The present disclosure relates to a method for micropatterning on silicone-based elastomer, the method including forming an initiator at a position of the silicone-based elastomer having high optical transmittance and transparency, and moving a laser beam to induce chain pyrolysis, thereby forming micropatterns with high quality in a very short time.

The present disclosure relates to a method for micropatterning on silicone-based elastomer, the method including forming an initiator at a position of the silicone-based elastomer having high optical transmittance and transparency, and moving a laser beam to induce chain pyrolysis, thereby forming micropatterns with high quality in a very short time.

Methods and systems for photopatterning and miniaturization. In some examples, a method for patterning a substrate includes irradiating a pattern onto the substrate with ultraviolet light and heating the substrate, causing the substrate and the pattern to shrink in at least one dimension to form a miniaturized pattern on the substrate. In some examples, a system for patterning a substrate includes an ultraviolet light source, a heater, and a controller configured for irradiating a pattern onto the substrate with ultraviolet light and heating the substrate, causing the substrate and the pattern to shrink in at least one dimension to form a miniaturized pattern on the substrate.

There are provided a master and a method for manufacturing the master, the master having, on its outer peripheral surface, a concave-convex structure in which concavities or convexities are continuously arranged with high precision. The master includes: a substrate with a hollow cylindrical shape or cylindrical shape; and a concave-convex structure on an outer peripheral surface of the substrate. The concave-convex structure has concavities or convexities continuously arranged at a predetermined pitch in a circumferential direction of the substrate. The concavities or convexities are arranged with a predetermined phase difference between circumferential rows adjacent in an axial direction of the substrate.

There are provided a master and a method for manufacturing the master, the master having, on its outer peripheral surface, a concave-convex structure in which concavities or convexities are continuously arranged with high precision. The master includes: a substrate with a hollow cylindrical shape or cylindrical shape; and a concave-convex structure on an outer peripheral surface of the substrate. The concave-convex structure has concavities or convexities continuously arranged at a predetermined pitch in a circumferential direction of the substrate. The concavities or convexities are arranged with a predetermined phase difference between circumferential rows adjacent in an axial direction of the substrate.

Provided is a method of producing a cured product pattern, including: a first step (arranging step) of arranging a layer formed of a curable composition (α1′) that is the components of the curable composition (α1) except the component (D) serving as a solvent on a substrate; and a second step (applying step) of applying droplets of a curable composition (α2) discretely onto the layer formed of the curable composition (α1), the curable composition (α1) having a number concentration of particles each having a particle diameter of 0.07 μm or more of less than 2,021 particles/mL, and the curable composition (α1′) having a surface tension larger than that of the curable composition (α2).

Provided is a method of producing a cured product pattern, including: a first step (arranging step) of arranging a layer formed of a curable composition (α1′) that is the components of the curable composition (α1) except the component (D) serving as a solvent on a substrate; and a second step (applying step) of applying droplets of a curable composition (α2) discretely onto the layer formed of the curable composition (α1), the curable composition (α1) having a number concentration of particles each having a particle diameter of 0.07 μm or more of less than 2,021 particles/mL, and the curable composition (α1′) having a surface tension larger than that of the curable composition (α2).

It would be helpful to provide an optical body having excellent antireflection performance over a wide wavelength range from the visible light region to the near-infrared region. The present disclosure discloses an optical body 1 including a transparent substrate 10 and a fine uneven layer 20 with a fine uneven structure in at least one surface of the substrate 10. A maximum value (Ra) of reflectance for light in a wavelength region of 400 nm to 950 nm is 1 % or less, and a wavelength at which the reflectance is at a local minimum value (Rb) is 650 nm or more.

It would be helpful to provide an optical body having excellent antireflection performance over a wide wavelength range from the visible light region to the near-infrared region. The present disclosure discloses an optical body 1 including a transparent substrate 10 and a fine uneven layer 20 with a fine uneven structure in at least one surface of the substrate 10. A maximum value (Ra) of reflectance for light in a wavelength region of 400 nm to 950 nm is 1 % or less, and a wavelength at which the reflectance is at a local minimum value (Rb) is 650 nm or more.

A method of activating a surface of a plastics substrate formed from: (a) polyaryletherketone such as polyether ether ketone (PEEK) polyether ketone ketone (PEKK), polyether ketone (PEK); polyether ether ketone ketone (PEEKK); or polyether ketone ether ketone ketone (PEKEKK); (b) a polymer containing a phenyl group directly attached to a carbonyl group, optionally wherein the carbonyl group is part of an amide group, such as polyarylamide (PARA); (c) polyphenylene sulfide (PPS); or (d) polyetherimide (PEI); for subsequent bonding,
the method comprising the step of exposing the surface to actinic radiation wherein the actinic radiation: includes radiation with wavelength in the range from about 10 nm to about 1000 nm; the energy of the actinic radiation to which the surface is exposed is in the range from about 0.5 J/cm.sup.2 to about 300 J/cm.sup.2. Hard to bond substrates are then more easily subsequently bonded for example using acrylic, epoxy or anaerobic adhesive.