Patent classifications
B32B2457/08
Electrodeposited copper foil and copper clad laminate
An electrodeposited copper foil includes a bulk copper foil. When a weight of the electrodeposited copper foil is increased to 105.0 wt % during a thermogravimetric analysis (TGA) performed on the electrodeposited copper foil at a heating rate of 5° C./min and an air flow rate of 95 mL/min, a heating temperature of the TGA is defined as T.sub.105.0 wt % and in a range of 550° C. to 750° C.
Resin composition, resin film, metal foil with resin, prepreg, metal-clad laminate, and printed wiring board
A resin composition includes: a resin as Component (A); and an inorganic filler as Component (B). The Component (B) includes anhydrous magnesium carbonate as Component (b1) and aluminum oxide as Component (b2). Content of the Component (b1) falls within a range from 35% by volume to 65% by volume relative to 100% by volume of the Components (b1) and (b2) combined. Content of the Component (B) falls within a range from 60% by volume to 75% by volume relative to 100% by volume of the resin composition.
BONDING STRUCTURE AND ELECTRONIC DEVICE
A bonding structure includes a substrate, a first sensing electrode layer, a second sensing electrode layer, an optical film layer, and a protective layer. The substrate has opposite first and second surfaces. A sensing area and a bonding area are defined on the substrate. The first sensing electrode layer is disposed on the first surface. The second sensing electrode layer is disposed on the second surface. The optical film layer covers the first sensing electrode layer and has a first bonding opening located in the bonding area. The protective layer covers the second sensing electrode layer and has a second bonding opening located in the bonding area. The first and second bonding openings respectively expose a part of the first sensing electrode layer and a part of the second sensing electrode layer and are misaligned in a direction perpendicular to the first or second surface.
A METHOD AND AN APPARATUS FOR MANUFACTURING A POROUS GRAPHENE LAYER ACROSS A PRECURSOR MATERIAL LAYER ON A SUBSTRATE THROUGH THERMALLY LOCALIZED LASER GRAPHITISATION
The present disclosure provides a method and an apparatus for manufacturing a porous graphene layer across a precursor material layer on a substrate. The method comprises: determining a first temperature threshold and a second temperature threshold, the first temperature threshold being a minimum temperature required for forming the porous graphene layer from a precursor material layer on a portion of the substrate, the second temperature threshold being one at which the substrate is likely to experience thermal damages above this temperature threshold; determining at least one of operating parameters of a light source, wherein exposing the precursor material layer to the light source that is operating under the at least one of the operating parameters causes a temperature of the portion of the substrate adjoining a side of the precursor material layer to maintain below the second temperature threshold and a temperature of the opposite side of the precursor material layer to rise above the first temperature threshold; and generating an a beam of light from the light source to the precursor material layer based on the at least one of operating parameters of the light source to form the porous graphene layer.
Laser-releasable bonding materials for 3-D IC applications
Novel polyketanil-based compositions for use as a laser-releasable composition for temporary bonding and laser debonding processes are provided. The inventive compositions can be debonded using various UV lasers, at wavelengths from about 300 nm to about 360 nm, leaving behind little to no debris. The layers formed from these compositions possess good thermal stabilities and are resistant to common solvents used in semiconductor processing. The compositions can also be used as build-up layers for redistribution layer formation.
Liquid crystal polymer film and laminate comprising the same
Provided are a liquid crystal polymer (LCP) film and a laminate comprising the same. The LCP film has a first surface and a second surface opposite each other, and a Kurtosis (Rku) of the first surface ranges from 3.0 to 60.0. With the Rku, the LCP film is able to improve the peel strength with a metal foil and ensure that a laminate comprising the same maintains the merit of low insertion loss.
POLYIMIDE COMPOSITE FILM FOR USE IN FLEXIBLE METAL CLAD SUBSTRATE
A polyimide composite film for use in a flexible metal clad substrate, comprising: a polyimide base material film; a fluorine polymer layer, formed on at least one surface of the polyimide base material film, comprising polyimide resins and fluorine polymers, wherein the polyimide resin accounts for 2 to 20 wt % of the total solid content of the fluorine polymer layer, the aromatic functional group ratio of the polyimide resin in the fluorine polymer layer is greater than 35%, and the absorption onset wavelength (λonset) of the ultraviolet-visible spectrum is greater than 360 nm; a thickness ratio of the polyimide base material film to one layer of the fluorine polymer layers is 8:1 to 1:4; and a total thickness of the polyimide composite film is between 18 and 175 microns. Thus, the polyimide composite film has a low dielectric constant, low loss factor, and has good drilling processability.
Support, adhesive sheet, laminated structure, semiconductor device, and method for manufacturing printed wiring board
A method for manufacturing a printed wiring board which includes: Step (A) of laminating an adhesive sheet including a support and a resin composition layer bonded to the support to an inner layer board so that the resin composition layer is bonded to the inner layer board; Step (B) of thermally curing the resin composition layer to form an insulating layer; and Step (C) of removing the support, in this order, in which the support satisfies a condition (MD1): a maximum expansion coefficient E.sub.MD in an MD direction at 120° C. or more is less than 0.2% and a condition (TD1): a maximum expansion coefficient E.sub.TD in a TD direction at 120° C. or more is less than 0.2% below, when being heated under predetermined heating conditions, does not lower the yield even when the insulating layer is formed by thermally curing the resin composition layer with a support attached to the resin composition layer.
Phosphorated anhydride containing epoxy resin
Disclosed herein are compounds of formulas (I) and (II), Wherein R.sub.1, R.sub.2, R.sub.3 and (1) are as described herein. Methods of making compounds of formulas (I) and (II), curable compositions containing them and cured compositions containing them are also described. The compounds of formulas (I) and II are curing agents, fire retardants or both. ##STR00001##
LIQUID CRYSTAL POLYMER FILM AND LAMINATE
An object of the present invention is to provide a liquid crystal polymer film having an excellent peel strength of a laminate produced by sticking a metal foil to the liquid crystal polymer film; and a laminate.
A liquid crystal polymer film including a liquid crystal polymer, in which in a case where a cross-section of the liquid crystal polymer film along a thickness direction of the liquid crystal polymer film is exposed and immersed in monomethylamine, and then void regions are extracted from an observed image of a cross-section obtained by using an electron microscope, an average value of widths of the void regions is 0.01 to 0.1 μm and an area ratio of the void regions in the observed image of the cross-section is 20% or less.