Patent classifications
B29C59/14
Apparatus for the plasma treatment of surfaces and a method for treating surfaces with plasma
Apparatus and method for the plasma treatment of surfaces with a first electrode and a second electrode, the apparatus and method comprises an alternating voltage source between the first and second electrodes, and an electrical field forming, at least between the first and second electrodes, an effective area, which is arranged in front of the first electrode and in which the surface to be treated can be positioned, wherein the second electrode is arranged closer to the effective area than the first electrode. The apparatus and method provides at least one process gas channel for at least one stream of process gas with at least one outlet at the first electrode, wherein the at least one outlet points in the direction of the effective area, the at least one stream of process gas impinges on the electrical field, the electrical field converts the at least one stream of process gas into a stream of plasma, and the stream of plasma impinges on the effective area.
Medical devices and instruments with non-coated superhydrophobic or superoleophobic surfaces
Device surfaces are rendered superhydrophobic and/or superoleophobic through microstructures and/or nanostructures that utilize the same base material(s) as the device itself without the need for coatings made from different materials or substances. A medical device includes a portion made from a base material having a surface adapted for contact with biological material, and wherein the surface is modified to become superhydrophobic, superoleophobic, or both, using only the base material, excluding non-material coatings. The surface may be modified using a subtractive process, an additive process, or a combination thereof. The product of the process may form part of an implantable device or a medical instrument, including a medical device or instrument associated with an intraocular procedure. The surface may be modified to include micrometer- or nanometer-sized pillars, posts, pits or cavitations; hierarchical structures having asperities; or posts/pillars with caps having dimensions greater than the diameters of the posts or pillars.
Medical devices and instruments with non-coated superhydrophobic or superoleophobic surfaces
Device surfaces are rendered superhydrophobic and/or superoleophobic through microstructures and/or nanostructures that utilize the same base material(s) as the device itself without the need for coatings made from different materials or substances. A medical device includes a portion made from a base material having a surface adapted for contact with biological material, and wherein the surface is modified to become superhydrophobic, superoleophobic, or both, using only the base material, excluding non-material coatings. The surface may be modified using a subtractive process, an additive process, or a combination thereof. The product of the process may form part of an implantable device or a medical instrument, including a medical device or instrument associated with an intraocular procedure. The surface may be modified to include micrometer- or nanometer-sized pillars, posts, pits or cavitations; hierarchical structures having asperities; or posts/pillars with caps having dimensions greater than the diameters of the posts or pillars.
Processing microtitre plates for covalent immobilization chemistries
Disclosed herein is a method of: treating an organic polymer with an electron beam-generated plasma; exposing the treated polymer to air or an oxygen- and hydrogen-containing gas, generating hydroxyl groups on the surface of the polymer; reacting the surface with an organosilane compound having a chloro, fluoro, or alkoxy group and a functional or reactive group that is less reactive with the surface than the chloro, fluoro, or alkoxy group; and covalently immobilizing a biomolecule to the functional or reactive group or a reaction product thereof.
Processing microtitre plates for covalent immobilization chemistries
Disclosed herein is a method of: treating an organic polymer with an electron beam-generated plasma; exposing the treated polymer to air or an oxygen- and hydrogen-containing gas, generating hydroxyl groups on the surface of the polymer; reacting the surface with an organosilane compound having a chloro, fluoro, or alkoxy group and a functional or reactive group that is less reactive with the surface than the chloro, fluoro, or alkoxy group; and covalently immobilizing a biomolecule to the functional or reactive group or a reaction product thereof.
METHODS OF FORMING HOLES AND ETCHING SURFACES IN SUBSTRATES AND SUBSTRATES FORMED THEREBY
Methods capable of forming holes in, etching the surface of, or otherwise ablating substrates, and substrates formed thereby. A first method includes directing a first laser beam pulse towards a substrate to form a hole in a surface thereof and to form a plasma plume at least partially within the hole wherein the plasma plume has insufficient thermal energy and expansion velocity to etch sidewall of the hole, and directing a second laser beam pulse into the plasma plume to increase the temperature and expansion velocity of the plasma plume such that the sidewall is etched causing an increase in the cross-sectional dimension of the hole. A second method includes applying a liquid to a surface of a substrate, and directing a laser beam pulse into the liquid to create plasma on the surface of the substrate that etches portions of the surface of the substrate.
Method of manufacturing semiconductor device
Provided is a method of manufacturing a semiconductor device. The method of manufacturing a semiconductor device includes forming a target etching layer on a substrate, patterning the target etching layer to form a pattern layer including a pattern portion having a first height and a first width and a recess portion having a second width, providing a first gas and a second gas on the pattern layer, and performing a reaction process including reacting the first and second gases with a surface of the pattern portion by irradiating a laser beam on the pattern layer. The performing the reaction process includes removing a portion of sidewalls of the pattern portion so that the pattern portion has a third width that is smaller than the first width.
METHOD FOR SELECTIVE ETCHING OF A BLOCK COPOLYMER
A method for etching a layer of assembled block copolymer including first and second polymer phases, the etching method including a first step of etching by a first plasma formed from carbon monoxide or a first gas mixture including a fluorocarbon gas and a depolymerising gas, the first etching step being carried out so as to partially etch the first polymer phase and to deposit a carbon layer on the second polymer phase, and a second step of etching by a second plasma formed from a second gas mixture including a depolymerising gas and a gas selected among the carbon oxides and the fluorocarbon gases, the second etching step being carried out so as to etch the first polymer phase and the carbon layer on the second polymer phase.
Method for Producing Multilayer Member
A method for producing a multilayer member having a first member containing a crystallizable thermoplastic resin, an adhesion layer, and a second member includes performing a dry treatment on a surface of the first member containing a crystallizable thermoplastic resin so as to satisfy conditions A and B, applying an adhesive to the surface of the first member to form an adhesive layer on the surface, and adhering the second member to the adhesive layer. (A) The ultimate temperature of the first member is lower than the peak temperature of endothermic peak obtained by DSC of the crystallizable thermoplastic resin. (B) The high temperature holding time of the first member is less than 3.0 seconds, which is when the first member is continuously held at a temperature not lower than a temperature at the starting point of the endothermic peak obtained by DSC of the crystallizable thermoplastic resin.
Member Surface Treatment Method and Method for Producing Multilayer Member
Provided is a member surface treatment method for treating a surface of a member containing a crystallizable thermoplastic resin by a dry treatment, wherein the dry treatment is performed so as to satisfy the following conditions X and Y. Condition X: .sup.d/.sup.d0 is not less than 1.0 and less than 1.4. Condition Y: .sup.p/.sup.p0 is not less than 1.2 and less than 40. .sup.d0 is a non-polar component of surface free energy of the surface before the dry treatment, .sup.d is a non-polar component of surface free energy of the surface after the dry treatment, .sup.p0 is a polar component of surface free energy of the surface before the dry treatment, and .sup.p is a polar component of surface free energy of the surface after the dry treatment.