of a stage 104. During a period after a pattern is formed in a first region of regions until a pattern is formed in a second region that differs from the first region of the regions, the control unit 126 does not allow the first region to pass through a facing portion that faces a discharge ports 122b. After a predetermined time has elapsed since the discharging unit 106 finally discharges a imprint material 127 to the substrate with an airstream generated along a substrate from the facing portion at the facing portion that faces the discharge ports 122b, the control unit 126 controls movement of the stage such that the regions in which the pattern is formed are allowed to pass through the facing portion.
Adaptive microtexturing of a composite material
An article including a composite including a subsurface structure and a second phase of material forming a coating on the subsurface structure. The coating includes a first region defining a first plurality of microtextures in an outer surface of the coating, where the first plurality of microtextures include an average bore width of less than about 250 micrometers (μm) and a first average bore depth, and a second region positioned adjacent to the first region wherein the coating defines a second plurality of microtextures on the outer surface of the coating, where the second plurality of microtextures include an average bore width of less than about 250 μm and a second average bore depth less than the first average bore depth.
IMPRINT DEVICE, IMPRINT METHOD, STORAGE MEDIUM, AND ARTICLE MANUFACTURING METHOD
In order to provide an imprint device and the like that can efficiently maintain a concentration of a gas when imprinting is sequentially performed, the imprint device includes: a mold holding unit configured to a mold; a substrate holding unit configured to holding a substrate; a gas supply unit configured to supply a gas to an imprint space between the mold and the substrate; and a control unit configured to control the gas supply unit and an imprinting operation, wherein the control unit is configured to sequentially perform imprinting on a plurality of imprint regions of the substrate, and the control unit is configured to, when a moving direction of the substrate between the imprint regions is changed from a first direction to a second direction, supply a gas to the imprint space in the first direction and the second direction using the gas supply unit during the imprinting operation on the imprint region before the change in the moving direction.
IMPRINT DEVICE, IMPRINT METHOD, STORAGE MEDIUM, AND ARTICLE MANUFACTURING METHOD
In order to provide an imprint device and the like that can efficiently maintain a concentration of a gas when imprinting is sequentially performed, the imprint device includes: a mold holding unit configured to a mold; a substrate holding unit configured to holding a substrate; a gas supply unit configured to supply a gas to an imprint space between the mold and the substrate; and a control unit configured to control the gas supply unit and an imprinting operation, wherein the control unit is configured to sequentially perform imprinting on a plurality of imprint regions of the substrate, and the control unit is configured to, when a moving direction of the substrate between the imprint regions is changed from a first direction to a second direction, supply a gas to the imprint space in the first direction and the second direction using the gas supply unit during the imprinting operation on the imprint region before the change in the moving direction.
SEAT SKIN, AND METHOD FOR PRODUCING SEAT SKIN
A seat skin 11 has a front surface layer 12, a back surface layer 13, and pores 15. The inner wall of the pore 15 is covered by the front surface layer 12. The seat skin 11 is produced by forming a base material having at least a front surface layer 12 and a back surface layer 13; sandwiching the base material between a pressing plate having a die for the pores, and a backing plate opposite the pressing plate; pressing the pressing plate against the backing plate with the base material being heated at a temperature that a component contained in the front surface layer 12 does not melt, to form the pores in the base material; and removing the base material having the pores formed therein from between the pressing plate and the backing plate.
SEAT SKIN, AND METHOD FOR PRODUCING SEAT SKIN
A seat skin 11 has a front surface layer 12, a back surface layer 13, and pores 15. The inner wall of the pore 15 is covered by the front surface layer 12. The seat skin 11 is produced by forming a base material having at least a front surface layer 12 and a back surface layer 13; sandwiching the base material between a pressing plate having a die for the pores, and a backing plate opposite the pressing plate; pressing the pressing plate against the backing plate with the base material being heated at a temperature that a component contained in the front surface layer 12 does not melt, to form the pores in the base material; and removing the base material having the pores formed therein from between the pressing plate and the backing plate.
COMPOSITION FOR FORMING IMPRINT PATTERN, CURED SUBSTANCE, IMPRINT PATTERN PRODUCING METHOD, AND METHOD FOR MANUFACTURING DEVICE
Provided are a composition for forming an imprint pattern, containing a polymerizable compound, a polymerization initiator, and a dye, in which the dye is a compound which has no metal element in a chemical structure; a cured substance consisting of the composition for forming an imprint pattern; an imprint pattern producing method using the composition for forming an imprint pattern; and a method for manufacturing a device, including the imprint pattern producing method.
PROCESS TO PREPARE A STRUCTURED ARTICLE USING A REMOVABLE PROTECTIVE LAYER AND STRUCTURED ARTICLE OBTAINED BY SAID PROCESS
Described herein is a process for producing a structured article (A1M1) in which a material (M1) including at least one micro- and/or nanostructured surface (SU1) containing a plurality of micro-scale and/or nano-scale surface elements is covered with an at least partially cured coating layer (C2) to provide a composite (M1C2), said composite (M1C2) is attached to an object (A1) and the coating layer (C2) is at least partially peeled off to provide the structured article (A1M1). Also described herein is a composite (M1C2) in which the surface elements of the material (M1) are covered by a protective coating layer (C2).
METHOD FOR TRANSFERRING AN EMBOSSED STRUCTURE TO THE SURFACE OF A COATING, AND COMPOSITE EMPLOYABLE AS EMBOSSING MOLD
Disclosed herein is a method for transferring an embossed structure to at least a part of a surface of a coating composition (C2a) using a composite (S1C1) including a substrate (S1) and an at least partially embossed and at least partially cured coating (C1) upon following steps (1), (2-i) and (3-i) or (2-ii) and (3-ii), and also at least step (4) and optionally step (5-i) or (5-ii), where the coating composition (C1a) is a radiation-curable coating composition of defined constitution and the composite (S1C1) is used as embossing mold (e2) of an embossing tool (E2).